GB1086607A - Method of electrically isolating components in solid-state electronic circuits - Google Patents

Method of electrically isolating components in solid-state electronic circuits

Info

Publication number
GB1086607A
GB1086607A GB22230/66A GB2223066A GB1086607A GB 1086607 A GB1086607 A GB 1086607A GB 22230/66 A GB22230/66 A GB 22230/66A GB 2223066 A GB2223066 A GB 2223066A GB 1086607 A GB1086607 A GB 1086607A
Authority
GB
United Kingdom
Prior art keywords
layer
channels
silicon
semi
silicon dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB22230/66A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NCR Voyix Corp
National Cash Register Co
Original Assignee
NCR Corp
National Cash Register Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NCR Corp, National Cash Register Co filed Critical NCR Corp
Publication of GB1086607A publication Critical patent/GB1086607A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/69215—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material being a silicon oxide, e.g. SiO2
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
    • H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials
    • H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
    • H10P14/6682—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
    • H10W10/014—Manufacture or treatment of isolation regions comprising dielectric materials using trench refilling with dielectric materials, e.g. shallow trench isolations
    • H10W10/0145—Manufacture or treatment of isolation regions comprising dielectric materials using trench refilling with dielectric materials, e.g. shallow trench isolations of trenches having shapes other than rectangular or V-shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10—Isolation regions comprising dielectric materials
    • H10W10/17—Isolation regions comprising dielectric materials formed using trench refilling with dielectric materials, e.g. shallow trench isolations

Landscapes

  • Semiconductor Integrated Circuits (AREA)
GB22230/66A 1965-06-03 1966-05-19 Method of electrically isolating components in solid-state electronic circuits Expired GB1086607A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46103065A 1965-06-03 1965-06-03

Publications (1)

Publication Number Publication Date
GB1086607A true GB1086607A (en) 1967-10-11

Family

ID=23830953

Family Applications (1)

Application Number Title Priority Date Filing Date
GB22230/66A Expired GB1086607A (en) 1965-06-03 1966-05-19 Method of electrically isolating components in solid-state electronic circuits

Country Status (3)

Country Link
BE (1) BE681959A (enExample)
CH (1) CH452709A (enExample)
GB (1) GB1086607A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2095258A1 (enExample) * 1970-06-15 1972-02-11 Hitachi Ltd
DE2218680A1 (de) * 1971-06-08 1972-12-28 Philips Nv Halbleiteranordnung und Verfahren zur Herstellung derselben
US6849918B1 (en) 1965-09-28 2005-02-01 Chou H. Li Miniaturized dielectrically isolated solid state device
US6979877B1 (en) * 1965-09-28 2005-12-27 Li Chou H Solid-state device
US7038290B1 (en) 1965-09-28 2006-05-02 Li Chou H Integrated circuit device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6849918B1 (en) 1965-09-28 2005-02-01 Chou H. Li Miniaturized dielectrically isolated solid state device
US6979877B1 (en) * 1965-09-28 2005-12-27 Li Chou H Solid-state device
US7038290B1 (en) 1965-09-28 2006-05-02 Li Chou H Integrated circuit device
FR2095258A1 (enExample) * 1970-06-15 1972-02-11 Hitachi Ltd
DE2218680A1 (de) * 1971-06-08 1972-12-28 Philips Nv Halbleiteranordnung und Verfahren zur Herstellung derselben

Also Published As

Publication number Publication date
BE681959A (enExample) 1966-11-14
CH452709A (fr) 1968-03-15

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