JPS5186975A - - Google Patents

Info

Publication number
JPS5186975A
JPS5186975A JP50134752A JP13475275A JPS5186975A JP S5186975 A JPS5186975 A JP S5186975A JP 50134752 A JP50134752 A JP 50134752A JP 13475275 A JP13475275 A JP 13475275A JP S5186975 A JPS5186975 A JP S5186975A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50134752A
Other languages
Japanese (ja)
Other versions
JPS548070B2 (en
Inventor
Furoshu Aruberuto
Erutoman Korusu Hansu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5186975A publication Critical patent/JPS5186975A/ja
Publication of JPS548070B2 publication Critical patent/JPS548070B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Automatic Focus Adjustment (AREA)
JP13475275A 1974-12-21 1975-11-11 Expired JPS548070B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742460914 DE2460914C2 (en) 1974-12-21 1974-12-21 Photolithographic projection apparatus

Publications (2)

Publication Number Publication Date
JPS5186975A true JPS5186975A (en) 1976-07-30
JPS548070B2 JPS548070B2 (en) 1979-04-12

Family

ID=5934300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13475275A Expired JPS548070B2 (en) 1974-12-21 1975-11-11

Country Status (4)

Country Link
JP (1) JPS548070B2 (en)
DE (1) DE2460914C2 (en)
FR (1) FR2295452A2 (en)
GB (1) GB1510007A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08172048A (en) * 1995-06-16 1996-07-02 Hitachi Ltd Exposure method

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2633297A1 (en) * 1976-07-23 1978-01-26 Siemens Ag AUTOMATIC ADJUSTMENT PROCEDURE
DE2635275C2 (en) * 1976-08-05 1984-09-06 Siemens AG, 1000 Berlin und 8000 München Method for adjusting a disk-shaped substrate relative to a photomask in an X-ray exposure apparatus
DE2757386C3 (en) * 1977-12-22 1981-11-26 Agfa-Gevaert Ag, 5090 Leverkusen Exposure arrangement for copiers
FR2450470A1 (en) * 1979-02-27 1980-09-26 Thomson Csf OPTICAL PROJECTION SYSTEM IN PHOTOREPETITION
TWI237307B (en) 2003-05-01 2005-08-01 Nikon Corp Optical projection system, light exposing apparatus and light exposing method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2464793A (en) * 1942-08-08 1949-03-22 Lester Cooke Jr H Method and apparatus for photographic scanning
DE1173327B (en) * 1961-04-10 1964-07-02 Logetronics Inc Arrangement for detecting and automatically adjusting the focus in a photographic device
DE2050590C2 (en) * 1970-10-15 1982-06-16 Ibm Deutschland Gmbh, 7000 Stuttgart Projection device
US3819265A (en) * 1972-08-02 1974-06-25 Bell Telephone Labor Inc Scanning projection printer apparatus and method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08172048A (en) * 1995-06-16 1996-07-02 Hitachi Ltd Exposure method
JP2576814B2 (en) * 1995-06-16 1997-01-29 株式会社日立製作所 Exposure method

Also Published As

Publication number Publication date
DE2460914C2 (en) 1983-08-18
FR2295452A2 (en) 1976-07-16
JPS548070B2 (en) 1979-04-12
GB1510007A (en) 1978-05-10
FR2295452B2 (en) 1977-12-16
DE2460914A1 (en) 1976-06-24

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