GB1029982A - Improvements in or relating to the manufacture of semiconductor devices - Google Patents

Improvements in or relating to the manufacture of semiconductor devices

Info

Publication number
GB1029982A
GB1029982A GB5231/63A GB523163A GB1029982A GB 1029982 A GB1029982 A GB 1029982A GB 5231/63 A GB5231/63 A GB 5231/63A GB 523163 A GB523163 A GB 523163A GB 1029982 A GB1029982 A GB 1029982A
Authority
GB
United Kingdom
Prior art keywords
relating
manufacture
semiconductor devices
metals
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5231/63A
Other languages
English (en)
Inventor
Henley Frank Sterling
Cyril Francis Drake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL302321D priority Critical patent/NL302321A/xx
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB5231/63A priority patent/GB1029982A/en
Priority to DEST21634A priority patent/DE1276824B/de
Priority to FR962821A priority patent/FR1381871A/fr
Priority to BE643484D priority patent/BE643484A/xx
Publication of GB1029982A publication Critical patent/GB1029982A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/46—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
GB5231/63A 1963-02-08 1963-02-08 Improvements in or relating to the manufacture of semiconductor devices Expired GB1029982A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL302321D NL302321A (https=) 1963-02-08
GB5231/63A GB1029982A (en) 1963-02-08 1963-02-08 Improvements in or relating to the manufacture of semiconductor devices
DEST21634A DE1276824B (de) 1963-02-08 1964-02-01 Verfahren zum Herstellen eines ohmschen Kontaktes an einem Halbleiterkoerper
FR962821A FR1381871A (fr) 1963-02-08 1964-02-06 Méthode de fabrication de semi-conducteurs
BE643484D BE643484A (https=) 1963-02-08 1964-02-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5231/63A GB1029982A (en) 1963-02-08 1963-02-08 Improvements in or relating to the manufacture of semiconductor devices

Publications (1)

Publication Number Publication Date
GB1029982A true GB1029982A (en) 1966-05-18

Family

ID=9792180

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5231/63A Expired GB1029982A (en) 1963-02-08 1963-02-08 Improvements in or relating to the manufacture of semiconductor devices

Country Status (4)

Country Link
BE (1) BE643484A (https=)
DE (1) DE1276824B (https=)
GB (1) GB1029982A (https=)
NL (1) NL302321A (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL99536C (https=) * 1951-03-07 1900-01-01
DE966906C (de) * 1953-04-09 1957-09-19 Siemens Ag Verfahren zur sperrfreien Kontaktierung von Flaechengleichrichtern oder -transistoren mit einem eine p-n-Schichtung aufweisenden Halbleitereinkristall
NL98125C (https=) * 1954-08-26 1900-01-01
US2913813A (en) * 1955-06-22 1959-11-24 Ohio Commw Eng Co Composite metal product
AT222702B (de) * 1960-06-13 1962-08-10 Siemens Ag Verfahren zur Herstellen einer Halbleiteranordnung

Also Published As

Publication number Publication date
BE643484A (https=) 1964-08-07
NL302321A (https=)
DE1276824B (de) 1968-09-05

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