GB1188688A - Semi-conductor Device - Google Patents
Semi-conductor DeviceInfo
- Publication number
- GB1188688A GB1188688A GB2955267A GB2955267A GB1188688A GB 1188688 A GB1188688 A GB 1188688A GB 2955267 A GB2955267 A GB 2955267A GB 2955267 A GB2955267 A GB 2955267A GB 1188688 A GB1188688 A GB 1188688A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- semi
- junction
- conductor
- diffusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 7
- 238000009792 diffusion process Methods 0.000 abstract 5
- 229910004298 SiO 2 Inorganic materials 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000002019 doping agent Substances 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 230000004888 barrier function Effects 0.000 abstract 1
- 230000003467 diminishing effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000035515 penetration Effects 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
- 230000000979 retarding effect Effects 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
- H01L21/2257—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer being silicon or silicide or SIPOS, e.g. polysilicon, porous silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1203—Rectifying Diode
- H01L2924/12036—PN diode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1301—Thyristor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Formation Of Insulating Films (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
1,188,688. Semi-conductor devices. ALLMANNA SVENSKA ELEKTRISKA A.B. 27 June, 1967 [28 June, 1966], No. 29552/67. Heading H1K. The PN junction 1 between regions 3 and 8 of a semi-conductor body is formed by diffusion of suitable impurity into a plane surface 2 of the body under such conditions that the angle α between the junction 1 and the surface 2 is less than 45 degrees and preferably within the range 1 to 10 degrees. The junction may be the sole junction of a diode or, as shown, the centre junction of a PNPN thyristor. To achieve the required value for the angle α, the surface 2 is covered before diffusion with a layer of a substance in which the diffusion rate is at most of the same order as the rate of diffusion in the semi-conductor, e.g. in the case of silicon as semi-conductor a layer of silicon dioxide or nitride or carbide. This layer is thin or non-existent at the centre of the surface 2 and of progressively increasing thickness towards the edge. When impurity is diffused through this layer into the semi-conductor. the depth of penetration into the latter is of gradually diminishing extent with increasing distance from the centre, thus providing the required tapering shape for the junction edge. In a preferred process (Figs. 3a to 3c, not shown) the retarding layer (4) is of SiO 2 and, before diffusion, both this layer and the surfaces of the semi-conductor body not covered by the layer are covered with polycrystalline silicon (5). The latter acts as a barrier between the SiO 2 and a subsequently deposited layer (6) of dopant, to prevent the SiO 2 from dissolving in the dopant layer.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE878166 | 1966-06-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1188688A true GB1188688A (en) | 1970-04-22 |
Family
ID=20275012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2955267A Expired GB1188688A (en) | 1966-06-28 | 1967-06-27 | Semi-conductor Device |
Country Status (4)
Country | Link |
---|---|
CH (1) | CH469357A (en) |
DE (1) | DE1589453A1 (en) |
GB (1) | GB1188688A (en) |
NL (1) | NL6708951A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3961354A (en) * | 1972-11-17 | 1976-06-01 | Matsushita Electronics Corporation | Mesa type thyristor and its making method |
JPS5142915B1 (en) * | 1970-10-14 | 1976-11-18 | ||
US4081821A (en) * | 1974-12-23 | 1978-03-28 | Bbc Brown Boveri & Company Limited | Bistable semiconductor component for high frequencies having four zones of alternating opposed types of conductivity |
WO1997033319A1 (en) * | 1996-03-07 | 1997-09-12 | Telefonaktiebolaget L M Ericsson (Publ) | Bipolar soi device having a tilted pn-junction, and a method for producing such a device |
DE10250608A1 (en) * | 2002-10-30 | 2004-05-19 | eupec Europäische Gesellschaft für Leistungshalbleiter mbH | Thyristor device with improved reverse blocking behavior |
-
1967
- 1967-06-23 DE DE19671589453 patent/DE1589453A1/en active Pending
- 1967-06-26 CH CH927567A patent/CH469357A/en unknown
- 1967-06-27 NL NL6708951A patent/NL6708951A/xx unknown
- 1967-06-27 GB GB2955267A patent/GB1188688A/en not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5142915B1 (en) * | 1970-10-14 | 1976-11-18 | ||
US3961354A (en) * | 1972-11-17 | 1976-06-01 | Matsushita Electronics Corporation | Mesa type thyristor and its making method |
US4081821A (en) * | 1974-12-23 | 1978-03-28 | Bbc Brown Boveri & Company Limited | Bistable semiconductor component for high frequencies having four zones of alternating opposed types of conductivity |
WO1997033319A1 (en) * | 1996-03-07 | 1997-09-12 | Telefonaktiebolaget L M Ericsson (Publ) | Bipolar soi device having a tilted pn-junction, and a method for producing such a device |
DE10250608A1 (en) * | 2002-10-30 | 2004-05-19 | eupec Europäische Gesellschaft für Leistungshalbleiter mbH | Thyristor device with improved reverse blocking behavior |
DE10250608B4 (en) * | 2002-10-30 | 2005-09-29 | eupec Europäische Gesellschaft für Leistungshalbleiter mbH | Thyristor device with improved blocking behavior in the reverse direction |
Also Published As
Publication number | Publication date |
---|---|
NL6708951A (en) | 1967-12-29 |
CH469357A (en) | 1969-02-28 |
DE1589453A1 (en) | 1970-04-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |