GB1270441A - Silicon reactor furnace - Google Patents
Silicon reactor furnaceInfo
- Publication number
- GB1270441A GB1270441A GB24781/69A GB2478169A GB1270441A GB 1270441 A GB1270441 A GB 1270441A GB 24781/69 A GB24781/69 A GB 24781/69A GB 2478169 A GB2478169 A GB 2478169A GB 1270441 A GB1270441 A GB 1270441A
- Authority
- GB
- United Kingdom
- Prior art keywords
- rod
- panels
- chamber
- silicon
- rods
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73475968A | 1968-06-05 | 1968-06-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1270441A true GB1270441A (en) | 1972-04-12 |
Family
ID=24952973
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB24781/69A Expired GB1270441A (en) | 1968-06-05 | 1969-05-15 | Silicon reactor furnace |
Country Status (5)
Country | Link |
---|---|
US (1) | US3635683A (de) |
DE (1) | DE1927961A1 (de) |
FR (1) | FR2010175A1 (de) |
GB (1) | GB1270441A (de) |
NL (1) | NL6908364A (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3805736A (en) * | 1971-12-27 | 1974-04-23 | Ibm | Apparatus for diffusion limited mass transport |
US5845189A (en) * | 1973-12-20 | 1998-12-01 | Litton Systems, Inc. | Process for stabilizing a microchannel plate |
US4315968A (en) * | 1980-02-06 | 1982-02-16 | Avco Corporation | Silicon coated silicon carbide filaments and method |
US4444812A (en) * | 1980-07-28 | 1984-04-24 | Monsanto Company | Combination gas curtains for continuous chemical vapor deposition production of silicon bodies |
US6090202A (en) | 1998-04-29 | 2000-07-18 | Sawyer Research Products, Inc. | Method and apparatus for growing crystals |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3004866A (en) * | 1957-11-04 | 1961-10-17 | Union Carbide Corp | Method and apparatus for gas plating nickel films with uniformity of resistance |
US2907626A (en) * | 1958-01-15 | 1959-10-06 | Bjorksten Res Lab Inc | Metal coating of glass fibers at high speeds |
NL256017A (de) * | 1959-09-23 | 1900-01-01 | ||
NL262949A (de) * | 1960-04-02 | 1900-01-01 | ||
US3055741A (en) * | 1960-12-22 | 1962-09-25 | Sylvania Electric Prod | Method for producing silicon |
DE1297086B (de) * | 1965-01-29 | 1969-06-12 | Siemens Ag | Verfahren zum Herstellen einer Schicht von einkristallinem Halbleitermaterial |
US3424629A (en) * | 1965-12-13 | 1969-01-28 | Ibm | High capacity epitaxial apparatus and method |
-
1968
- 1968-06-05 US US734759A patent/US3635683A/en not_active Expired - Lifetime
-
1969
- 1969-05-15 GB GB24781/69A patent/GB1270441A/en not_active Expired
- 1969-05-31 DE DE19691927961 patent/DE1927961A1/de active Pending
- 1969-06-02 NL NL6908364A patent/NL6908364A/xx unknown
- 1969-06-04 FR FR6918321A patent/FR2010175A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
NL6908364A (de) | 1969-12-09 |
US3635683A (en) | 1972-01-18 |
DE1927961A1 (de) | 1969-12-11 |
FR2010175A1 (de) | 1970-02-13 |
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