GB1355256A - Photopolymerisable compositions - Google Patents
Photopolymerisable compositionsInfo
- Publication number
- GB1355256A GB1355256A GB2604571A GB2604571A GB1355256A GB 1355256 A GB1355256 A GB 1355256A GB 2604571 A GB2604571 A GB 2604571A GB 2604571 A GB2604571 A GB 2604571A GB 1355256 A GB1355256 A GB 1355256A
- Authority
- GB
- United Kingdom
- Prior art keywords
- weight
- solid
- compound
- rhodium
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
1355256 Photopolymerizable compositions E I DU PONT DE NEMOURS & CO 19 April 1971 [2 April 1970] 26045/71 Heading C3P [Also in Division G2] A photopolymerizable composition comprises an organic solvent having the following other constituents dissolved therein: (a) 5- 85% by weight of a solid organic noble metal (i.e. ruthenium, osmium, rhodium, iridium, palladium, platinum, silver or gold) compound; (b) 5-30% by weight of at least one photopolymerizable compound, this compound, or if more than one such compound is present at least 50% of these compounds, being provided by one or more polyfunctional (i.e. having at least two unsaturated groups) acrylates derived from polyols in which the hydroxyl groups are separated by at least three atoms; and (c) a solid organic sensitizer. The composition may also contain (d) up to 60% by weight of one or more solid organosulphur compounds; and/or (e) up to 50% by weight of a solid flux; and/or (f) up to 15% by weight of a solid polymeric ester, (a) may comprise one or more of the pinene mercaptides of platinum, palladium, gold, silver, ruthenium, rhodium, osmium or iridium. The polyfunctional acrylate (b) may be a di-, tri- or tetra-acrylate or a mixture of two or all thereof, (c) may be tertiary butyl anthraquinone, benzoin methyl ether or a mixture thereof, (d) may be a sulphurized damar resin, (e) may be rhodium, bismuth or vanadium resinate or a mixture thereof. Reference has been directed by the Comptroller to Specification 1,260,440.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US2523670A | 1970-04-02 | 1970-04-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1355256A true GB1355256A (en) | 1974-06-05 |
Family
ID=21824851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2604571A Expired GB1355256A (en) | 1970-04-02 | 1971-04-19 | Photopolymerisable compositions |
Country Status (6)
Country | Link |
---|---|
BE (1) | BE765134A (en) |
CA (1) | CA943803A (en) |
DE (1) | DE2115945C3 (en) |
FR (1) | FR2089053A5 (en) |
GB (1) | GB1355256A (en) |
NL (1) | NL7104376A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2448821C2 (en) * | 1974-10-14 | 1986-01-30 | Hoechst Ag, 6230 Frankfurt | Method of transferring a thermoplastic photopolymerizable layer and layer transfer material |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE525225A (en) * | 1951-08-20 |
-
1971
- 1971-03-26 CA CA108,887A patent/CA943803A/en not_active Expired
- 1971-04-01 DE DE19712115945 patent/DE2115945C3/en not_active Expired
- 1971-04-01 BE BE765134A patent/BE765134A/en unknown
- 1971-04-01 FR FR7111601A patent/FR2089053A5/fr not_active Expired
- 1971-04-01 NL NL7104376A patent/NL7104376A/xx unknown
- 1971-04-19 GB GB2604571A patent/GB1355256A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
NL7104376A (en) | 1971-10-05 |
FR2089053A5 (en) | 1972-01-07 |
CA943803A (en) | 1974-03-19 |
DE2115945B2 (en) | 1978-03-16 |
DE2115945A1 (en) | 1971-10-14 |
BE765134A (en) | 1971-10-01 |
DE2115945C3 (en) | 1986-04-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PE20 | Patent expired after termination of 20 years |