GB0106575D0 - Broad spectrum ultraviolet catadioptric imaging system - Google Patents

Broad spectrum ultraviolet catadioptric imaging system

Info

Publication number
GB0106575D0
GB0106575D0 GBGB0106575.4A GB0106575A GB0106575D0 GB 0106575 D0 GB0106575 D0 GB 0106575D0 GB 0106575 A GB0106575 A GB 0106575A GB 0106575 D0 GB0106575 D0 GB 0106575D0
Authority
GB
United Kingdom
Prior art keywords
imaging system
broad spectrum
catadioptric imaging
spectrum ultraviolet
ultraviolet catadioptric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB0106575.4A
Other versions
GB2357158A (en
GB2357158B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Instruments Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/681,528 external-priority patent/US5717518A/en
Application filed by KLA Instruments Corp filed Critical KLA Instruments Corp
Publication of GB0106575D0 publication Critical patent/GB0106575D0/en
Publication of GB2357158A publication Critical patent/GB2357158A/en
Application granted granted Critical
Publication of GB2357158B publication Critical patent/GB2357158B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
GB0106575A 1996-07-22 1997-01-07 A method of inspecting objects for defects Expired - Fee Related GB2357158B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/681,528 US5717518A (en) 1996-07-22 1996-07-22 Broad spectrum ultraviolet catadioptric imaging system
GB9700213A GB2315562B (en) 1996-07-22 1997-01-07 Broad-band deep-ultraviolet achromatic catadioptric imaging system

Publications (3)

Publication Number Publication Date
GB0106575D0 true GB0106575D0 (en) 2001-05-09
GB2357158A GB2357158A (en) 2001-06-13
GB2357158B GB2357158B (en) 2001-07-18

Family

ID=26310758

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0106575A Expired - Fee Related GB2357158B (en) 1996-07-22 1997-01-07 A method of inspecting objects for defects

Country Status (1)

Country Link
GB (1) GB2357158B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109103141A (en) * 2018-07-14 2018-12-28 全讯射频科技(无锡)有限公司 A kind of the cutting protection technique and protection structure of surface-sensitive wafer
CN113050257A (en) * 2021-03-19 2021-06-29 中国科学院长春光学精密机械与物理研究所 Wide-spectrum ultraviolet imager optical system based on material

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10146583A1 (en) * 2001-09-21 2003-04-17 Siemens Ag Device and method for optically scanning a substrate wafer
US6917421B1 (en) 2001-10-12 2005-07-12 Kla-Tencor Technologies Corp. Systems and methods for multi-dimensional inspection and/or metrology of a specimen
US7684039B2 (en) * 2005-11-18 2010-03-23 Kla-Tencor Technologies Corporation Overlay metrology using the near infra-red spectral range

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62503055A (en) * 1985-05-20 1987-12-03 ザ・レ−ゲンツ・オブ・ザ・ユニバ−シティ・オブ・カリフォルニヤ differential imaging device
EP0348738A3 (en) * 1988-07-01 1991-04-03 Siemens Aktiengesellschaft Method for the non-destructive determination of electronic inhomogeneities in semi-conductor layers
JPH0728226A (en) * 1993-04-30 1995-01-31 Internatl Business Mach Corp <Ibm> Equipment and method for measuring regional image

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109103141A (en) * 2018-07-14 2018-12-28 全讯射频科技(无锡)有限公司 A kind of the cutting protection technique and protection structure of surface-sensitive wafer
CN113050257A (en) * 2021-03-19 2021-06-29 中国科学院长春光学精密机械与物理研究所 Wide-spectrum ultraviolet imager optical system based on material
CN113050257B (en) * 2021-03-19 2022-03-01 中国科学院长春光学精密机械与物理研究所 Wide-spectrum ultraviolet imager optical system based on material

Also Published As

Publication number Publication date
GB2357158A (en) 2001-06-13
GB2357158B (en) 2001-07-18

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20160107