GB1036165A - Improvements in or relating to semiconductor devices - Google Patents
Improvements in or relating to semiconductor devicesInfo
- Publication number
- GB1036165A GB1036165A GB3786/64A GB378664A GB1036165A GB 1036165 A GB1036165 A GB 1036165A GB 3786/64 A GB3786/64 A GB 3786/64A GB 378664 A GB378664 A GB 378664A GB 1036165 A GB1036165 A GB 1036165A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon
- header
- transistor
- strips
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
- H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/04—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
- H01L23/041—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction having no base used as a mounting for the semiconductor body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Die Bonding (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
1,036,165. Semi-conductor devices. STANDARD TELEPHONES & CABLES Ltd. Jan. 29, 1964, No. 3786/64. Addition to 1,023,531. Heading H1K. A device comprising a semi-conductor wafer with at least one contact comprising a layer grading outwards from an adherent to a softsolderable metal and extending from a semiconductor zone on one face over an insulating layer thereon has its contacts soldered to the lead wires of a header. In an embodiment, a planar transistor, Fig. 1, made in multiple by successive diffusions into a silicon wafer through apertures formed in a surface oxide layer by photo-resist etching techniques, is provided with an overall film of aluminium. This is removed, except from areas of the emitter, base and collector zones exposed through apertures in the oxide film, by photo-resist etching techniques. An overall film graded from chromium beneath to gold above is then deposited as described in Specification 1,010,111 and reduced to strips 9, 10, 11 in contact through the aluminium with the collector, base and emitter zones respectively. The transistor is dipped in flux and then in a lead-tin eutectic or a commercial silver solder to tin the strips which are next soldered to the flattened ends of wires 13 extending from header 12 (Fig. 4). Alternatively, the wires terminate on the header surface in graded chromium-gold films to which the strips are soldered. The transistor is sealed by welding a top cap to the header flange. Prior to or as alternative to this an opaque insulating coating may be provided, e.g. by transfer moulding. Suitable coating materials are rubber, nylon, polypropylene, and epoxy and silicon resins, incorporating alumina or glass as fillers to match the expansion coefficient to that of silicon. Successive coatings of different materials may be applied, and to assist cooling a block of copper may be embedded in the coating. In an alternative method of making the transistor, the aluminium contacts are replaced by nickel or omitted. If the diffused regions are formed in a high resistivity layer epitaxially grown on a heavily doped silicon wafer, the collector contact may be deposited in a groove cut through the oxide and epitaxial layers. Application of the invention to silicon controlled rectifiers and diodes and to germanium devices incorporating a silicon oxide coating is also suggested.
Priority Applications (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US421178A US3324357A (en) | 1964-01-29 | 1964-12-28 | Multi-terminal semiconductor device having active element directly mounted on terminal leads |
DE1514736A DE1514736C3 (en) | 1964-01-29 | 1965-01-21 | Method for manufacturing a plurality of semiconductor components |
DE19651514739 DE1514739A1 (en) | 1962-05-25 | 1965-01-27 | Electric semiconductor device |
BE659001D BE659001A (en) | 1962-05-25 | 1965-01-29 | |
FR3688A FR1427264A (en) | 1964-01-29 | 1965-01-29 | Semiconductor device enhancements |
NL6501141A NL6501141A (en) | 1964-01-29 | 1965-01-29 | |
NL6501142A NL6501142A (en) | 1964-01-29 | 1965-01-29 | |
BE659002D BE659002A (en) | 1962-05-25 | 1965-01-29 | |
DE19651514742 DE1514742A1 (en) | 1964-01-29 | 1965-02-06 | Semiconductor device |
BE659624D BE659624A (en) | 1964-01-29 | 1965-02-12 | |
NL6501745A NL6501745A (en) | 1964-01-29 | 1965-02-12 | |
FR8137A FR87924E (en) | 1964-01-29 | 1965-03-05 | Semiconductor device enhancements |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB20201/62A GB1010111A (en) | 1962-05-25 | 1962-05-25 | Vapour deposition of metallic films |
GB36013/62A GB1044689A (en) | 1962-09-21 | 1962-09-21 | Improvements in or relating to mountings for semi-conductor devices |
GB39650/62A GB1023531A (en) | 1962-05-25 | 1962-10-19 | Improvements in or relating to semiconductor devices |
DEST19973A DE1179280B (en) | 1962-11-09 | 1962-11-09 | Process for the production of solderable contact points |
GB48863/62A GB1024216A (en) | 1962-05-25 | 1962-12-28 | Improvements in or relating to circuit modules including semiconductor devices |
GB9636/64A GB1036167A (en) | 1962-05-25 | 1964-03-06 | Improvements in or relating to semiconductor devices |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1036165A true GB1036165A (en) | 1966-07-13 |
Family
ID=27544935
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3786/64A Expired GB1036165A (en) | 1962-05-25 | 1964-01-29 | Improvements in or relating to semiconductor devices |
GB9636/64A Expired GB1036167A (en) | 1962-05-25 | 1964-03-06 | Improvements in or relating to semiconductor devices |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9636/64A Expired GB1036167A (en) | 1962-05-25 | 1964-03-06 | Improvements in or relating to semiconductor devices |
Country Status (2)
Country | Link |
---|---|
BE (1) | BE660746A (en) |
GB (2) | GB1036165A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2545653A1 (en) * | 1983-05-04 | 1984-11-09 | Pichot Michel | Method and device for encapsulating integrated circuits |
-
1964
- 1964-01-29 GB GB3786/64A patent/GB1036165A/en not_active Expired
- 1964-03-06 GB GB9636/64A patent/GB1036167A/en not_active Expired
-
1965
- 1965-03-08 BE BE660746D patent/BE660746A/xx unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2545653A1 (en) * | 1983-05-04 | 1984-11-09 | Pichot Michel | Method and device for encapsulating integrated circuits |
Also Published As
Publication number | Publication date |
---|---|
BE660746A (en) | 1965-09-08 |
GB1036167A (en) | 1966-07-13 |
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