CA974377A - Method and apparatus for monitoring vapor density - Google Patents
Method and apparatus for monitoring vapor densityInfo
- Publication number
- CA974377A CA974377A CA122,805A CA122805A CA974377A CA 974377 A CA974377 A CA 974377A CA 122805 A CA122805 A CA 122805A CA 974377 A CA974377 A CA 974377A
- Authority
- CA
- Canada
- Prior art keywords
- vapor density
- monitoring vapor
- monitoring
- density
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title 1
- 238000012544 monitoring process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/3103—Atomic absorption analysis
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Plasma & Fusion (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US8006370A | 1970-10-12 | 1970-10-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA974377A true CA974377A (en) | 1975-09-16 |
Family
ID=22155025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA122,805A Expired CA974377A (en) | 1970-10-12 | 1971-09-14 | Method and apparatus for monitoring vapor density |
Country Status (5)
| Country | Link |
|---|---|
| CA (1) | CA974377A (cg-RX-API-DMAC10.html) |
| DE (1) | DE2149234A1 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2109887A5 (cg-RX-API-DMAC10.html) |
| GB (1) | GB1333993A (cg-RX-API-DMAC10.html) |
| IT (1) | IT940949B (cg-RX-API-DMAC10.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4845041A (en) * | 1985-11-20 | 1989-07-04 | Analyte Corporation | Atomic-absorption sputtering chamber and system |
| US7130062B2 (en) | 2005-01-28 | 2006-10-31 | Raytheon Company | Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators |
| CN116732490A (zh) * | 2023-05-23 | 2023-09-12 | 重庆金美新材料科技有限公司 | 一种蒸镀温度调节方法及系统 |
-
1971
- 1971-09-14 CA CA122,805A patent/CA974377A/en not_active Expired
- 1971-09-22 GB GB4417171A patent/GB1333993A/en not_active Expired
- 1971-09-27 IT IT5311471A patent/IT940949B/it active
- 1971-09-30 FR FR7135187A patent/FR2109887A5/fr not_active Expired
- 1971-10-01 DE DE19712149234 patent/DE2149234A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1333993A (en) | 1973-10-17 |
| FR2109887A5 (cg-RX-API-DMAC10.html) | 1972-05-26 |
| DE2149234A1 (de) | 1972-04-13 |
| IT940949B (it) | 1973-02-20 |
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