GB1095078A - Improvements relating to unit magnification catadioptric systems - Google Patents

Improvements relating to unit magnification catadioptric systems

Info

Publication number
GB1095078A
GB1095078A GB1042566A GB1042566A GB1095078A GB 1095078 A GB1095078 A GB 1095078A GB 1042566 A GB1042566 A GB 1042566A GB 1042566 A GB1042566 A GB 1042566A GB 1095078 A GB1095078 A GB 1095078A
Authority
GB
United Kingdom
Prior art keywords
mirror
image
plane
curvature
centre
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1042566A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optische Industrie de Oude Delft NV
Original Assignee
Optische Industrie de Oude Delft NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Optische Industrie de Oude Delft NV filed Critical Optische Industrie de Oude Delft NV
Publication of GB1095078A publication Critical patent/GB1095078A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
GB1042566A 1965-03-15 1966-03-09 Improvements relating to unit magnification catadioptric systems Expired GB1095078A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6503242A NL6503242A (ja) 1965-03-15 1965-03-15

Publications (1)

Publication Number Publication Date
GB1095078A true GB1095078A (en) 1967-12-13

Family

ID=19792657

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1042566A Expired GB1095078A (en) 1965-03-15 1966-03-09 Improvements relating to unit magnification catadioptric systems

Country Status (5)

Country Link
CH (1) CH436765A (ja)
DE (1) DE1275304B (ja)
GB (1) GB1095078A (ja)
NL (1) NL6503242A (ja)
SE (1) SE311766B (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
GB2146454A (en) * 1981-05-15 1985-04-17 Gen Signal Corp Apparatus for projecting a series of images onto dies of a semiconductor wafer
US5298939A (en) * 1991-11-04 1994-03-29 Swanson Paul A Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
US5883703A (en) * 1996-02-08 1999-03-16 Megapanel Corporation Methods and apparatus for detecting and compensating for focus errors in a photolithography tool
WO2010084246A3 (en) * 2009-01-26 2010-09-23 Wallac Oy Combined lens and reflector, and an optical apparatus using the same

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
GB2146454A (en) * 1981-05-15 1985-04-17 Gen Signal Corp Apparatus for projecting a series of images onto dies of a semiconductor wafer
US5298939A (en) * 1991-11-04 1994-03-29 Swanson Paul A Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
US5883703A (en) * 1996-02-08 1999-03-16 Megapanel Corporation Methods and apparatus for detecting and compensating for focus errors in a photolithography tool
WO2010084246A3 (en) * 2009-01-26 2010-09-23 Wallac Oy Combined lens and reflector, and an optical apparatus using the same
CN102292661A (zh) * 2009-01-26 2011-12-21 沃拉克有限公司 透镜和反射镜组合以及应用其的光学设备
CN102292661B (zh) * 2009-01-26 2013-07-24 珀金埃尔默新加坡私人有限公司 透镜和反射镜组合以及应用其的光学设备
US8933417B2 (en) 2009-01-26 2015-01-13 Wallac Oy Combined lens and reflector, and an optical apparatus using the same
EP2382501B1 (en) * 2009-01-26 2020-12-23 Wallac OY Combined lens and reflector, and an optical apparatus using the same

Also Published As

Publication number Publication date
SE311766B (ja) 1969-06-23
DE1275304B (de) 1968-08-14
NL6503242A (ja) 1966-09-16
CH436765A (de) 1967-05-31

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