GB1432686A - Method of manufacturing a monocrystalline substrate body - Google Patents
Method of manufacturing a monocrystalline substrate bodyInfo
- Publication number
- GB1432686A GB1432686A GB3302673A GB3302673A GB1432686A GB 1432686 A GB1432686 A GB 1432686A GB 3302673 A GB3302673 A GB 3302673A GB 3302673 A GB3302673 A GB 3302673A GB 1432686 A GB1432686 A GB 1432686A
- Authority
- GB
- United Kingdom
- Prior art keywords
- melt
- layer
- plate
- substrate material
- monocrystalline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/12—Liquid-phase epitaxial-layer growth characterised by the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/02—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
- C30B29/28—Complex oxides with formula A3Me5O12 wherein A is a rare earth metal and Me is Fe, Ga, Sc, Cr, Co or Al, e.g. garnets
Abstract
1432686 Depositing epitaxial layers PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 11 July 1973 [14 July 1972] 33026/73 Heading B1S A monocrystalline body consisting of a substrate with an epitaxial layer deposited thereon is made by dissolving a surface layer of a monocrystalline substrate material in a melt which consists of a solution of the components of the substrate material dissolved in a flux and then depositing a monocrystalline layer of the substrate material on the resulting surface from a melt which consists of a solution of the components of the substrate material dissolved in a flux. The dissolution of the surface layer and subsequent depository of the layer may be carried out in the same melt. In example I, a plate of gadolinium gallium garnet was treated with a melt of Gd 2 O 3 , Ga 2 O 3 , PbO, and B 2 O 3 at a temperature above the saturation temperature of the melt, the plate removed from the melt and the thinner plate provided with a layer of the composition by liquid phase epitaxy. In example II, a plate of samarium gallium garnet Sm 3 Ga 5 O 12 , was treated in a melt which had a composition of Sm 2 O 3 , Ga 2 O 3 , PbO and B 2 O 3 at a temperature above the saturation temperature of the melt, after which the melt was cooled to below the saturation temperature of the melt and maintained there for 15 minutes. Upon inspection the plate was found to be 100Ám thinner and to have a layer of 10Ám deposited on each side of the plate.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7209744A NL7209744A (en) | 1972-07-14 | 1972-07-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1432686A true GB1432686A (en) | 1976-04-22 |
Family
ID=19816516
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3302673A Expired GB1432686A (en) | 1972-07-14 | 1973-07-11 | Method of manufacturing a monocrystalline substrate body |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS4964576A (en) |
CA (1) | CA1018439A (en) |
DE (1) | DE2332036C3 (en) |
FR (1) | FR2192869B1 (en) |
GB (1) | GB1432686A (en) |
IT (1) | IT989842B (en) |
NL (1) | NL7209744A (en) |
SE (1) | SE7608675L (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2276564A (en) * | 1993-03-31 | 1994-10-05 | Max Planck Gesellschaft | A liquid-phase heteroepitaxy method |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE754519A (en) * | 1969-08-06 | 1971-02-08 | Motorola Inc | METHOD AND APPARATUS FOR THE GROWTH OF EPITAXIAL LAYERS IN LIQUID PHASE ON SEMICONDUCTORS |
-
1972
- 1972-07-14 NL NL7209744A patent/NL7209744A/xx unknown
-
1973
- 1973-06-23 DE DE2332036A patent/DE2332036C3/en not_active Expired
- 1973-07-06 CA CA175,890A patent/CA1018439A/en not_active Expired
- 1973-07-11 FR FR7325379A patent/FR2192869B1/fr not_active Expired
- 1973-07-11 IT IT51410/73A patent/IT989842B/en active
- 1973-07-11 GB GB3302673A patent/GB1432686A/en not_active Expired
- 1973-07-11 JP JP48078262A patent/JPS4964576A/ja active Pending
-
1976
- 1976-08-02 SE SE7608675A patent/SE7608675L/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2276564A (en) * | 1993-03-31 | 1994-10-05 | Max Planck Gesellschaft | A liquid-phase heteroepitaxy method |
GB2276564B (en) * | 1993-03-31 | 1997-02-05 | Max Planck Gesellschaft | A liquid-phase heteroepitaxy method |
Also Published As
Publication number | Publication date |
---|---|
DE2332036A1 (en) | 1974-01-31 |
FR2192869B1 (en) | 1977-05-13 |
DE2332036B2 (en) | 1978-09-07 |
NL7209744A (en) | 1974-01-16 |
FR2192869A1 (en) | 1974-02-15 |
CA1018439A (en) | 1977-10-04 |
IT989842B (en) | 1975-06-10 |
SE7608675L (en) | 1976-08-02 |
DE2332036C3 (en) | 1980-07-03 |
JPS4964576A (en) | 1974-06-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |