GB1246207A - Selective depolymerization of thin polymer films - Google Patents
Selective depolymerization of thin polymer filmsInfo
- Publication number
- GB1246207A GB1246207A GB2417369A GB2417369A GB1246207A GB 1246207 A GB1246207 A GB 1246207A GB 2417369 A GB2417369 A GB 2417369A GB 2417369 A GB2417369 A GB 2417369A GB 1246207 A GB1246207 A GB 1246207A
- Authority
- GB
- United Kingdom
- Prior art keywords
- etched
- water
- acid
- hydrogen peroxide
- chloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Abstract
1,246,207. Etching. GENERAL ELECTRIC CO. 12 May, 1969 [22 May, 1968], No. 24173/69. Heading B6J. [Also in Divisions B1, C3 and G2] Metal layers which have photographically produced polymeric masks thereon (see Division G2) are etched with the following etchants: Silver etched with chromium trioxide and sulphuric acid in water; Copper etched with (a) 2À25-3À75M ferric chloride or (b) ammonium persulphate and mercuric chloride in water; Aluminium etched with (a) 5N potassium hydroxide and potassium bromate (b) hydrochloric acid and copper carbonate (c) stannous chlorate in water followed by concentrated hydrochloric acid and nickelous chloride or (d) 20% caustic soda; Tin etched with hydrochloric and nitric acid in water; Lead etched with (a) citric acid and hydrogen peroxide in water or (b) acetic acid and hydrogen peroxide in water; Gold etched with (a) iodine and potassium iodide in water or (b) photoetched with methyl iodide during exposure to ultra-violet light.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73109068A | 1968-05-22 | 1968-05-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1246207A true GB1246207A (en) | 1971-09-15 |
Family
ID=24938021
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2417369A Expired GB1246207A (en) | 1968-05-22 | 1969-05-12 | Selective depolymerization of thin polymer films |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE1925496A1 (en) |
FR (1) | FR2009157A1 (en) |
GB (1) | GB1246207A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4414059A (en) * | 1982-12-09 | 1983-11-08 | International Business Machines Corporation | Far UV patterning of resist materials |
JPS59216142A (en) * | 1983-05-16 | 1984-12-06 | インタ−ナシヨナル ビジネス マシ−ンズ コ−ポレ−シヨン | Manufacture of mask for lithography |
-
1969
- 1969-05-12 GB GB2417369A patent/GB1246207A/en not_active Expired
- 1969-05-20 DE DE19691925496 patent/DE1925496A1/en active Pending
- 1969-05-22 FR FR6916794A patent/FR2009157A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
DE1925496A1 (en) | 1969-11-27 |
FR2009157A1 (en) | 1970-01-30 |
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