GB1333993A - Method and apparatus for monitoring vapour density in an electron beam furnace - Google Patents

Method and apparatus for monitoring vapour density in an electron beam furnace

Info

Publication number
GB1333993A
GB1333993A GB4417171A GB4417171A GB1333993A GB 1333993 A GB1333993 A GB 1333993A GB 4417171 A GB4417171 A GB 4417171A GB 4417171 A GB4417171 A GB 4417171A GB 1333993 A GB1333993 A GB 1333993A
Authority
GB
United Kingdom
Prior art keywords
vapour
density
electron beam
light
path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4417171A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airco Inc
Original Assignee
Airco Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Airco Inc filed Critical Airco Inc
Publication of GB1333993A publication Critical patent/GB1333993A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00—Vacuum gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/3103—Atomic absorption analysis

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
GB4417171A 1970-10-12 1971-09-22 Method and apparatus for monitoring vapour density in an electron beam furnace Expired GB1333993A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8006370A 1970-10-12 1970-10-12

Publications (1)

Publication Number Publication Date
GB1333993A true GB1333993A (en) 1973-10-17

Family

ID=22155025

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4417171A Expired GB1333993A (en) 1970-10-12 1971-09-22 Method and apparatus for monitoring vapour density in an electron beam furnace

Country Status (5)

Country Link
CA (1) CA974377A (cg-RX-API-DMAC10.html)
DE (1) DE2149234A1 (cg-RX-API-DMAC10.html)
FR (1) FR2109887A5 (cg-RX-API-DMAC10.html)
GB (1) GB1333993A (cg-RX-API-DMAC10.html)
IT (1) IT940949B (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116732490A (zh) * 2023-05-23 2023-09-12 重庆金美新材料科技有限公司 一种蒸镀温度调节方法及系统

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4845041A (en) * 1985-11-20 1989-07-04 Analyte Corporation Atomic-absorption sputtering chamber and system
US7130062B2 (en) 2005-01-28 2006-10-31 Raytheon Company Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116732490A (zh) * 2023-05-23 2023-09-12 重庆金美新材料科技有限公司 一种蒸镀温度调节方法及系统

Also Published As

Publication number Publication date
FR2109887A5 (cg-RX-API-DMAC10.html) 1972-05-26
DE2149234A1 (de) 1972-04-13
IT940949B (it) 1973-02-20
CA974377A (en) 1975-09-16

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee