GB1258259A - - Google Patents

Info

Publication number
GB1258259A
GB1258259A GB1663868A GB1258259DA GB1258259A GB 1258259 A GB1258259 A GB 1258259A GB 1663868 A GB1663868 A GB 1663868A GB 1258259D A GB1258259D A GB 1258259DA GB 1258259 A GB1258259 A GB 1258259A
Authority
GB
United Kingdom
Prior art keywords
film
ions
produce
layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1663868A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1258259A publication Critical patent/GB1258259A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P32/30—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
GB1663868A 1968-04-05 1968-04-05 Expired GB1258259A (cg-RX-API-DMAC10.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1663868 1968-04-05

Publications (1)

Publication Number Publication Date
GB1258259A true GB1258259A (cg-RX-API-DMAC10.html) 1971-12-30

Family

ID=10080923

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1663868A Expired GB1258259A (cg-RX-API-DMAC10.html) 1968-04-05 1968-04-05

Country Status (1)

Country Link
GB (1) GB1258259A (cg-RX-API-DMAC10.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4333808A (en) * 1979-10-30 1982-06-08 International Business Machines Corporation Method for manufacture of ultra-thin film capacitor
US4351695A (en) * 1980-01-30 1982-09-28 Siemens Aktiengesellschaft Method of producing low-resistant, monocrystalline metallic layers by implanting ions into a polycrystalline metal layer and heating to produce a monocrystalline layer
US4364969A (en) * 1979-12-13 1982-12-21 United Kingdom Atomic Energy Authority Method of coating titanium and its alloys
GB2175316A (en) * 1985-05-17 1986-11-26 Atomic Energy Authority Uk Improved cutting edges
GB2244284A (en) * 1990-05-02 1991-11-27 Nippon Sheet Glass Co Ltd A method of manufacturing a polycrystalline semiconductor film by ion implantation

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4333808A (en) * 1979-10-30 1982-06-08 International Business Machines Corporation Method for manufacture of ultra-thin film capacitor
US4364969A (en) * 1979-12-13 1982-12-21 United Kingdom Atomic Energy Authority Method of coating titanium and its alloys
US4351695A (en) * 1980-01-30 1982-09-28 Siemens Aktiengesellschaft Method of producing low-resistant, monocrystalline metallic layers by implanting ions into a polycrystalline metal layer and heating to produce a monocrystalline layer
GB2175316A (en) * 1985-05-17 1986-11-26 Atomic Energy Authority Uk Improved cutting edges
GB2175316B (en) * 1985-05-17 1989-04-26 Atomic Energy Authority Uk Improved cutting edges
GB2244284A (en) * 1990-05-02 1991-11-27 Nippon Sheet Glass Co Ltd A method of manufacturing a polycrystalline semiconductor film by ion implantation
GB2244284B (en) * 1990-05-02 1993-11-03 Nippon Sheet Glass Co Ltd A method of manufacturing a polycrystalline semiconductor film

Similar Documents

Publication Publication Date Title
US4760369A (en) Thin film resistor and method
US4020222A (en) Thin film circuit
GB1513077A (en) Conductive stripes for electronic components
GB1269973A (en) Method of forming a thin film pattern of metal or metal compounds
GB992464A (en) Improvements in or relating to thin film impedance devices
GB1364735A (en) Method of selectively removing material by ion bombardment
GB1091267A (en) Improvements in or relating to sputtering processes
GB1038609A (en) Ohmic contacts to thin film passivated resistors
GB1258259A (cg-RX-API-DMAC10.html)
GB1239235A (cg-RX-API-DMAC10.html)
Smith Structure and electrical properties of sputtered films of hafnium and hafnium compounds
GB1113686A (en) Improvements in or relating to tantalum thin film electrical components
GB974667A (en) Improvements in and relating to the manufacture of multi-layer thin film electrical devices
US3627577A (en) Thin film resistors
US3458847A (en) Thin-film resistors
US3864194A (en) Optical shielding element having low reflecting power and method for producing
GB1349046A (en) Method of producing a stable tantalum-aluminum thin film
US4066819A (en) Method of bonding gold films to non-electrically conducting oxides and product thereby obtained
Bist et al. Anomalous electrical resistivity of thin gadolinium films
US3391024A (en) Process for preparing improved cryogenic circuits
Koedam Sputtering of copper single crystals bombarded with monoenergetic ions of low energy (50-350 eV)
US3818413A (en) Film resistor and method of making
GB1285744A (en) Improvements in or relating to processes for increasing the conductivity of insulating film
US3635767A (en) Method of implanting impurity ions into the surface of a semiconductor
Kolonits et al. The oxidation of tantalum-based thin films

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee