GB1265568A - - Google Patents
Info
- Publication number
- GB1265568A GB1265568A GB1265568DA GB1265568A GB 1265568 A GB1265568 A GB 1265568A GB 1265568D A GB1265568D A GB 1265568DA GB 1265568 A GB1265568 A GB 1265568A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- etching
- oxide
- chemical
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011651 chromium Substances 0.000 abstract 15
- 238000005530 etching Methods 0.000 abstract 6
- 239000000463 material Substances 0.000 abstract 3
- 229910052751 metal Inorganic materials 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- 238000003486 chemical etching Methods 0.000 abstract 2
- 239000000523 sample Substances 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 2
- 229910052725 zinc Inorganic materials 0.000 abstract 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 230000004888 barrier function Effects 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 230000000977 initiatory effect Effects 0.000 abstract 1
- 230000000873 masking effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000012466 permeate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US74867668A | 1968-07-30 | 1968-07-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1265568A true GB1265568A (enrdf_load_stackoverflow) | 1972-03-01 |
Family
ID=25010459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1265568D Expired GB1265568A (enrdf_load_stackoverflow) | 1968-07-30 | 1969-07-24 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3616349A (enrdf_load_stackoverflow) |
| FR (1) | FR2013950A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1265568A (enrdf_load_stackoverflow) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3959098A (en) * | 1973-03-12 | 1976-05-25 | Bell Telephone Laboratories, Incorporated | Electrolytic etching of III - V compound semiconductors |
| US4135989A (en) * | 1978-04-27 | 1979-01-23 | E-Systems, Inc. | Electrolytic etching of tin oxide films |
| US4350564A (en) * | 1980-10-27 | 1982-09-21 | General Electric Company | Method of etching metallic materials including a major percentage of chromium |
| US4629539A (en) * | 1982-07-08 | 1986-12-16 | Tdk Corporation | Metal layer patterning method |
| US5567304A (en) * | 1995-01-03 | 1996-10-22 | Ibm Corporation | Elimination of island formation and contact resistance problems during electroetching of blanket or patterned thin metallic layers on insulating substrate |
| USRE40386E1 (en) * | 1998-11-06 | 2008-06-17 | Hitachi Ltd. | Chrome plated parts and chrome plating method |
| JP3918142B2 (ja) * | 1998-11-06 | 2007-05-23 | 株式会社日立製作所 | クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法 |
| US6843929B1 (en) | 2000-02-28 | 2005-01-18 | International Business Machines Corporation | Accelerated etching of chromium |
| WO2011044340A1 (en) * | 2009-10-08 | 2011-04-14 | First Solar, Inc. | Electrochemical method and apparatus for removing coating from a substrate |
| CN106255332A (zh) * | 2016-08-24 | 2016-12-21 | 奥士康精密电路（惠州）有限公司 | 提高线路板图形转移精度的方法 |
| EP3674442A1 (en) * | 2018-12-24 | 2020-07-01 | IMEC vzw | Etching using an electrolyzed chloride solution |
| US11830736B2 (en) | 2021-02-18 | 2023-11-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multi-layer photo etching mask including organic and inorganic materials |
-
1968
- 1968-07-30 US US748676A patent/US3616349A/en not_active Expired - Lifetime
-
1969
- 1969-07-10 FR FR6923507A patent/FR2013950A1/fr not_active Withdrawn
- 1969-07-24 GB GB1265568D patent/GB1265568A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3616349A (en) | 1971-10-26 |
| FR2013950A1 (enrdf_load_stackoverflow) | 1970-04-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |