GB1298940A - Improvements in or relating to ion sources - Google Patents

Improvements in or relating to ion sources

Info

Publication number
GB1298940A
GB1298940A GB21462/69A GB2146269A GB1298940A GB 1298940 A GB1298940 A GB 1298940A GB 21462/69 A GB21462/69 A GB 21462/69A GB 2146269 A GB2146269 A GB 2146269A GB 1298940 A GB1298940 A GB 1298940A
Authority
GB
United Kingdom
Prior art keywords
chamber
ion
plates
filament
field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB21462/69A
Inventor
Richard Martin Elliott
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Associated Electrical Industries Ltd
Original Assignee
Associated Electrical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Associated Electrical Industries Ltd filed Critical Associated Electrical Industries Ltd
Priority to GB21462/69A priority Critical patent/GB1298940A/en
Priority to DE19702019926 priority patent/DE2019926A1/en
Priority to US00032324A priority patent/US3731089A/en
Priority to FR7015350A priority patent/FR2040313A1/fr
Publication of GB1298940A publication Critical patent/GB1298940A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission

Abstract

1298940 Ion sources ASSOCIATED ELECTRICAL INDUSTRIES Ltd 28 April 1970 [28 April 1969] 21462/69 Heading H1D An ion source comprises an ion chamber 10 in which material is ionized by means other than field ionization (e.g. by ultra-violet or other radiation, an electron beam, or as shown a thermionic filament 26), and the ions so formed are subjected to an electric field, produced by a charged tip, blade 22, wire or other sharp edge or point, and oriented to expel ions from the chamber. The chamber 10 is closed by an ion exit plate 12, and beam centring plates 14 and 15 and an ion source slit 16 are arranged along the beam path. The blade 22 extends between ion repeller plates 18 and 19. The source is mounted within an evacuated housing (not shown). A magnetic field 28 is applied along the direction of the filament 26. Alternatively U.V. or other radiation may be beamed into the chamber through parts 24 and/or a beam of electrons may be projected through the chamber in a direction perpendicular to the plane of the drawing. In alternative embodiments (Figs. 2 and 3, not shown), the plates 18 and 19 are omitted and electrons are projected into the chamber either through a port in a side wall or through the slit in the plate 12 from an external filament. The field produced by the charged tip &c. may or may not be above the strength required to produce ionization.
GB21462/69A 1969-04-28 1969-04-28 Improvements in or relating to ion sources Expired GB1298940A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
GB21462/69A GB1298940A (en) 1969-04-28 1969-04-28 Improvements in or relating to ion sources
DE19702019926 DE2019926A1 (en) 1969-04-28 1970-04-24 Ion source and method for rapidly ejecting ions from an ion chamber
US00032324A US3731089A (en) 1969-04-28 1970-04-27 Mass spectrometer ion source having means for rapidly expelling ions from the source and method of operation
FR7015350A FR2040313A1 (en) 1969-04-28 1970-04-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB21462/69A GB1298940A (en) 1969-04-28 1969-04-28 Improvements in or relating to ion sources

Publications (1)

Publication Number Publication Date
GB1298940A true GB1298940A (en) 1972-12-06

Family

ID=10163355

Family Applications (1)

Application Number Title Priority Date Filing Date
GB21462/69A Expired GB1298940A (en) 1969-04-28 1969-04-28 Improvements in or relating to ion sources

Country Status (4)

Country Link
US (1) US3731089A (en)
DE (1) DE2019926A1 (en)
FR (1) FR2040313A1 (en)
GB (1) GB1298940A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3817604A1 (en) * 1987-05-27 1988-12-08 Mitsubishi Electric Corp Ion beam generator for semiconductor processing

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8703012D0 (en) * 1987-02-10 1987-03-18 Vg Instr Group Secondary ion mass spectrometer
DE3739253A1 (en) * 1987-11-19 1989-06-01 Max Planck Gesellschaft DEVICE WORKING WITH CONTACT TO GENERATE A RAY OF ACCELERATED IONS
US6218672B1 (en) * 1998-07-24 2001-04-17 Sarnoff Corporation Ion source
US10622200B2 (en) * 2018-05-18 2020-04-14 Perkinelmer Health Sciences Canada, Inc. Ionization sources and systems and methods using them

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3115591A (en) * 1959-06-22 1963-12-24 Atlas Werke Ag Ion source for mass spectrometer
US3247373A (en) * 1962-12-18 1966-04-19 Gca Corp Mass spectrometer leak detector with means for controlling the ion source output
US3356843A (en) * 1965-02-01 1967-12-05 Gen Electric Mass spectrometer electron beam ion source having means for focusing the electron beam

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3817604A1 (en) * 1987-05-27 1988-12-08 Mitsubishi Electric Corp Ion beam generator for semiconductor processing
DE3817604C2 (en) * 1987-05-27 2000-05-18 Mitsubishi Electric Corp Ion beam generator

Also Published As

Publication number Publication date
FR2040313A1 (en) 1971-01-22
DE2019926A1 (en) 1970-11-05
US3731089A (en) 1973-05-01

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees