GB1317974A - Preparation of plate elements provided with relief images - Google Patents
Preparation of plate elements provided with relief imagesInfo
- Publication number
- GB1317974A GB1317974A GB3215470A GB3215470A GB1317974A GB 1317974 A GB1317974 A GB 1317974A GB 3215470 A GB3215470 A GB 3215470A GB 3215470 A GB3215470 A GB 3215470A GB 1317974 A GB1317974 A GB 1317974A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- reaction product
- relief images
- preparation
- july
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007795 chemical reaction product Substances 0.000 abstract 4
- 229910052793 cadmium Inorganic materials 0.000 abstract 3
- 229910052785 arsenic Inorganic materials 0.000 abstract 2
- 229910052732 germanium Inorganic materials 0.000 abstract 2
- 229910052738 indium Inorganic materials 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 229910052711 selenium Inorganic materials 0.000 abstract 2
- 229910052717 sulfur Inorganic materials 0.000 abstract 2
- 229910052714 tellurium Inorganic materials 0.000 abstract 2
- 229910052718 tin Inorganic materials 0.000 abstract 2
- UKUVVAMSXXBMRX-UHFFFAOYSA-N 2,4,5-trithia-1,3-diarsabicyclo[1.1.1]pentane Chemical compound S1[As]2S[As]1S2 UKUVVAMSXXBMRX-UHFFFAOYSA-N 0.000 abstract 1
- 229910052787 antimony Inorganic materials 0.000 abstract 1
- 229910052797 bismuth Inorganic materials 0.000 abstract 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000003518 caustics Substances 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052733 gallium Inorganic materials 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 229910052753 mercury Inorganic materials 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 239000012047 saturated solution Substances 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 229910052716 thallium Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0044—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BE687248 | 1966-09-22 | ||
US83903869A | 1969-07-03 | 1969-07-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1317974A true GB1317974A (en) | 1973-05-23 |
Family
ID=25656480
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3215470A Expired GB1317974A (en) | 1966-09-22 | 1970-07-02 | Preparation of plate elements provided with relief images |
Country Status (7)
Country | Link |
---|---|
US (1) | US3637381A (enrdf_load_stackoverflow) |
AT (1) | AT313700B (enrdf_load_stackoverflow) |
BE (1) | BE687248A (enrdf_load_stackoverflow) |
CH (1) | CH539868A (enrdf_load_stackoverflow) |
DE (1) | DE2032429A1 (enrdf_load_stackoverflow) |
GB (1) | GB1317974A (enrdf_load_stackoverflow) |
NL (1) | NL7009162A (enrdf_load_stackoverflow) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2119960C3 (de) * | 1971-04-23 | 1978-06-01 | Institut Kibernetiki Akademii Nauk Ukrainskoj Ssr | Verfahren zur Herstellung von haftfesten Dünnschichtstrukturen |
US3819377A (en) * | 1971-08-12 | 1974-06-25 | Energy Conversion Devices Inc | Method of imaging and imaging material |
US3996057A (en) * | 1972-12-07 | 1976-12-07 | Fuji Photo Film Co., Ltd. | Heat development process for forming images utilizing a photographic material containing a metal layer and an inorganic material layer |
DE2439848C2 (de) * | 1973-08-20 | 1985-05-15 | Canon K.K., Tokio/Tokyo | Verfahren zum Aufzeichnen mittels eines Laserstrahls |
US3999990A (en) * | 1973-08-28 | 1976-12-28 | Technion Research And Development Foundation, Ltd. | Imaging by light-enhanced vaporization |
CA1092877A (en) * | 1976-11-05 | 1981-01-06 | Nicholas F. Borrelli | Photosensitive film and methods |
US4318978A (en) * | 1976-11-05 | 1982-03-09 | Corning Glass Works | Photosensitive film and methods |
US4252891A (en) * | 1977-07-29 | 1981-02-24 | Kostyshin Maxim T | Method of manufacturing embossed articles of preset configuration |
US4234625A (en) * | 1978-01-19 | 1980-11-18 | Petrov Vyacheslav V | Process for producing material sensitive to electromagnetic and corpuscular radiation |
US4226666A (en) * | 1978-08-21 | 1980-10-07 | International Business Machines Corporation | Etching method employing radiation and noble gas halide |
US4314256A (en) * | 1979-06-12 | 1982-02-02 | Petrov Vyacheslav V | Radiation-sensitive material and method for recording information on radiation-sensitive material |
US4284711A (en) * | 1979-08-21 | 1981-08-18 | Birlain Noris Armando | Presensitized planographic printing plates with cobalt adhesive layer |
US4569124A (en) * | 1984-05-22 | 1986-02-11 | Hughes Aircraft Company | Method for forming thin conducting lines by ion implantation and preferential etching |
US4702994A (en) * | 1984-10-01 | 1987-10-27 | W. R. Grace & Co. | Projection imaged relief printing plates |
CA1308596C (en) * | 1986-01-13 | 1992-10-13 | Rohm And Haas Company | Microplastic structures and method of manufacture |
US4838989A (en) * | 1987-08-25 | 1989-06-13 | The United States Of America As Represented By The United States Department Of Energy | Laser-driven fusion etching process |
US5350484A (en) * | 1992-09-08 | 1994-09-27 | Intel Corporation | Method for the anisotropic etching of metal films in the fabrication of interconnects |
MX9305898A (es) * | 1992-10-30 | 1995-01-31 | Texas Instruments Inc | Metodo de grabado fotoquimico anisotropico para la fabricacion decircuitos integrados. |
US5493971A (en) * | 1994-04-13 | 1996-02-27 | Presstek, Inc. | Laser-imageable printing members and methods for wet lithographic printing |
US7019819B2 (en) * | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
US7641840B2 (en) * | 2002-11-13 | 2010-01-05 | Molecular Imprints, Inc. | Method for expelling gas positioned between a substrate and a mold |
US20050077298A1 (en) * | 2003-10-14 | 2005-04-14 | Sonoco Development, Inc. | Easy-opening container and closure with radiation-weakened bond and method therefor |
US8215946B2 (en) | 2006-05-18 | 2012-07-10 | Molecular Imprints, Inc. | Imprint lithography system and method |
WO2009072958A1 (en) * | 2007-12-05 | 2009-06-11 | Sandvik Intellectual Property Ab | Breaking or excavating tool with cemented tungsten carbide insert and ring, material removing machine incorporating such a tool and method of manufacturing such a tool |
WO2010062723A2 (en) * | 2008-11-03 | 2010-06-03 | Brigham Young University | Data storage media containing magnesium metal layer |
WO2014149805A1 (en) * | 2013-03-19 | 2014-09-25 | Eastman Kodak Company | Method of sequestering metals using thiosulfate polymers |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB344354A (en) * | 1929-11-29 | 1931-03-02 | Gen Electric Co Ltd | Improved process for the manufacture of photographically sensitive materials |
US2912592A (en) * | 1954-10-07 | 1959-11-10 | Horizons Inc | Memory device |
US2844493A (en) * | 1955-02-11 | 1958-07-22 | Horizons Inc | High resistance photoconductor |
US2841477A (en) * | 1957-03-04 | 1958-07-01 | Pacific Semiconductors Inc | Photochemically activated gaseous etching method |
US2962376A (en) * | 1958-05-14 | 1960-11-29 | Haloid Xerox Inc | Xerographic member |
US3170790A (en) * | 1959-01-08 | 1965-02-23 | Xerox Corp | Red sensitive xerographic plate and process therefor |
US3082085A (en) * | 1959-04-27 | 1963-03-19 | Minnesota Mining & Mfg | Electrical photography |
GB968141A (en) * | 1960-02-15 | 1964-08-26 | Photoelectric Ltd | Improvements in the production of etched surfaces |
US3122463A (en) * | 1961-03-07 | 1964-02-25 | Bell Telephone Labor Inc | Etching technique for fabricating semiconductor or ceramic devices |
NL275192A (enrdf_load_stackoverflow) * | 1961-06-30 | |||
DE1273082B (de) * | 1962-04-03 | 1968-07-18 | Jenaer Glaswerk Schott & Gen | Verwendung von Glaesern der Mehrstoffsysteme Arsen-Schwefel-Halogen fuer die lichtempfindlichen Teile von Fotowiderstaenden |
US3271180A (en) * | 1962-06-19 | 1966-09-06 | Ibm | Photolytic processes for fabricating thin film patterns |
US3317409A (en) * | 1963-04-16 | 1967-05-02 | Minnesota Mining & Mfg | Electrolytic electrophotography |
US3346384A (en) * | 1963-04-25 | 1967-10-10 | Gen Electric | Metal image formation |
DE1250737B (enrdf_load_stackoverflow) * | 1963-07-08 | |||
US3386823A (en) * | 1964-06-01 | 1968-06-04 | Ibm | Photothermic image producing process |
US3377169A (en) * | 1965-03-30 | 1968-04-09 | Du Pont | Copper thallium and lead halide and pseudohalides photosoluble crystals |
FR1534597A (fr) * | 1966-12-31 | 1968-07-26 | Inst Phisikochimia Pri Bulgars | Procédé de préparation de matériaux photogrpahiques à base de composés photosensibles exempts d'argent |
-
1966
- 1966-09-22 BE BE687248D patent/BE687248A/xx unknown
-
1969
- 1969-07-03 US US839038A patent/US3637381A/en not_active Expired - Lifetime
-
1970
- 1970-06-23 NL NL7009162A patent/NL7009162A/xx unknown
- 1970-06-29 CH CH984170A patent/CH539868A/fr not_active IP Right Cessation
- 1970-06-30 DE DE19702032429 patent/DE2032429A1/de active Pending
- 1970-07-02 GB GB3215470A patent/GB1317974A/en not_active Expired
- 1970-07-02 AT AT600170A patent/AT313700B/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
NL7009162A (enrdf_load_stackoverflow) | 1971-01-05 |
US3637381A (en) | 1972-01-25 |
DE2032429A1 (de) | 1971-01-21 |
CH539868A (fr) | 1973-09-14 |
AT313700B (de) | 1974-02-25 |
BE687248A (enrdf_load_stackoverflow) | 1967-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PLNP | Patent lapsed through nonpayment of renewal fees |