GB0719805D0 - Method and device for supplying electrical power - Google Patents
Method and device for supplying electrical powerInfo
- Publication number
- GB0719805D0 GB0719805D0 GBGB0719805.4A GB0719805A GB0719805D0 GB 0719805 D0 GB0719805 D0 GB 0719805D0 GB 0719805 A GB0719805 A GB 0719805A GB 0719805 D0 GB0719805 D0 GB 0719805D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- electrical power
- supplying electrical
- supplying
- power
- electrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/14—Electrodes, e.g. composition, counter electrode for pad-plating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/28—Apparatus for electrolytic coating of small objects in bulk with means for moving the objects individually through the apparatus during treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
- H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/007—Current directing devices
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Electrochemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0719805A GB2453560A (en) | 2007-10-10 | 2007-10-10 | Wafer electroplating apparatus |
JP2010528823A JP2011500960A (en) | 2007-10-10 | 2008-10-09 | Method and apparatus for supplying power |
PCT/NO2008/000359 WO2009048338A1 (en) | 2007-10-10 | 2008-10-09 | Method and device for supplying electrical power |
US12/682,473 US20100307926A1 (en) | 2007-10-10 | 2008-10-09 | Method and device for supplying electrical power |
DE112008002725T DE112008002725T5 (en) | 2007-10-10 | 2008-10-09 | Method and apparatus for supplying electricity |
CN200880119132.9A CN101883880B (en) | 2007-10-10 | 2008-10-09 | Method and device for supplying electrical power |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0719805A GB2453560A (en) | 2007-10-10 | 2007-10-10 | Wafer electroplating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
GB0719805D0 true GB0719805D0 (en) | 2007-11-21 |
GB2453560A GB2453560A (en) | 2009-04-15 |
Family
ID=38787940
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0719805A Withdrawn GB2453560A (en) | 2007-10-10 | 2007-10-10 | Wafer electroplating apparatus |
Country Status (6)
Country | Link |
---|---|
US (1) | US20100307926A1 (en) |
JP (1) | JP2011500960A (en) |
CN (1) | CN101883880B (en) |
DE (1) | DE112008002725T5 (en) |
GB (1) | GB2453560A (en) |
WO (1) | WO2009048338A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2459124A (en) * | 2008-04-10 | 2009-10-14 | Rec Solar As | Wafer holder for electroplating apparatus |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB709619A (en) | 1951-12-14 | 1954-05-26 | Metro Cutanit Ltd | Improvements in or relating to securing a steel or other metallic part to another part of hard and difficult to work material, such as a shaft to a turbine wheel |
DE3624481A1 (en) * | 1986-07-19 | 1988-01-28 | Schering Ag | ARRANGEMENT FOR THE ELECTROLYTIC TREATMENT OF PLATE-SHAPED OBJECTS |
JPS63117818A (en) * | 1986-10-31 | 1988-05-21 | Showa Electric Wire & Cable Co Ltd | Plating device |
JP3239534B2 (en) * | 1993-04-28 | 2001-12-17 | イビデン株式会社 | Plating rack |
JPH09195092A (en) * | 1996-01-09 | 1997-07-29 | Ibiden Co Ltd | Continuous electrolytic device |
US5893966A (en) * | 1997-07-28 | 1999-04-13 | Micron Technology, Inc. | Method and apparatus for continuous processing of semiconductor wafers |
US6261426B1 (en) * | 1999-01-22 | 2001-07-17 | International Business Machines Corporation | Method and apparatus for enhancing the uniformity of electrodeposition or electroetching |
US7022211B2 (en) * | 2000-01-31 | 2006-04-04 | Ebara Corporation | Semiconductor wafer holder and electroplating system for plating a semiconductor wafer |
JP3284496B2 (en) * | 2000-08-09 | 2002-05-20 | 株式会社荏原製作所 | Plating apparatus and plating solution removal method |
US20020097562A1 (en) * | 2000-12-18 | 2002-07-25 | Tdk Corporation | Electronic device and manufacturing same |
US6558750B2 (en) * | 2001-07-16 | 2003-05-06 | Technic Inc. | Method of processing and plating planar articles |
US6524463B2 (en) * | 2001-07-16 | 2003-02-25 | Technic, Inc. | Method of processing wafers and other planar articles within a processing cell |
JP2004292907A (en) * | 2003-03-27 | 2004-10-21 | Fujitsu Ltd | Electrolysis device, and method for manufacturing semiconductor device |
US7172184B2 (en) * | 2003-08-06 | 2007-02-06 | Sunpower Corporation | Substrate carrier for electroplating solar cells |
DE102004025827B3 (en) * | 2004-05-24 | 2005-06-30 | Höllmüller Maschinenbau GmbH | Electrical contacting device for circuit board or conductor foil passed through electrolytic cell using contacts alternating with transport rollers along each side edge |
-
2007
- 2007-10-10 GB GB0719805A patent/GB2453560A/en not_active Withdrawn
-
2008
- 2008-10-09 DE DE112008002725T patent/DE112008002725T5/en not_active Withdrawn
- 2008-10-09 JP JP2010528823A patent/JP2011500960A/en active Pending
- 2008-10-09 US US12/682,473 patent/US20100307926A1/en not_active Abandoned
- 2008-10-09 CN CN200880119132.9A patent/CN101883880B/en not_active Expired - Fee Related
- 2008-10-09 WO PCT/NO2008/000359 patent/WO2009048338A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2009048338A1 (en) | 2009-04-16 |
JP2011500960A (en) | 2011-01-06 |
GB2453560A (en) | 2009-04-15 |
CN101883880A (en) | 2010-11-10 |
DE112008002725T5 (en) | 2010-08-26 |
US20100307926A1 (en) | 2010-12-09 |
CN101883880B (en) | 2012-10-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |