GB1398088A - Polymers and photoresist compositions containing them - Google Patents
Polymers and photoresist compositions containing themInfo
- Publication number
- GB1398088A GB1398088A GB3936171A GB3936171A GB1398088A GB 1398088 A GB1398088 A GB 1398088A GB 3936171 A GB3936171 A GB 3936171A GB 3936171 A GB3936171 A GB 3936171A GB 1398088 A GB1398088 A GB 1398088A
- Authority
- GB
- United Kingdom
- Prior art keywords
- sensitizers
- polyester
- photo
- diazoketo
- glycols
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/52—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
- C08G63/54—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation the acids or hydroxy compounds containing carbocyclic rings
- C08G63/553—Acids or hydroxy compounds containing cycloaliphatic rings, e.g. Diels-Alder adducts
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
1398088 Photo-resist materials KODAK Ltd 17 Aug 1972 [23 Aug 1971] 39361/71 Heading G2C [Also in Division C3] Positive and negative working photo-resist compositions are made by combining a polyester derived from at least two glycols and one or more unsaturated alicyclic-dicarboxylic acids, the glycol mixture containing from 6.25 to 25 mole per cent, based on the glycol content of one or more glycols having free carboxylic acid groups, the polyester having an acid number of from 40-90; with a diazoketo sensitizer and an aryl azide sensitizer respectively in aqueous alkaline solution. Diazoketo sensitizers are described in Specifications 1230771; 1230773 and 1331441; 1, 2-dihydro- 2-diazo-1-oxo-5(-4' azidophenoxy-sulphonyl) -naphthalene being exemplified. Aryl azide sensitizers include 2: 6-di (4-azidobenzylidene)-4- methyl cyclohexanone and 4:4'-diazidostilbene -2: 2'-disulphonic acid. Particularly useful sensitizers are described in Specifications 767985; 886100; 892811 and U.S.A. Specification 2940853. The polyester may be dissolved in cyclohexanone or 2-methoxyethylacetate and adding the appropriate sensitizers. Examples 9 to 23 describe the preparation and testing of typical photo-resist materials.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3936171A GB1398088A (en) | 1971-08-23 | 1971-08-23 | Polymers and photoresist compositions containing them |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3936171A GB1398088A (en) | 1971-08-23 | 1971-08-23 | Polymers and photoresist compositions containing them |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1398088A true GB1398088A (en) | 1975-06-18 |
Family
ID=10409140
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3936171A Expired GB1398088A (en) | 1971-08-23 | 1971-08-23 | Polymers and photoresist compositions containing them |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1398088A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0140319A2 (en) * | 1983-10-24 | 1985-05-08 | The B.F. GOODRICH Company | Polynorbornene Negative Photoresist |
-
1971
- 1971-08-23 GB GB3936171A patent/GB1398088A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0140319A2 (en) * | 1983-10-24 | 1985-05-08 | The B.F. GOODRICH Company | Polynorbornene Negative Photoresist |
EP0140319A3 (en) * | 1983-10-24 | 1987-06-16 | The B.F. Goodrich Company | Polynorbornene negative photoresist |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |