GB1098897A - Improvements relating to stress-responsive birefringent elements - Google Patents
Improvements relating to stress-responsive birefringent elementsInfo
- Publication number
- GB1098897A GB1098897A GB3091666A GB3091666A GB1098897A GB 1098897 A GB1098897 A GB 1098897A GB 3091666 A GB3091666 A GB 3091666A GB 3091666 A GB3091666 A GB 3091666A GB 1098897 A GB1098897 A GB 1098897A
- Authority
- GB
- United Kingdom
- Prior art keywords
- plate
- stress
- members
- july
- wedge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/16—Measuring arrangements characterised by the use of optical techniques for measuring the deformation in a solid, e.g. optical strain gauge
- G01B11/18—Measuring arrangements characterised by the use of optical techniques for measuring the deformation in a solid, e.g. optical strain gauge using photoelastic elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
Abstract
1,098,897. Phase retarders. INTERNATIONAL BUSINESS MACHINES CORPORATION. July 8, 1966 [July 8, 1965], No. 30916/66. Heading G2J. A phase retardation device comprises a phase retardation plate 1 having stress-inducible birefringence, pressure apparatus for applying stress to the plate 1 and stress distribution means disposed between said apparatus and the plate 1 to distribute the stress uniformly along an edge of the plate 1. The plate 1 is supported in an aluminium block 11. At two opposite edges of the plate 1 there are contiguously disposed hydraulic members 4 which consist of strips of a cold flow material or closed tubes containing mercury, and which serve as the stress distribution means. Two wedges 16, 20 are also housed within the block 11 with their hypotenuses adjacent. As shown in Fig. 2 upward movement of the wedge 20, on rotation of a screw-threaded shaft 24 by means of a control knob 30, results in movement of the wedge 16 towards the plate 1 so as to compress the members 4 and consequently apply stress to the plate 1. In a simple embodiment Fig. 1 (not shown) pressure is applied directly to the members 4 by means of a thumb screw (9).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47053965A | 1965-07-08 | 1965-07-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1098897A true GB1098897A (en) | 1968-01-10 |
Family
ID=23868012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3091666A Expired GB1098897A (en) | 1965-07-08 | 1966-07-08 | Improvements relating to stress-responsive birefringent elements |
Country Status (2)
Country | Link |
---|---|
FR (1) | FR1485083A (en) |
GB (1) | GB1098897A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0834753A1 (en) * | 1996-09-14 | 1998-04-08 | Carl Zeiss | Device comprising a birefringent planar plate and DUV-quarter-wave plate |
EP0942300A2 (en) * | 1998-03-10 | 1999-09-15 | Carl Zeiss | Birefringent plate with stress-induced birefringence |
WO2001050161A1 (en) * | 1999-12-23 | 2001-07-12 | Asml Us, Inc. | CALCIUM FLUORIDE (CaF2) STRESS PLATE AND METHOD OF MAKING THE SAME |
US6937394B2 (en) * | 2001-04-10 | 2005-08-30 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Device and method for changing the stress-induced birefringence and/or the thickness of an optical component |
US6996141B1 (en) * | 1999-07-08 | 2006-02-07 | Carl Zeiss Smt Ag | Device for reducing the peak power of a pulsed laser light source |
US7408616B2 (en) | 2003-09-26 | 2008-08-05 | Carl Zeiss Smt Ag | Microlithographic exposure method as well as a projection exposure system for carrying out the method |
DE102007014587A1 (en) | 2007-03-23 | 2008-09-25 | Carl Zeiss Smt Ag | Birefringent delay plate arrangement for production of e.g. LCD, has force application bar exhibiting number of twists, where two twists neighboring in longitudinal direction of bar are oriented opposite to each other |
-
1966
- 1966-06-22 FR FR06007918A patent/FR1485083A/en not_active Expired
- 1966-07-08 GB GB3091666A patent/GB1098897A/en not_active Expired
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0834753A1 (en) * | 1996-09-14 | 1998-04-08 | Carl Zeiss | Device comprising a birefringent planar plate and DUV-quarter-wave plate |
US6084708A (en) * | 1996-09-14 | 2000-07-04 | Carl-Zeiss-Stiftung | Double-refracting planar plate arrangement and deep ultraviolet λ/4-plate |
EP0942300A2 (en) * | 1998-03-10 | 1999-09-15 | Carl Zeiss | Birefringent plate with stress-induced birefringence |
EP0942300A3 (en) * | 1998-03-10 | 2000-02-23 | Carl Zeiss | Birefringent plate with stress-induced birefringence |
US6141148A (en) * | 1998-03-10 | 2000-10-31 | Carl-Zeiss-Stiftung | Birefringent plate arrangement with stress birefringence |
US6996141B1 (en) * | 1999-07-08 | 2006-02-07 | Carl Zeiss Smt Ag | Device for reducing the peak power of a pulsed laser light source |
US6324003B1 (en) | 1999-12-23 | 2001-11-27 | Silicon Valley Group, Inc. | Calcium fluoride (CaF2) stress plate and method of making the same |
WO2001050161A1 (en) * | 1999-12-23 | 2001-07-12 | Asml Us, Inc. | CALCIUM FLUORIDE (CaF2) STRESS PLATE AND METHOD OF MAKING THE SAME |
US6937394B2 (en) * | 2001-04-10 | 2005-08-30 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Device and method for changing the stress-induced birefringence and/or the thickness of an optical component |
US7408616B2 (en) | 2003-09-26 | 2008-08-05 | Carl Zeiss Smt Ag | Microlithographic exposure method as well as a projection exposure system for carrying out the method |
US7847921B2 (en) | 2003-09-26 | 2010-12-07 | Carl Zeiss Smt Ag | Microlithographic exposure method as well as a projection exposure system for carrying out the method |
US8767181B2 (en) | 2003-09-26 | 2014-07-01 | Carl Zeiss Smt Gmbh | Microlithographic exposure method as well as a projection exposure system for carrying out the method |
DE102007014587A1 (en) | 2007-03-23 | 2008-09-25 | Carl Zeiss Smt Ag | Birefringent delay plate arrangement for production of e.g. LCD, has force application bar exhibiting number of twists, where two twists neighboring in longitudinal direction of bar are oriented opposite to each other |
Also Published As
Publication number | Publication date |
---|---|
FR1485083A (en) | 1967-06-16 |
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