GB1281132A - Improvements in or relating to corpuscular beam apparatus - Google Patents
Improvements in or relating to corpuscular beam apparatusInfo
- Publication number
- GB1281132A GB1281132A GB45756/70A GB4575670A GB1281132A GB 1281132 A GB1281132 A GB 1281132A GB 45756/70 A GB45756/70 A GB 45756/70A GB 4575670 A GB4575670 A GB 4575670A GB 1281132 A GB1281132 A GB 1281132A
- Authority
- GB
- United Kingdom
- Prior art keywords
- magnets
- energization
- magnet
- shifting
- pairs
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/023—Means for mechanically adjusting components not otherwise provided for
Abstract
1281132 Electron beam apparatus; ion beam apparatus SIEMENS AG 25 Sept 1970 [30 Sept 1969 (2)] 45756/70 Heading H1D [Also in Division G4] Corpuscular beam apparatus (i.e. electron or ion microscopes or diffraction apparatus) in which magnetic means are provided for the positioning of a component (e.g. object table, diaphragm, Hoppe zoned diaphragm or phase shifting plate, or foil) comprises a plurality of shifting magnet pairs 14 to 17 and locating magnet pairs, e.g. 7, 8, at least one magnet of each pair being an electromagnet, and control circuits to the electromagnets to cause the locating magnets to effect relatively large or small frictional holding forces, the latter during selective energization of the shifting magnet pairs to effect positioning. The magnets on the components may be permanent magnets. During positioning the rear magnets of each pair in the direction of motion may exert a larger repulsive force than the forward pairs. Stabilizing magnet pairs (35, 36) (Fig. 2, not shown) may be included to prevent rotation, and mutually opposite stabilizing pairs may exert identical attractive forces smaller than the shifting magnet forces, the polepieces also being further spaced than those of the shifting magnets. During object table 5 movement, the locating magnets repel so that surfaces 10, 11 are guiding surfaces, and during de-energization of the shifting pairs, the repulsive forces may be further increased. Subsequently on de-energization, gaps 50 and 51 close and the table weight effects high friction which may be increased by attraction of the polepieces of the locating magnets. Magnet coils secured to the apparatus may be isolated from the evacuated space, and energizing currents wobbulated to eradicate remanent effects. In Fig. 3 (not shown), clockwise rotation of potentiometer arm (69) causes sequential energization of the locating magnet coils (60, 61, 62) prior to energization of shifting magnet coils (63, 64) at position (71), then increased energization of the former prior to de-energization of the latter at position (74). The magnets may be polarity switched during de-energization of magnets 14 to 17. The control circuit may include means such as a wedge filter (Fig. 6, not shown) to generate an electrical signal corresponding to particular shifting magnet energizing currents to identify specific component positions, storing means, and means to energize according to the stored signal, e.g. as in machining several objects, the electromagnets on one side preferably being non-variably energized. For instance, in Fig. 14 (not shown) converter (111) converts signals determined by D.C. coil current i to suitable storage signals, e.g. binary, for store (110). Automatic repositioning in Fig. 6 (not shown) may be effected by controller (134) including a servo motion performing follow-up during differences between stored set point values S2<SP>1</SP> and actual values S2.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19691950327 DE1950327B2 (en) | 1969-09-30 | 1969-09-30 | BODY BLAST DEVICE WITH MAGNETIC MEANS FOR TRANSVERSAL ADJUSTMENT OF PARTS |
DE19691950320 DE1950320A1 (en) | 1969-09-30 | 1969-09-30 | Method for identifying positions of a part that is adjustably arranged in the vacuum space of a corpuscular beam device |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1281132A true GB1281132A (en) | 1972-07-12 |
Family
ID=25757975
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB45756/70A Expired GB1281132A (en) | 1969-09-30 | 1970-09-25 | Improvements in or relating to corpuscular beam apparatus |
Country Status (4)
Country | Link |
---|---|
US (1) | US3678270A (en) |
DE (2) | DE1950320A1 (en) |
GB (1) | GB1281132A (en) |
NL (1) | NL7012346A (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2542360C2 (en) * | 1975-09-19 | 1977-11-17 | Siemens AG, 1000 Berlin und 8000 München | Corpuscular beam device with a goniometer |
US4374327A (en) * | 1981-01-27 | 1983-02-15 | George Christov | Device for indicating specimen stage positions in an electron microscope |
US4506154A (en) * | 1982-10-22 | 1985-03-19 | Scire Fredric E | Planar biaxial micropositioning stage |
US4532426A (en) * | 1983-06-17 | 1985-07-30 | Hughes Aircraft Company | Wafer height correction system for focused beam system |
DE3628170A1 (en) * | 1986-08-20 | 1988-02-25 | Max Planck Gesellschaft | ADJUSTABLE PREPARATION BRACKET FOR A CARPULAR RAY MICROSCOPE |
US4782236A (en) * | 1987-02-17 | 1988-11-01 | Anwar Chitayat | Means for locking a workpiece to a beam-generating apparatus |
NL8803101A (en) * | 1988-12-19 | 1990-07-16 | Philips Nv | OBJECT HOLDER FOR POSITIONING AN OBJECT IN A BEAM. |
US5323012A (en) * | 1991-08-16 | 1994-06-21 | The Regents Of The University Of California | Apparatus for positioning a stage |
JP3390318B2 (en) * | 1996-02-13 | 2003-03-24 | セイコーインスツルメンツ株式会社 | Micro positioning mechanism, scanning probe microscope and micro area processing machine using the same |
DE19722272A1 (en) | 1997-05-28 | 1998-12-03 | Leybold Systems Gmbh | Device for generating plasma |
US9435642B2 (en) * | 2012-04-20 | 2016-09-06 | Canon Kabushiki Kaisha | Position measuring apparatus, pattern transfer apparatus, and method for manufacturing a device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2496051A (en) * | 1948-04-28 | 1950-01-31 | Rca Corp | Positioning the specimen stage of optical apparatus |
-
1969
- 1969-09-30 DE DE19691950320 patent/DE1950320A1/en active Pending
- 1969-09-30 DE DE19691950327 patent/DE1950327B2/en active Granted
-
1970
- 1970-08-20 NL NL7012346A patent/NL7012346A/xx unknown
- 1970-09-08 US US70014A patent/US3678270A/en not_active Expired - Lifetime
- 1970-09-25 GB GB45756/70A patent/GB1281132A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
NL7012346A (en) | 1971-04-01 |
DE1950327B2 (en) | 1972-07-06 |
DE1950320A1 (en) | 1971-04-01 |
DE1950327A1 (en) | 1971-04-08 |
US3678270A (en) | 1972-07-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PLNP | Patent lapsed through nonpayment of renewal fees |