GB1485449A - Method and apparatus for examining surface characteristics employing a scanning electron beam - Google Patents

Method and apparatus for examining surface characteristics employing a scanning electron beam

Info

Publication number
GB1485449A
GB1485449A GB47837/74A GB4783774A GB1485449A GB 1485449 A GB1485449 A GB 1485449A GB 47837/74 A GB47837/74 A GB 47837/74A GB 4783774 A GB4783774 A GB 4783774A GB 1485449 A GB1485449 A GB 1485449A
Authority
GB
United Kingdom
Prior art keywords
plate
electrons
electron beam
detector
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB47837/74A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Calspan Corp
Original Assignee
Calspan Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Calspan Corp filed Critical Calspan Corp
Publication of GB1485449A publication Critical patent/GB1485449A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/04—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/08—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring roughness or irregularity of surfaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
GB47837/74A 1973-11-09 1974-11-05 Method and apparatus for examining surface characteristics employing a scanning electron beam Expired GB1485449A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US414568A US3876879A (en) 1973-11-09 1973-11-09 Method and apparatus for determining surface characteristics incorporating a scanning electron microscope

Publications (1)

Publication Number Publication Date
GB1485449A true GB1485449A (en) 1977-09-14

Family

ID=23642012

Family Applications (1)

Application Number Title Priority Date Filing Date
GB47837/74A Expired GB1485449A (en) 1973-11-09 1974-11-05 Method and apparatus for examining surface characteristics employing a scanning electron beam

Country Status (6)

Country Link
US (1) US3876879A (https=)
JP (1) JPS5511204B2 (https=)
DE (1) DE2452826B2 (https=)
FR (1) FR2250977A1 (https=)
GB (1) GB1485449A (https=)
NL (1) NL7414104A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4598998A (en) * 1982-02-25 1986-07-08 Sumitomo Kinzoku Kogyo Kabushiki Kaisha Screw surface flaw inspection method and an apparatus therefor
EP0312083A3 (en) * 1987-10-14 1990-08-08 Kabushiki Kaisha Toshiba Pattern measurement method

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD124091A1 (https=) * 1975-09-24 1977-02-02
US4142145A (en) * 1977-12-22 1979-02-27 The United States Of America As Represented By The Secretary Of The Navy Method for determining conduction-band edge and electron affinity in semiconductors
US4144488A (en) * 1977-12-22 1979-03-13 The United States Of America As Represented By The Secretary Of The Navy Investigation of near-surface electronic properties in semiconductors by electron beam scanning
CA1202508A (en) * 1981-05-07 1986-04-01 Norio Murata Protective packaging assembly and method for optical fibers
US4475037A (en) * 1982-05-11 1984-10-02 International Business Machines Corporation Method of inspecting a mask using an electron beam vector scan system
JPS6089050A (ja) * 1983-10-20 1985-05-18 Toshiba Corp ストロボ走査電子顕微鏡
US4733074A (en) * 1985-04-17 1988-03-22 Hitachi, Ltd. Sample surface structure measuring method
US4788431A (en) * 1987-04-10 1988-11-29 The Perkin-Elmer Corporation Specimen distance measuring system
DE3811673A1 (de) * 1988-04-07 1989-10-19 Herbert Dr Konitz Rasterelektronenmikroskopisches verfahren zum vermessen der profilierung, insbesondere der rauhigkeit, von oberflaechen und vorrichtung zur durchfuehrung des verfahrens
FR2634061B1 (fr) * 1988-07-06 1991-04-05 Commissariat Energie Atomique Evaporateur a bombardement electronique muni de moyens de recuperation des electrons retrodiffuses
US5150392A (en) * 1991-09-09 1992-09-22 International Business Machines Corporation X-ray mask containing a cantilevered tip for gap control and alignment
US5734164A (en) * 1996-11-26 1998-03-31 Amray, Inc. Charged particle apparatus having a canted column
US6969852B2 (en) * 2004-03-22 2005-11-29 General Phoshonix Llc Method of evaluating of a scanning electron microscope for precise measurements
JP2005286161A (ja) * 2004-03-30 2005-10-13 Ebara Corp 形状修復方法及び装置、並びにそれらを用いた半導体デバイス製造方法
JP4538421B2 (ja) * 2006-02-24 2010-09-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1195271A (en) * 1967-02-16 1970-06-17 Cambridge Instr Co Ltd Electron Beam Apparatus
US3549999A (en) * 1968-06-05 1970-12-22 Gen Electric Method and apparatus for testing circuits by measuring secondary emission electrons generated by electron beam bombardment of the pulsed circuit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4598998A (en) * 1982-02-25 1986-07-08 Sumitomo Kinzoku Kogyo Kabushiki Kaisha Screw surface flaw inspection method and an apparatus therefor
EP0312083A3 (en) * 1987-10-14 1990-08-08 Kabushiki Kaisha Toshiba Pattern measurement method

Also Published As

Publication number Publication date
NL7414104A (nl) 1975-05-13
JPS5511204B2 (https=) 1980-03-24
FR2250977A1 (https=) 1975-06-06
JPS5081175A (https=) 1975-07-01
US3876879A (en) 1975-04-08
DE2452826B2 (de) 1979-10-04
DE2452826A1 (de) 1975-05-15

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee