NL7213331A - - Google Patents

Info

Publication number
NL7213331A
NL7213331A NL7213331A NL7213331A NL7213331A NL 7213331 A NL7213331 A NL 7213331A NL 7213331 A NL7213331 A NL 7213331A NL 7213331 A NL7213331 A NL 7213331A NL 7213331 A NL7213331 A NL 7213331A
Authority
NL
Netherlands
Application number
NL7213331A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7213331A priority Critical patent/NL7213331A/xx
Priority to DE19732349203 priority patent/DE2349203A1/de
Priority to GB4593973A priority patent/GB1413610A/en
Priority to FR7335341A priority patent/FR2209128B1/fr
Publication of NL7213331A publication Critical patent/NL7213331A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL7213331A 1972-10-03 1972-10-03 NL7213331A (xx)

Priority Applications (4)

Application Number Priority Date Filing Date Title
NL7213331A NL7213331A (xx) 1972-10-03 1972-10-03
DE19732349203 DE2349203A1 (de) 1972-10-03 1973-10-01 Verfahren zur entwicklung von lichtempfindlichen schichten
GB4593973A GB1413610A (en) 1972-10-03 1973-10-02 Method of developing an imagewise exposed light-sensitive layer
FR7335341A FR2209128B1 (xx) 1972-10-03 1973-10-03

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7213331A NL7213331A (xx) 1972-10-03 1972-10-03

Publications (1)

Publication Number Publication Date
NL7213331A true NL7213331A (xx) 1974-04-05

Family

ID=19817058

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7213331A NL7213331A (xx) 1972-10-03 1972-10-03

Country Status (4)

Country Link
DE (1) DE2349203A1 (xx)
FR (1) FR2209128B1 (xx)
GB (1) GB1413610A (xx)
NL (1) NL7213331A (xx)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4323642A (en) * 1981-03-09 1982-04-06 Eastman Kodak Company Stable photographic developers containing an indazole antifoggant and a lignosulfonate

Also Published As

Publication number Publication date
GB1413610A (en) 1975-11-12
FR2209128B1 (xx) 1977-03-11
FR2209128A1 (xx) 1974-06-28
DE2349203A1 (de) 1974-04-18

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