GB1481396A - Nitroso dimer-containing compositions and photoimaging process - Google Patents
Nitroso dimer-containing compositions and photoimaging processInfo
- Publication number
- GB1481396A GB1481396A GB1124275A GB1124275A GB1481396A GB 1481396 A GB1481396 A GB 1481396A GB 1124275 A GB1124275 A GB 1124275A GB 1124275 A GB1124275 A GB 1124275A GB 1481396 A GB1481396 A GB 1481396A
- Authority
- GB
- United Kingdom
- Prior art keywords
- dimer
- layer
- nitroso
- free
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 125000000018 nitroso group Chemical group N(=O)* 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 4
- 239000000203 mixture Substances 0.000 title abstract 4
- 230000005855 radiation Effects 0.000 abstract 5
- 239000000539 dimer Substances 0.000 abstract 4
- 239000000178 monomer Substances 0.000 abstract 3
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 abstract 2
- 239000003112 inhibitor Substances 0.000 abstract 2
- 150000002832 nitroso derivatives Chemical class 0.000 abstract 2
- 238000006116 polymerization reaction Methods 0.000 abstract 2
- 238000010526 radical polymerization reaction Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- ARVUDIQYNJVQIW-UHFFFAOYSA-N (4-dodecoxy-2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC(OCCCCCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 ARVUDIQYNJVQIW-UHFFFAOYSA-N 0.000 abstract 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 abstract 1
- -1 2-o-chlorophenyl-4, 5-diphenylimidazolyl Chemical class 0.000 abstract 1
- OKJSFKIUVDXFMS-UHFFFAOYSA-N 4-[bis[4-(diethylamino)-2-methylphenyl]methyl]-n,n-diethyl-3-methylaniline Chemical compound CC1=CC(N(CC)CC)=CC=C1C(C=1C(=CC(=CC=1)N(CC)CC)C)C1=CC=C(N(CC)CC)C=C1C OKJSFKIUVDXFMS-UHFFFAOYSA-N 0.000 abstract 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 abstract 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- AFLQDEOAJRGCOW-UHFFFAOYSA-N nitrosocyclohexane Chemical class O=NC1CCCCC1 AFLQDEOAJRGCOW-UHFFFAOYSA-N 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract 1
- 229920006267 polyester film Polymers 0.000 abstract 1
- 239000004926 polymethyl methacrylate Substances 0.000 abstract 1
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 1
- 239000006100 radiation absorber Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US45233874A | 1974-03-18 | 1974-03-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1481396A true GB1481396A (en) | 1977-07-27 |
Family
ID=23796090
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1124275A Expired GB1481396A (en) | 1974-03-18 | 1975-03-18 | Nitroso dimer-containing compositions and photoimaging process |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5724904B2 (enExample) |
| BE (1) | BE826824A (enExample) |
| CA (1) | CA1052612A (enExample) |
| DE (1) | DE2511486C2 (enExample) |
| FR (1) | FR2265117B2 (enExample) |
| GB (1) | GB1481396A (enExample) |
| NL (1) | NL7503127A (enExample) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE630740A (enExample) * | 1962-04-09 |
-
1975
- 1975-03-15 DE DE19752511486 patent/DE2511486C2/de not_active Expired
- 1975-03-17 FR FR7508216A patent/FR2265117B2/fr not_active Expired
- 1975-03-17 NL NL7503127A patent/NL7503127A/xx not_active Application Discontinuation
- 1975-03-17 CA CA222,275A patent/CA1052612A/en not_active Expired
- 1975-03-18 JP JP3192675A patent/JPS5724904B2/ja not_active Expired
- 1975-03-18 GB GB1124275A patent/GB1481396A/en not_active Expired
- 1975-03-18 BE BE154455A patent/BE826824A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| FR2265117B2 (enExample) | 1980-03-14 |
| BE826824A (fr) | 1975-09-18 |
| CA1052612A (en) | 1979-04-17 |
| FR2265117A2 (enExample) | 1975-10-17 |
| JPS5724904B2 (enExample) | 1982-05-26 |
| NL7503127A (nl) | 1975-09-22 |
| DE2511486C2 (de) | 1983-11-03 |
| DE2511486A1 (de) | 1975-09-25 |
| JPS50129013A (enExample) | 1975-10-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed |