GB1364951A - Twophase charge coupled device - Google Patents
Twophase charge coupled deviceInfo
- Publication number
- GB1364951A GB1364951A GB3843472A GB3843472A GB1364951A GB 1364951 A GB1364951 A GB 1364951A GB 3843472 A GB3843472 A GB 3843472A GB 3843472 A GB3843472 A GB 3843472A GB 1364951 A GB1364951 A GB 1364951A
- Authority
- GB
- United Kingdom
- Prior art keywords
- areas
- charge
- aug
- coupled device
- diffused
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 239000000969 carrier Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 230000000873 masking effect Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/762—Charge transfer devices
- H01L29/765—Charge-coupled devices
- H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
- H01L29/76866—Surface Channel CCD
- H01L29/76875—Two-Phase CCD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1025—Channel region of field-effect devices
- H01L29/1062—Channel region of field-effect devices of charge coupled devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/107—Substrate region of field-effect devices
- H01L29/1091—Substrate region of field-effect devices of charge coupled devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42396—Gate electrodes for field effect devices for charge coupled devices
Abstract
1364951 Charge-coupled devices SONY CORP 17 Aug 1972 [19 Aug 1971] 38434/72 Heading H1K A two phase charge coupled device Fig. 3, comprises two interdigitated sets of field electrodes, e.g. of aluminium, each electrode of each set overlying two adjacent areas 11L, 11R of different crystallographic orientation so as to provide an assymmetrical potential well thereunder to ensure unidirectional transfer of the pocket of minority carriers from a diffused P- type carrier injection zone 76 to a similar diffused collector zone 77. The differently orientated areas may be produced by forming rectangular apertures with edges aligned in <110> directions in an oxide coating on a 100 oriented surface of an N-type silicon body, etching the surface anisotropically in potassium hydroxide or an amine-pyrocatechol-water mixture to form V-shaped grooves with [111] oriented sides and removing the masking. The areas of the body on each side of the charge transfer channel are continuously grooved to act as channel stoppers. Other suitable pairs of orientations are [111] and [110], and [110] and [100].
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP46063165A JPS5132457B2 (en) | 1971-08-19 | 1971-08-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1364951A true GB1364951A (en) | 1974-08-29 |
Family
ID=13221343
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3843472A Expired GB1364951A (en) | 1971-08-19 | 1972-08-17 | Twophase charge coupled device |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5132457B2 (en) |
CA (1) | CA973972A (en) |
DE (1) | DE2240790A1 (en) |
GB (1) | GB1364951A (en) |
NL (1) | NL7211422A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5119038A (en) * | 1974-08-08 | 1976-02-16 | Toyota Motor Co Ltd | Denchakutosodeno kawakimuraboshihoho |
JPS5332684A (en) * | 1976-09-07 | 1978-03-28 | Toshiba Corp | Semiconductor memory device |
US4234887A (en) * | 1979-05-24 | 1980-11-18 | International Business Machines Corporation | V-Groove charge-coupled device |
-
1971
- 1971-08-19 JP JP46063165A patent/JPS5132457B2/ja not_active Expired
-
1972
- 1972-08-15 CA CA149,470A patent/CA973972A/en not_active Expired
- 1972-08-17 GB GB3843472A patent/GB1364951A/en not_active Expired
- 1972-08-18 DE DE19722240790 patent/DE2240790A1/en active Pending
- 1972-08-21 NL NL7211422A patent/NL7211422A/xx not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
NL7211422A (en) | 1973-02-21 |
DE2240790A1 (en) | 1973-03-01 |
CA973972A (en) | 1975-09-02 |
JPS4829378A (en) | 1973-04-18 |
JPS5132457B2 (en) | 1976-09-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1414840A (en) | Light-activated lateral thyristor and ac switch | |
GB1377128A (en) | Charge coupled circuits | |
GB1470192A (en) | ||
JPS55133574A (en) | Insulated gate field effect transistor | |
GB1236986A (en) | Low bulk leakage current avalanche photo-diode | |
GB1507091A (en) | Schottky-gate field-effect transistors | |
GB1220306A (en) | Triac structure | |
GB1379141A (en) | Charge coupled devices | |
GB1364951A (en) | Twophase charge coupled device | |
JPS5515275A (en) | Charge transfer device | |
GB742238A (en) | Improvements in barrier layer cells | |
GB1369357A (en) | Semiconductive devices | |
JPS5694732A (en) | Semiconductor substrate | |
GB1484218A (en) | Semiconductor rectifiers | |
GB1322110A (en) | Charge-coupled device | |
GB1355890A (en) | Contacts for solar cells | |
GB686958A (en) | Improvements in or relating to electric crystal rectifiers | |
JPS575361A (en) | Charge transfer device | |
GB1211733A (en) | Semiconductor device | |
JPS5591874A (en) | V-groove structure mosfet | |
JPS55162258A (en) | Semiconductor memory device | |
JPS5275190A (en) | Production of 4-phase drive charge coupling device | |
JPS5698865A (en) | Charge coupled device | |
JPS55117270A (en) | Junction breakdown type field programmable cell array semiconductor device | |
JPS55121678A (en) | Charge transfer device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |