GB1246207A - Selective depolymerization of thin polymer films - Google Patents

Selective depolymerization of thin polymer films

Info

Publication number
GB1246207A
GB1246207A GB2417369A GB2417369A GB1246207A GB 1246207 A GB1246207 A GB 1246207A GB 2417369 A GB2417369 A GB 2417369A GB 2417369 A GB2417369 A GB 2417369A GB 1246207 A GB1246207 A GB 1246207A
Authority
GB
United Kingdom
Prior art keywords
etched
water
acid
hydrogen peroxide
chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2417369A
Inventor
Archibald Nelson Wright
Richard Cardey Merrill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1246207A publication Critical patent/GB1246207A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)

Abstract

1,246,207. Etching. GENERAL ELECTRIC CO. 12 May, 1969 [22 May, 1968], No. 24173/69. Heading B6J. [Also in Divisions B1, C3 and G2] Metal layers which have photographically produced polymeric masks thereon (see Division G2) are etched with the following etchants: Silver etched with chromium trioxide and sulphuric acid in water; Copper etched with (a) 2À25-3À75M ferric chloride or (b) ammonium persulphate and mercuric chloride in water; Aluminium etched with (a) 5N potassium hydroxide and potassium bromate (b) hydrochloric acid and copper carbonate (c) stannous chlorate in water followed by concentrated hydrochloric acid and nickelous chloride or (d) 20% caustic soda; Tin etched with hydrochloric and nitric acid in water; Lead etched with (a) citric acid and hydrogen peroxide in water or (b) acetic acid and hydrogen peroxide in water; Gold etched with (a) iodine and potassium iodide in water or (b) photoetched with methyl iodide during exposure to ultra-violet light.
GB2417369A 1968-05-22 1969-05-12 Selective depolymerization of thin polymer films Expired GB1246207A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73109068A 1968-05-22 1968-05-22

Publications (1)

Publication Number Publication Date
GB1246207A true GB1246207A (en) 1971-09-15

Family

ID=24938021

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2417369A Expired GB1246207A (en) 1968-05-22 1969-05-12 Selective depolymerization of thin polymer films

Country Status (3)

Country Link
DE (1) DE1925496A1 (en)
FR (1) FR2009157A1 (en)
GB (1) GB1246207A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414059A (en) * 1982-12-09 1983-11-08 International Business Machines Corporation Far UV patterning of resist materials
JPS59216142A (en) * 1983-05-16 1984-12-06 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン Manufacture of mask for lithography

Also Published As

Publication number Publication date
DE1925496A1 (en) 1969-11-27
FR2009157A1 (en) 1970-01-30

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