GB1396209A - Devices for increasing the accuracy of addressing an electrn beam striking a target - Google Patents

Devices for increasing the accuracy of addressing an electrn beam striking a target

Info

Publication number
GB1396209A
GB1396209A GB1944873A GB1944873A GB1396209A GB 1396209 A GB1396209 A GB 1396209A GB 1944873 A GB1944873 A GB 1944873A GB 1944873 A GB1944873 A GB 1944873A GB 1396209 A GB1396209 A GB 1396209A
Authority
GB
United Kingdom
Prior art keywords
target
deflection
accuracy
point
servo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1944873A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of GB1396209A publication Critical patent/GB1396209A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70—Arrangements for deflecting ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/872—Magnetic field shield

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
GB1944873A 1972-04-25 1973-04-24 Devices for increasing the accuracy of addressing an electrn beam striking a target Expired GB1396209A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR727214639A FR2181467B1 (en:Method) 1972-04-25 1972-04-25

Publications (1)

Publication Number Publication Date
GB1396209A true GB1396209A (en) 1975-06-04

Family

ID=9097484

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1944873A Expired GB1396209A (en) 1972-04-25 1973-04-24 Devices for increasing the accuracy of addressing an electrn beam striking a target

Country Status (5)

Country Link
US (1) US3864597A (en:Method)
JP (1) JPS5218958B2 (en:Method)
DE (1) DE2320888C3 (en:Method)
FR (1) FR2181467B1 (en:Method)
GB (1) GB1396209A (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0023810A1 (en) * 1979-07-27 1981-02-11 Fujitsu Limited Method of electron beam exposure

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5186357A (en) * 1975-01-27 1976-07-28 Nippon Electron Optics Lab Denshisenichisetsuteihohooyobisoreojitsushiserusochi
NL182924C (nl) * 1978-05-12 1988-06-01 Philips Nv Inrichting voor het implanteren van ionen in een trefplaat.
DE2831602A1 (de) * 1978-07-19 1980-02-07 Leybold Heraeus Gmbh & Co Kg Vorrichtung zur erfassung von strahlparametern eines periodisch ueber eine zielflaeche gefuehrten, fokussierten ladungstraegerstrahls und messverfahren unter verwendung der vorrichtung
JPS5548949A (en) * 1978-10-02 1980-04-08 Jones Geraint A C Scribing device and method
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
JPS5633830A (en) * 1979-08-29 1981-04-04 Fujitsu Ltd Detecting method for mark positioning by electron beam
JPS6068692U (ja) * 1983-10-14 1985-05-15 横河電機株式会社 回路ユニツト収納機構
JPS60201626A (ja) * 1984-03-27 1985-10-12 Canon Inc 位置合わせ装置
US4677296A (en) * 1984-09-24 1987-06-30 Siemens Aktiengesellschaft Apparatus and method for measuring lengths in a scanning particle microscope
US4721842A (en) * 1986-08-29 1988-01-26 Ferranti Sciaky, Inc. Beam position correction device
US5786601A (en) * 1994-06-28 1998-07-28 Leica Lithography Systems Ltd. Electron beam lithography machine

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1171461A (en) * 1965-09-23 1969-11-19 Ass Elect Ind Improvements relating to the Focussing of Microscopes
US3547074A (en) * 1967-04-13 1970-12-15 Block Engineering Apparatus for forming microelements
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns
US3699304A (en) * 1969-12-15 1972-10-17 Ibm Electron beam deflection control method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0023810A1 (en) * 1979-07-27 1981-02-11 Fujitsu Limited Method of electron beam exposure

Also Published As

Publication number Publication date
JPS4954999A (en:Method) 1974-05-28
US3864597A (en) 1975-02-04
DE2320888B2 (de) 1979-02-22
JPS5218958B2 (en:Method) 1977-05-25
DE2320888A1 (de) 1973-11-08
FR2181467B1 (en:Method) 1974-07-26
DE2320888C3 (de) 1979-10-25
FR2181467A1 (en:Method) 1973-12-07

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee