GB1122438A - Ion cleaning and deposition apparatus - Google Patents

Ion cleaning and deposition apparatus

Info

Publication number
GB1122438A
GB1122438A GB39826/66A GB3982666A GB1122438A GB 1122438 A GB1122438 A GB 1122438A GB 39826/66 A GB39826/66 A GB 39826/66A GB 3982666 A GB3982666 A GB 3982666A GB 1122438 A GB1122438 A GB 1122438A
Authority
GB
United Kingdom
Prior art keywords
charge
water
deposition apparatus
cathode
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB39826/66A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Precision Systems Inc
Original Assignee
General Precision Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Precision Systems Inc filed Critical General Precision Systems Inc
Publication of GB1122438A publication Critical patent/GB1122438A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/36—Gas-filled discharge tubes for cleaning surfaces while plating with ions of materials introduced into the discharge, e.g. introduced by evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

An ion cleaning and deposition apparatus comprises a vacuum chamber 10 wherein electrons emitted from a heated cathode 18, e.g. a circular tungsten wire, are magnetically focused into an <PICT:1122438/C6-C7/1> intense beam, preferably by a water-cooled tubular magnet 16, against the surface of a charge 30 of coating material, e.g. W, Mo or quartz connected as an anode whereby the surface is heated and vaporized and the vapours are ionised by the electron bombardment, and a substrate mounted upon an electrode support 42 positioned in a line extending from the charge through the cathode is simultaneously cleaned and coated by the ions accelerated there against from the ion source of the charge. The charge may be contained in a water-cooled copper anode crucible 26 adjustably positionable to the focal point of the electron flow, e.g. with a rack and pinion assembly 38. Alternatively, the apparatus may be inverted Fig. 2 (not shown) and a rod-shaped charge (52) continually fed into the intense electron beam within the magnet bore so that a molten globule (58) is formed at its end.
GB39826/66A 1965-10-20 1966-09-06 Ion cleaning and deposition apparatus Expired GB1122438A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US498958A US3404084A (en) 1965-10-20 1965-10-20 Apparatus for depositing ionized electron beam evaporated material on a negatively biased substrate

Publications (1)

Publication Number Publication Date
GB1122438A true GB1122438A (en) 1968-08-07

Family

ID=23983193

Family Applications (1)

Application Number Title Priority Date Filing Date
GB39826/66A Expired GB1122438A (en) 1965-10-20 1966-09-06 Ion cleaning and deposition apparatus

Country Status (2)

Country Link
US (1) US3404084A (en)
GB (1) GB1122438A (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1592523A1 (en) * 1966-10-13 1970-12-23 Titangmbh Process and device for the production of finely divided titanium dioxide by reacting titanium tetrachloride with oxygen or oxygen-containing gases
US3491015A (en) * 1967-04-04 1970-01-20 Automatic Fire Control Inc Method of depositing elemental material from a low pressure electrical discharge
US3772174A (en) * 1971-04-21 1973-11-13 Nasa Deposition of alloy films
JPS5845892B2 (en) * 1980-06-23 1983-10-13 大阪真空化学株式会社 Sputter deposition equipment
US4407712A (en) * 1982-06-01 1983-10-04 The United States Of America As Represented By The Secretary Of The Army Hollow cathode discharge source of metal vapor
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5840167A (en) * 1995-08-14 1998-11-24 Lg Semicon Co., Ltd Sputtering deposition apparatus and method utilizing charged particles
US20060032819A1 (en) * 2002-07-17 2006-02-16 Peter Nunn Water treatment device for electrolyzing, magnetizing, and re-resonating water
KR102461901B1 (en) * 2017-12-12 2022-11-01 어플라이드 머티어리얼스, 인코포레이티드 Ion source and indirectly heated cathode ion source
US11404254B2 (en) 2018-09-19 2022-08-02 Varian Semiconductor Equipment Associates, Inc. Insertable target holder for solid dopant materials
US11170973B2 (en) 2019-10-09 2021-11-09 Applied Materials, Inc. Temperature control for insertable target holder for solid dopant materials
US10957509B1 (en) 2019-11-07 2021-03-23 Applied Materials, Inc. Insertable target holder for improved stability and performance for solid dopant materials
US11854760B2 (en) 2021-06-21 2023-12-26 Applied Materials, Inc. Crucible design for liquid metal in an ion source

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA567633A (en) * 1958-12-16 N.V. Philips Gloeilampenfabrieken Thermionic ion source
US2527747A (en) * 1946-01-03 1950-10-31 Margaret N Lewis Apparatus for coating articles by thermal evaporation
US3024965A (en) * 1957-10-08 1962-03-13 Milleron Norman Apparatus for vacuum deposition of metals
US3021271A (en) * 1959-04-27 1962-02-13 Gen Mills Inc Growth of solid layers on substrates which are kept under ion bombardment before and during deposition
US3128205A (en) * 1961-09-11 1964-04-07 Optical Coating Laboratory Inc Apparatus for vacuum coating
US3267015A (en) * 1963-09-13 1966-08-16 Alloyd Electronics Corp Systems and processes for coating by evaporation
GB1054660A (en) * 1963-09-16
DE1298851B (en) * 1963-12-02 1969-07-03 Steigerwald Method for material processing using radiant energy
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial

Also Published As

Publication number Publication date
US3404084A (en) 1968-10-01

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