GB1355252A - Electron lenses of the magnetic field type - Google Patents

Electron lenses of the magnetic field type

Info

Publication number
GB1355252A
GB1355252A GB1405671*[A GB1405671A GB1355252A GB 1355252 A GB1355252 A GB 1355252A GB 1405671 A GB1405671 A GB 1405671A GB 1355252 A GB1355252 A GB 1355252A
Authority
GB
United Kingdom
Prior art keywords
coils
magnetic
compensating
lens
path member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1405671*[A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of GB1355252A publication Critical patent/GB1355252A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/14Lenses magnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Electron Sources, Ion Sources (AREA)
GB1405671*[A 1970-05-13 1971-05-10 Electron lenses of the magnetic field type Expired GB1355252A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP45040630A JPS4929089B1 (US07923587-20110412-C00001.png) 1970-05-13 1970-05-13

Publications (1)

Publication Number Publication Date
GB1355252A true GB1355252A (en) 1974-06-05

Family

ID=12585850

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1405671*[A Expired GB1355252A (en) 1970-05-13 1971-05-10 Electron lenses of the magnetic field type

Country Status (4)

Country Link
US (1) US3736423A (US07923587-20110412-C00001.png)
JP (1) JPS4929089B1 (US07923587-20110412-C00001.png)
DE (1) DE2123576B2 (US07923587-20110412-C00001.png)
GB (1) GB1355252A (US07923587-20110412-C00001.png)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3984687A (en) * 1975-03-17 1976-10-05 International Business Machines Corporation Shielded magnetic lens and deflection yoke structure for electron beam column
FR2413776A1 (fr) * 1978-01-03 1979-07-27 Thomson Csf Objectif d'optique electronique
NL7804035A (nl) * 1978-04-17 1979-10-19 Philips Nv Elektronenmikroskoop.
DE3010815C2 (de) * 1980-03-20 1982-08-19 Siemens AG, 1000 Berlin und 8000 München Hochstrom-Elektronenquelle
EP2418672B1 (en) * 2010-08-11 2013-03-20 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens
EP2827357A1 (en) * 2013-07-18 2015-01-21 Fei Company Magnetic lens for focusing a beam of charged particles
TWI744671B (zh) * 2018-08-03 2021-11-01 日商紐富來科技股份有限公司 電子光學系統及多射束圖像取得裝置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046397A (en) * 1959-06-17 1962-07-24 Tesla Np Device for compensating axial astigmatism of electron-optical systems
US3150258A (en) * 1962-07-05 1964-09-22 Philips Electronic Pharma Electromagnetic stigmators for correcting electron-optical deficiencies in the lenses of electron beam instruments

Also Published As

Publication number Publication date
US3736423A (en) 1973-05-29
DE2123576B2 (de) 1976-10-07
DE2123576A1 (de) 1971-12-02
JPS4929089B1 (US07923587-20110412-C00001.png) 1974-08-01

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees