GB1383239A - Photographic material - Google Patents
Photographic materialInfo
- Publication number
- GB1383239A GB1383239A GB1076872A GB1076872A GB1383239A GB 1383239 A GB1383239 A GB 1383239A GB 1076872 A GB1076872 A GB 1076872A GB 1076872 A GB1076872 A GB 1076872A GB 1383239 A GB1383239 A GB 1383239A
- Authority
- GB
- United Kingdom
- Prior art keywords
- photographic material
- march
- carboxylic acid
- acid imide
- agfagevaert
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract 3
- RHUYHJGZWVXEHW-UHFFFAOYSA-N 1,1-Dimethyhydrazine Chemical compound CN(C)N RHUYHJGZWVXEHW-UHFFFAOYSA-N 0.000 abstract 2
- -1 Carboxylic acid imide Chemical class 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 abstract 1
- 238000010992 reflux Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/125—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/13—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F3/00—Colour separation; Correction of tonal value
- G03F3/10—Checking the colour or tonal value of separation negatives or positives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/112—Cellulosic
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Indole Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712112141 DE2112141A1 (de) | 1971-03-13 | 1971-03-13 | Photographisches Material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1383239A true GB1383239A (en) | 1975-02-05 |
Family
ID=5801446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1076872A Expired GB1383239A (en) | 1971-03-13 | 1972-03-08 | Photographic material |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3782950A (cg-RX-API-DMAC7.html) |
| BE (1) | BE780405A (cg-RX-API-DMAC7.html) |
| CA (1) | CA971819A (cg-RX-API-DMAC7.html) |
| CH (1) | CH586407A5 (cg-RX-API-DMAC7.html) |
| DE (1) | DE2112141A1 (cg-RX-API-DMAC7.html) |
| FR (1) | FR2130183B1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB1383239A (cg-RX-API-DMAC7.html) |
| IT (1) | IT952188B (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115521314A (zh) * | 2021-06-25 | 2022-12-27 | 广东聚华印刷显示技术有限公司 | 具有吡咯烷酮基的有机化合物及制备方法、有机发光器件 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2228110A1 (de) * | 1972-06-09 | 1973-12-20 | Agfa Gevaert Ag | Lichtempfindliches photographisches material |
| GB2008784B (en) * | 1977-11-17 | 1982-04-15 | Asahi Chemical Ind | Heat resistant photoresist composition and process for preparing the same |
| JPS607261B2 (ja) * | 1978-10-02 | 1985-02-23 | 旭化成株式会社 | 感光性エラストマ−組成物 |
| JPS5651735A (en) * | 1979-10-03 | 1981-05-09 | Asahi Chem Ind Co Ltd | Photoreactive composition |
| US4654233A (en) * | 1984-11-21 | 1987-03-31 | Minnesota Mining And Manufacturing Company | Radiation-curable thermoplastic coating |
| US4565857A (en) * | 1984-11-21 | 1986-01-21 | Minnesota Mining And Manufacturing Company | Radiation-curable cellulose coating |
| US4861629A (en) * | 1987-12-23 | 1989-08-29 | Hercules Incorporated | Polyfunctional ethylenically unsaturated cellulosic polymer-based photocurable compositions |
| US4855184A (en) * | 1988-02-02 | 1989-08-08 | Minnesota Mining And Manufacturing Company | Radiation-curable protective coating composition |
| US5049623A (en) * | 1989-08-03 | 1991-09-17 | Monsanto Company | Ethylenically unsaturated carbamates and coating compositions |
| US5055518A (en) * | 1989-08-03 | 1991-10-08 | Monsanto Company | Ethylenically unsaturated carbamates and coating compositions |
| US5157093A (en) * | 1990-05-10 | 1992-10-20 | Ciba-Geigy Corporation | Hydroxyethyl cellulose derivatives containing pendant (meth)acryloyl units bound through urethane groups and hydrogel contact lenses made therefrom |
| JP3461029B2 (ja) | 1994-05-26 | 2003-10-27 | 大日本インキ化学工業株式会社 | ペリレン顔料組成物及び該組成物を含有する塗料 |
| JP2009214428A (ja) * | 2008-03-11 | 2009-09-24 | Fujifilm Corp | 平版印刷版原版および平版印刷方法 |
| JP5618053B2 (ja) * | 2010-03-24 | 2014-11-05 | 株式会社日本コンタクトレンズ | コンタクトレンズ、及びその製造方法 |
-
1971
- 1971-03-13 DE DE19712112141 patent/DE2112141A1/de active Pending
-
1972
- 1972-03-08 GB GB1076872A patent/GB1383239A/en not_active Expired
- 1972-03-09 BE BE780405A patent/BE780405A/xx unknown
- 1972-03-10 CA CA136,778A patent/CA971819A/en not_active Expired
- 1972-03-10 IT IT48891/72A patent/IT952188B/it active
- 1972-03-10 US US00233753A patent/US3782950A/en not_active Expired - Lifetime
- 1972-03-13 FR FR7208711A patent/FR2130183B1/fr not_active Expired
- 1972-03-13 CH CH363472A patent/CH586407A5/xx not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115521314A (zh) * | 2021-06-25 | 2022-12-27 | 广东聚华印刷显示技术有限公司 | 具有吡咯烷酮基的有机化合物及制备方法、有机发光器件 |
| CN115521314B (zh) * | 2021-06-25 | 2024-07-05 | 广东聚华印刷显示技术有限公司 | 具有吡咯烷酮基的有机化合物及制备方法、有机发光器件 |
Also Published As
| Publication number | Publication date |
|---|---|
| BE780405A (fr) | 1972-09-11 |
| US3782950A (en) | 1974-01-01 |
| CA971819A (en) | 1975-07-29 |
| CH586407A5 (cg-RX-API-DMAC7.html) | 1977-03-31 |
| FR2130183B1 (cg-RX-API-DMAC7.html) | 1977-01-14 |
| IT952188B (it) | 1973-07-20 |
| DE2112141A1 (de) | 1972-10-05 |
| FR2130183A1 (cg-RX-API-DMAC7.html) | 1972-11-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |