FR2010175A1 - - Google Patents

Info

Publication number
FR2010175A1
FR2010175A1 FR6918321A FR6918321A FR2010175A1 FR 2010175 A1 FR2010175 A1 FR 2010175A1 FR 6918321 A FR6918321 A FR 6918321A FR 6918321 A FR6918321 A FR 6918321A FR 2010175 A1 FR2010175 A1 FR 2010175A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6918321A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of FR2010175A1 publication Critical patent/FR2010175A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
FR6918321A 1968-06-05 1969-06-04 Withdrawn FR2010175A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73475968A 1968-06-05 1968-06-05

Publications (1)

Publication Number Publication Date
FR2010175A1 true FR2010175A1 (fr) 1970-02-13

Family

ID=24952973

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6918321A Withdrawn FR2010175A1 (fr) 1968-06-05 1969-06-04

Country Status (5)

Country Link
US (1) US3635683A (fr)
DE (1) DE1927961A1 (fr)
FR (1) FR2010175A1 (fr)
GB (1) GB1270441A (fr)
NL (1) NL6908364A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3805736A (en) * 1971-12-27 1974-04-23 Ibm Apparatus for diffusion limited mass transport
US5845189A (en) * 1973-12-20 1998-12-01 Litton Systems, Inc. Process for stabilizing a microchannel plate
US4315968A (en) * 1980-02-06 1982-02-16 Avco Corporation Silicon coated silicon carbide filaments and method
US4444812A (en) * 1980-07-28 1984-04-24 Monsanto Company Combination gas curtains for continuous chemical vapor deposition production of silicon bodies
US6090202A (en) * 1998-04-29 2000-07-18 Sawyer Research Products, Inc. Method and apparatus for growing crystals

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3004866A (en) * 1957-11-04 1961-10-17 Union Carbide Corp Method and apparatus for gas plating nickel films with uniformity of resistance
US2907626A (en) * 1958-01-15 1959-10-06 Bjorksten Res Lab Inc Metal coating of glass fibers at high speeds
NL256017A (fr) * 1959-09-23 1900-01-01
NL262949A (fr) * 1960-04-02 1900-01-01
US3055741A (en) * 1960-12-22 1962-09-25 Sylvania Electric Prod Method for producing silicon
DE1297086B (de) * 1965-01-29 1969-06-12 Siemens Ag Verfahren zum Herstellen einer Schicht von einkristallinem Halbleitermaterial
US3424629A (en) * 1965-12-13 1969-01-28 Ibm High capacity epitaxial apparatus and method

Also Published As

Publication number Publication date
DE1927961A1 (de) 1969-12-11
NL6908364A (fr) 1969-12-09
GB1270441A (en) 1972-04-12
US3635683A (en) 1972-01-18

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Legal Events

Date Code Title Description
ST Notification of lapse