GB1295285A - - Google Patents
Info
- Publication number
- GB1295285A GB1295285A GB1295285DA GB1295285A GB 1295285 A GB1295285 A GB 1295285A GB 1295285D A GB1295285D A GB 1295285DA GB 1295285 A GB1295285 A GB 1295285A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silica
- chamber
- electrode
- april
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
1295285 Coating by sputtering NATIONAL RESEARCH DEVELOPMENT CORP 21 April 1970 [25 April 1969] 21218/69 Heading C7F An R. F. sputtering apparatus has an electrode on the outside of the chamber and material e.g. silica, glass alumina, other oxides or nitrides or p.t.f.e. is sputtered from at least part of the wall of the chamber. In Fig. 1, silica is deposited from a silica plate 7 forming the top of the chamber on to a substrate 15 by applying R. F. to a water cooled electrode 11. Alternatively, the plate may be of metal Fig. 2 (not shown) and a condensor is placed in the R. F. circuit. In a modification an annular electrode is positioned around a silica tube Fig. 3 (not shown) and the substrate may be a wire continuously wound in the tube Fig. 4 (not shown).
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2121869 | 1969-04-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1295285A true GB1295285A (en) | 1972-11-08 |
Family
ID=10159181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1295285D Expired GB1295285A (en) | 1969-04-25 | 1969-04-25 |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB1295285A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2243844A (en) * | 1990-05-01 | 1991-11-13 | Atomic Energy Authority Uk | Coating of filaments by sputter-ion-plating |
-
1969
- 1969-04-25 GB GB1295285D patent/GB1295285A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2243844A (en) * | 1990-05-01 | 1991-11-13 | Atomic Energy Authority Uk | Coating of filaments by sputter-ion-plating |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |