CA974377A - Method and apparatus for monitoring vapor density - Google Patents

Method and apparatus for monitoring vapor density

Info

Publication number
CA974377A
CA974377A CA122,805A CA122805A CA974377A CA 974377 A CA974377 A CA 974377A CA 122805 A CA122805 A CA 122805A CA 974377 A CA974377 A CA 974377A
Authority
CA
Canada
Prior art keywords
vapor density
monitoring vapor
monitoring
density
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA122,805A
Other languages
English (en)
Other versions
CA122805S (en
Inventor
Hugh R. Smith (Jr.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airco Inc
Original Assignee
Airco Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Airco Inc filed Critical Airco Inc
Application granted granted Critical
Publication of CA974377A publication Critical patent/CA974377A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/544Controlling the film thickness or evaporation rate using measurement in the gas phase
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00Vacuum gauges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/3103Atomic absorption analysis

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
CA122,805A 1970-10-12 1971-09-14 Method and apparatus for monitoring vapor density Expired CA974377A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8006370A 1970-10-12 1970-10-12

Publications (1)

Publication Number Publication Date
CA974377A true CA974377A (en) 1975-09-16

Family

ID=22155025

Family Applications (1)

Application Number Title Priority Date Filing Date
CA122,805A Expired CA974377A (en) 1970-10-12 1971-09-14 Method and apparatus for monitoring vapor density

Country Status (5)

Country Link
CA (1) CA974377A (cg-RX-API-DMAC10.html)
DE (1) DE2149234A1 (cg-RX-API-DMAC10.html)
FR (1) FR2109887A5 (cg-RX-API-DMAC10.html)
GB (1) GB1333993A (cg-RX-API-DMAC10.html)
IT (1) IT940949B (cg-RX-API-DMAC10.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4845041A (en) * 1985-11-20 1989-07-04 Analyte Corporation Atomic-absorption sputtering chamber and system
US7130062B2 (en) 2005-01-28 2006-10-31 Raytheon Company Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators
CN116732490A (zh) * 2023-05-23 2023-09-12 重庆金美新材料科技有限公司 一种蒸镀温度调节方法及系统

Also Published As

Publication number Publication date
GB1333993A (en) 1973-10-17
FR2109887A5 (cg-RX-API-DMAC10.html) 1972-05-26
DE2149234A1 (de) 1972-04-13
IT940949B (it) 1973-02-20

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