GB1413610A - Method of developing an imagewise exposed light-sensitive layer - Google Patents

Method of developing an imagewise exposed light-sensitive layer

Info

Publication number
GB1413610A
GB1413610A GB4593973A GB4593973A GB1413610A GB 1413610 A GB1413610 A GB 1413610A GB 4593973 A GB4593973 A GB 4593973A GB 4593973 A GB4593973 A GB 4593973A GB 1413610 A GB1413610 A GB 1413610A
Authority
GB
United Kingdom
Prior art keywords
developing
resists
photo
imagewise exposed
oct
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4593973A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Production Printing Holding BV
Original Assignee
Oce Van der Grinten NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oce Van der Grinten NV filed Critical Oce Van der Grinten NV
Publication of GB1413610A publication Critical patent/GB1413610A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB4593973A 1972-10-03 1973-10-02 Method of developing an imagewise exposed light-sensitive layer Expired GB1413610A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7213331A NL7213331A (US07935154-20110503-C00006.png) 1972-10-03 1972-10-03

Publications (1)

Publication Number Publication Date
GB1413610A true GB1413610A (en) 1975-11-12

Family

ID=19817058

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4593973A Expired GB1413610A (en) 1972-10-03 1973-10-02 Method of developing an imagewise exposed light-sensitive layer

Country Status (4)

Country Link
DE (1) DE2349203A1 (US07935154-20110503-C00006.png)
FR (1) FR2209128B1 (US07935154-20110503-C00006.png)
GB (1) GB1413610A (US07935154-20110503-C00006.png)
NL (1) NL7213331A (US07935154-20110503-C00006.png)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4323642A (en) * 1981-03-09 1982-04-06 Eastman Kodak Company Stable photographic developers containing an indazole antifoggant and a lignosulfonate

Also Published As

Publication number Publication date
NL7213331A (US07935154-20110503-C00006.png) 1974-04-05
DE2349203A1 (de) 1974-04-18
FR2209128B1 (US07935154-20110503-C00006.png) 1977-03-11
FR2209128A1 (US07935154-20110503-C00006.png) 1974-06-28

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees