GB1316846A - Method for the electrolytical deposition of highly ductile copper - Google Patents

Method for the electrolytical deposition of highly ductile copper

Info

Publication number
GB1316846A
GB1316846A GB3335270A GB3335270A GB1316846A GB 1316846 A GB1316846 A GB 1316846A GB 3335270 A GB3335270 A GB 3335270A GB 3335270 A GB3335270 A GB 3335270A GB 1316846 A GB1316846 A GB 1316846A
Authority
GB
United Kingdom
Prior art keywords
bath
copper
july
passing
electrolysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3335270A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FLUHMANN GALVANISCHE ANSTALT W
Original Assignee
FLUHMANN GALVANISCHE ANSTALT W
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FLUHMANN GALVANISCHE ANSTALT W filed Critical FLUHMANN GALVANISCHE ANSTALT W
Publication of GB1316846A publication Critical patent/GB1316846A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/06Filtering particles other than ions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

1316846 Electrolytic deposition of copper WERNER FLUHMANN GALVANISCHE ANSTALT 9 July 1970 [10 July 1969] 33352/70 Heading C7B Copper is electrolytically deposited from a bath comprising copper pyrophosphate and/or the combination of copper sulphate and potassium pyrophosphate. The method includes (a) before starting electrolysis, passing the bath through at least one micropore filter, and (b) during electrolysis passing the bath through at least one micropore filter, the steps (a) and (b) serving to hold the bath constantly free during electrolysis from particles having a grain size exceeding 3 microns. Thereby the deposited copper is pore-free, has a ductility of more than 6% measured as ultimate linear elongation at room temperature and has a total impurity content of less than 100 ppm. Before step (a), the bath may be purified with an adsorption agent such as active carbon, silica gel, alumina or a molecular sieve. During step (b), the bath temperature may be 30-75‹C and the pH be 7-9. The electrolysing current may be periodically interrupted or its polarity be periodically changed. Alternatively, alternating current may be superimposed on direct current. The method may be used in making printed circuits, the substrate first being rendered conductive.
GB3335270A 1969-07-10 1970-07-09 Method for the electrolytical deposition of highly ductile copper Expired GB1316846A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1056369A CH494824A (en) 1969-07-10 1969-07-10 Process for the electrodeposition of copper with high ductility

Publications (1)

Publication Number Publication Date
GB1316846A true GB1316846A (en) 1973-05-16

Family

ID=4364536

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3335270A Expired GB1316846A (en) 1969-07-10 1970-07-09 Method for the electrolytical deposition of highly ductile copper

Country Status (7)

Country Link
US (1) US3660251A (en)
AT (1) AT302763B (en)
CH (1) CH494824A (en)
DE (1) DE2034144A1 (en)
FR (1) FR2051660B3 (en)
GB (1) GB1316846A (en)
NL (1) NL7010237A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2558423B2 (en) * 1975-12-23 1978-09-07 Messerschmitt-Boelkow-Blohm Gmbh, 8000 Muenchen Process for the electrodeposition of nickel from a nickel sulfamate bath
FR2531458A1 (en) * 1982-08-04 1984-02-10 Stephanois Rech Mec PROCESS FOR SURFACE TREATMENT OF FERROUS SURFACES TO IMPROVE THEIR FRICTION QUALITY AND RESISTANCE TO WEAR AND INJURY
US4568431A (en) * 1984-11-13 1986-02-04 Olin Corporation Process for producing electroplated and/or treated metal foil
US4532014A (en) * 1984-11-13 1985-07-30 Olin Corporation Laser alignment system
US4549950A (en) * 1984-11-13 1985-10-29 Olin Corporation Systems for producing electroplated and/or treated metal foil
DE3687089T3 (en) * 1985-07-05 1999-10-07 Mitsui Mining & Smelting Co., Ltd. Process for producing copper foil by electrodeposition.
DE3870685D1 (en) * 1987-02-23 1992-06-11 Siemens Ag GALVANIZING DEVICE FOR GENERATING BUMPER ON CHIP COMPONENTS.
US4956053A (en) * 1988-05-26 1990-09-11 Olin Corporation Apparatus and process for the production of micro-pore free high ductility metal foil
DE69712999T2 (en) * 1996-07-26 2003-01-23 Nec Corp., Tokio/Tokyo Solid electrolytic capacitor with pre-plated conductor connections and its manufacturing process
GB2564149A (en) * 2017-07-05 2019-01-09 Skf Ab Electroplated cage for rolling element bearing

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA715549A (en) * 1965-08-10 Martin Rudolf Electro-deposition assemblies
US1798994A (en) * 1929-01-04 1931-03-31 Gen Electric Electroplating apparatus
US3222268A (en) * 1961-07-13 1965-12-07 Udylite Corp Particle separator device for plating baths
BE621297A (en) * 1961-08-10
US3208921A (en) * 1962-01-02 1965-09-28 Sperry Rand Corp Method for making printed circuit boards
US3186932A (en) * 1962-12-10 1965-06-01 Audio Matrix Inc Apparatus for forming phonograph record masters, mothers, and stampers
US3532801A (en) * 1965-02-23 1970-10-06 Burroughs Corp Method and apparatus for fabricating laminated circuit boards

Also Published As

Publication number Publication date
CH494824A (en) 1970-08-15
FR2051660A7 (en) 1971-04-09
NL7010237A (en) 1971-01-12
FR2051660B3 (en) 1973-04-27
AT302763B (en) 1972-10-25
DE2034144A1 (en) 1971-02-11
US3660251A (en) 1972-05-02

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees