GB1286793A - Process and apparatus for the parallel alignment of a semi-conductor wafer relative to a mask - Google Patents

Process and apparatus for the parallel alignment of a semi-conductor wafer relative to a mask

Info

Publication number
GB1286793A
GB1286793A GB3529/70A GB352970A GB1286793A GB 1286793 A GB1286793 A GB 1286793A GB 3529/70 A GB3529/70 A GB 3529/70A GB 352970 A GB352970 A GB 352970A GB 1286793 A GB1286793 A GB 1286793A
Authority
GB
United Kingdom
Prior art keywords
mask
wafer
carriage
semi
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3529/70A
Other languages
English (en)
Inventor
Kurt Koch
Paul Sauerbrei
Gerhart Dornheim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elektromat VEB
Original Assignee
Elektromat VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elektromat VEB filed Critical Elektromat VEB
Publication of GB1286793A publication Critical patent/GB1286793A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H10P72/57—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB3529/70A 1969-05-05 1970-01-24 Process and apparatus for the parallel alignment of a semi-conductor wafer relative to a mask Expired GB1286793A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD13960169A DD80779A1 (OSRAM) 1969-05-05 1969-05-05

Publications (1)

Publication Number Publication Date
GB1286793A true GB1286793A (en) 1972-08-23

Family

ID=5481173

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3529/70A Expired GB1286793A (en) 1969-05-05 1970-01-24 Process and apparatus for the parallel alignment of a semi-conductor wafer relative to a mask

Country Status (6)

Country Link
DD (1) DD80779A1 (OSRAM)
DE (1) DE2009307C3 (OSRAM)
FR (1) FR2042416B1 (OSRAM)
GB (1) GB1286793A (OSRAM)
PL (1) PL69869B1 (OSRAM)
SU (1) SU398067A3 (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007019228A1 (en) * 2005-08-05 2007-02-15 The Boeing Company Flexible single rail drilling system
CN117572732A (zh) * 2024-01-16 2024-02-20 上海图双精密装备有限公司 调平辅助装置及调平方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3674368A (en) * 1970-05-11 1972-07-04 Johannsmeier Karl Heinz Out of contact optical alignment and exposure apparatus
FR2507695B1 (fr) * 1981-06-12 1986-05-23 Marchal Equip Auto Distributeur de courant haute tension, notamment pour un allumage de moteur a combustion interne
AT406100B (de) * 1996-08-08 2000-02-25 Thallner Erich Kontaktbelichtungsverfahren zur herstellung von halbleiterbausteinen

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007019228A1 (en) * 2005-08-05 2007-02-15 The Boeing Company Flexible single rail drilling system
US7578642B2 (en) 2005-08-05 2009-08-25 The Boeing Corporation Flexible single rail drilling system
US8171642B2 (en) 2005-08-05 2012-05-08 The Boeing Company Method for forming a flexible single rail drilling system
CN117572732A (zh) * 2024-01-16 2024-02-20 上海图双精密装备有限公司 调平辅助装置及调平方法

Also Published As

Publication number Publication date
FR2042416A1 (OSRAM) 1971-02-12
DE2009307A1 (de) 1970-11-19
DE2009307B2 (de) 1973-11-29
PL69869B1 (OSRAM) 1973-10-31
SU398067A3 (OSRAM) 1973-09-17
DE2009307C3 (de) 1974-06-27
DD80779A1 (OSRAM) 1971-03-20
FR2042416B1 (OSRAM) 1974-06-14

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees