GB1419139A - Frame for electroforming process - Google Patents

Frame for electroforming process

Info

Publication number
GB1419139A
GB1419139A GB1573373A GB1573373A GB1419139A GB 1419139 A GB1419139 A GB 1419139A GB 1573373 A GB1573373 A GB 1573373A GB 1573373 A GB1573373 A GB 1573373A GB 1419139 A GB1419139 A GB 1419139A
Authority
GB
United Kingdom
Prior art keywords
base
electro
gaskets
forming
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1573373A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Buckbee Mears Co
Original Assignee
Buckbee Mears Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Buckbee Mears Co filed Critical Buckbee Mears Co
Publication of GB1419139A publication Critical patent/GB1419139A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Electrolytic Production Of Metals (AREA)
GB1573373A 1972-08-28 1973-04-02 Frame for electroforming process Expired GB1419139A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00284333A US3824176A (en) 1972-08-28 1972-08-28 Matrix holder

Publications (1)

Publication Number Publication Date
GB1419139A true GB1419139A (en) 1975-12-24

Family

ID=23089802

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1573373A Expired GB1419139A (en) 1972-08-28 1973-04-02 Frame for electroforming process

Country Status (9)

Country Link
US (1) US3824176A (https=)
JP (1) JPS4946537A (https=)
BE (1) BE804099A (https=)
CA (1) CA1016499A (https=)
DE (1) DE2343031A1 (https=)
FR (1) FR2197998B1 (https=)
GB (1) GB1419139A (https=)
IT (1) IT991296B (https=)
NL (1) NL7311261A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4364816A (en) 1979-12-07 1982-12-21 Emi Limited Record matrix preparation
RU2595194C1 (ru) * 2015-01-29 2016-08-20 Акционерное общество "Военно-промышленная корпорация "Научно-производственное объединение машиностроения" (АО "ВПК "НПО машиностроения") Способ нанесения защитного покрытия на детали из алюминиевых сплавов

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4044939A (en) * 1975-09-08 1977-08-30 Ncr Corporation Method of fabricating diffraction grating masters and apparatus therefor
US4459194A (en) * 1983-03-10 1984-07-10 At&T Technologies, Inc. Electroplating apparatus
US4490230A (en) * 1983-03-10 1984-12-25 At&T Technologies, Inc. Electroplating apparatus
ES2024439B3 (es) * 1986-02-28 1992-03-01 Schering Ag Berlin Und Bergkamen Armazones alargados y piezas correspondientes para la fijacion soltable de placas de circuito impreso que han de galvanizarse, y placas de circuito impreso correspondientes.
US5227041A (en) * 1992-06-12 1993-07-13 Digital Equipment Corporation Dry contact electroplating apparatus
US5405518A (en) * 1994-04-26 1995-04-11 Industrial Technology Research Institute Workpiece holder apparatus
US6746565B1 (en) 1995-08-17 2004-06-08 Semitool, Inc. Semiconductor processor with wafer face protection
US5762751A (en) * 1995-08-17 1998-06-09 Semitool, Inc. Semiconductor processor with wafer face protection
DE10059451C1 (de) * 2000-11-30 2002-08-14 Maerzhaeuser Senso Tech Gmbh Werkstückaufnahme für galvanische Beschichtungen
DE102005039100A1 (de) * 2005-08-09 2007-02-15 Gebr. Schmid Gmbh & Co. Einrichtung zur Aufnahme bzw. Halterung mehrerer Substrate und Galvanisiereinrichtung
WO2015084331A1 (en) * 2013-12-03 2015-06-11 Schneider Electric It Corporation System for insulating high current busbars
DE102014225270A1 (de) * 2014-12-09 2016-06-09 Gebr. Schmid Gmbh Kontaktrahmen für elektrochemische Substratbeschichtung
US10340166B2 (en) * 2015-11-22 2019-07-02 George Xinsheng Guo Substrates handling in a deposition system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4425547Y1 (https=) * 1965-11-11 1969-10-27
JPS4425548Y1 (https=) * 1965-12-02 1969-10-27

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4364816A (en) 1979-12-07 1982-12-21 Emi Limited Record matrix preparation
RU2595194C1 (ru) * 2015-01-29 2016-08-20 Акционерное общество "Военно-промышленная корпорация "Научно-производственное объединение машиностроения" (АО "ВПК "НПО машиностроения") Способ нанесения защитного покрытия на детали из алюминиевых сплавов

Also Published As

Publication number Publication date
JPS4946537A (https=) 1974-05-04
IT991296B (it) 1975-07-30
US3824176A (en) 1974-07-16
DE2343031A1 (de) 1974-03-07
BE804099A (nl) 1974-02-28
NL7311261A (https=) 1974-03-04
FR2197998A1 (https=) 1974-03-29
FR2197998B1 (https=) 1977-09-02
CA1016499A (en) 1977-08-30

Similar Documents

Publication Publication Date Title
GB1419139A (en) Frame for electroforming process
IT1020962B (it) Bagno elettrolitico di cromatura
NL7601341A (nl) Elektrolysecel met een diafragma tussen anode en kathode.
DE3771507D1 (de) Vorrichtung zur selektiven galvanischen behandlung der oberflaeche von gegenstaenden.
ES448837A1 (es) Un metodo para efectuar un recubrimiento electrolitico de cinc.
ES444872A1 (es) Perfeccionamientos introducidos en una celula electrolitica con diafragma.
GB1539303A (en) Electrolytic baths for use in the electrodeposition of palladium or palladium alloys
BE810315A (fr) Anodes metalliques a surface anodique reduite et a densite de courant elevee et leur utilisation dans des procedes d'extraction electrolytique avec une densite de courant cathodique faible
ATE25114T1 (de) Netzartige elektrode fuer die abscheidung von metallionen und verfahren zu deren herstellung.
DE3761490D1 (de) Aufhaengevorrichtung von anodentraegern in der elektrolytischen aluminiumherstellung.
JPS5754300A (ja) Obijokinzokubannodenkaisochi
BE848512A (fr) Cellule d'electrolyse a anodes et cathodes verticales,
IT993886B (it) Procedimento per la rigenerazione di soluzioni d attacco chimico del rame e riutilizzazione in bagni di fame senza corrente
GB1397139A (en) Electrical contact
JPS5128340B1 (https=)
ATE36875T1 (de) Elektrolysezelle mit horizontal angeordneten elektroden.
JPS53122633A (en) Insoluble anode and electrolytic methdo in electroplating and the like
IT1125270B (it) Procedimento perfezionato di placcatura elettrolitica di zinco e soluzione per il bagno da usare in questo procedimento
GB1167138A (en) Method for Preventing Growth of Metallic Whiskers.
GB1215864A (en) Electro-forming of continuous sheets
SU1338459A1 (ru) Анодное устройство для нанесения покрытий методом электролитического натирания
SE7706497L (sv) Elektrolytiskt utfellningsforfarande
Derkach et al. Some Reasons for More Frequent Anode Effects in Vertical Stud Cells
GB1422497A (en) Electro-plating
SE9103061D0 (sv) Nickel electroplating process with reduced nickel ion buildup

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee