FR3129394B1 - Procédé de revêtement - Google Patents

Procédé de revêtement Download PDF

Info

Publication number
FR3129394B1
FR3129394B1 FR2112447A FR2112447A FR3129394B1 FR 3129394 B1 FR3129394 B1 FR 3129394B1 FR 2112447 A FR2112447 A FR 2112447A FR 2112447 A FR2112447 A FR 2112447A FR 3129394 B1 FR3129394 B1 FR 3129394B1
Authority
FR
France
Prior art keywords
coating
forming
coating process
silicon
coating method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2112447A
Other languages
English (en)
Other versions
FR3129394A1 (fr
Inventor
Eric Bouillon
Lisa Pin
Simon Arnal
Benjamin Cossou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Safran Ceramics SA
Original Assignee
Safran Ceramics SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Safran Ceramics SA filed Critical Safran Ceramics SA
Priority to FR2112447A priority Critical patent/FR3129394B1/fr
Priority to PCT/FR2022/052143 priority patent/WO2023094757A1/fr
Priority to EP22829785.9A priority patent/EP4436941A1/fr
Priority to CN202280083916.0A priority patent/CN118434701A/zh
Publication of FR3129394A1 publication Critical patent/FR3129394A1/fr
Application granted granted Critical
Publication of FR3129394B1 publication Critical patent/FR3129394B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation
    • C04B41/89Coating or impregnation for obtaining at least two superposed coatings having different compositions
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/52Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24Deposition of silicon only
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01DNON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
    • F01D5/00Blades; Blade-carrying members; Heating, heat-insulating, cooling or antivibration means on the blades or the members
    • F01D5/12Blades
    • F01D5/28Selecting particular materials; Particular measures relating thereto; Measures against erosion or corrosion
    • F01D5/288Protective coatings for blades
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05DINDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2230/00Manufacture
    • F05D2230/30Manufacture with deposition of material
    • F05D2230/31Layer deposition
    • F05D2230/314Layer deposition by chemical vapour deposition
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05DINDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2230/00Manufacture
    • F05D2230/90Coating; Surface treatment
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05DINDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2300/00Materials; Properties thereof
    • F05D2300/60Properties or characteristics given to material by treatment or manufacturing
    • F05D2300/603Composites; e.g. fibre-reinforced
    • F05D2300/6033Ceramic matrix composites [CMC]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • General Engineering & Computer Science (AREA)
  • Turbine Rotor Nozzle Sealing (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

P rocédé de revêtement Procédé de revêtement, comprenant une étape de formation d’un revêtement d’accrochage (200) sur une surface d’un substrat (100), et une étape de formation d’un revêtement barrière (300) sur le revêtement d’accrochage (200). Le revêtement d’accrochage (200) est formé par dépôt chimique en phase vapeur, avec une température de dépôt supérieure à 1150°C, en particulier égale ou supérieure à 1200°C, d’un précurseur comprenant du silicium, et comprend des graines colonnaires de silicium cristallin. Figure pour l’abrégé : Fig. 1.
FR2112447A 2021-11-24 2021-11-24 Procédé de revêtement Active FR3129394B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR2112447A FR3129394B1 (fr) 2021-11-24 2021-11-24 Procédé de revêtement
PCT/FR2022/052143 WO2023094757A1 (fr) 2021-11-24 2022-11-21 Procede de revetement
EP22829785.9A EP4436941A1 (fr) 2021-11-24 2022-11-21 Procede de revetement
CN202280083916.0A CN118434701A (zh) 2021-11-24 2022-11-21 涂覆方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2112447A FR3129394B1 (fr) 2021-11-24 2021-11-24 Procédé de revêtement
FR2112447 2021-11-24

Publications (2)

Publication Number Publication Date
FR3129394A1 FR3129394A1 (fr) 2023-05-26
FR3129394B1 true FR3129394B1 (fr) 2024-07-19

Family

ID=80786489

Family Applications (1)

Application Number Title Priority Date Filing Date
FR2112447A Active FR3129394B1 (fr) 2021-11-24 2021-11-24 Procédé de revêtement

Country Status (4)

Country Link
EP (1) EP4436941A1 (fr)
CN (1) CN118434701A (fr)
FR (1) FR3129394B1 (fr)
WO (1) WO2023094757A1 (fr)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200039886A1 (en) 2018-07-31 2020-02-06 General Electric Company Silicon Bond Coat with Amorphous Structure and Methods of Its Formation
US11492298B2 (en) 2018-07-31 2022-11-08 General Electric Company Silicon bond coat with columnar grains and methods of its formation
FR3095645B1 (fr) * 2019-05-03 2023-03-24 Safran Pièce en céramique ou CMC à base de silicium et procédé de réalisation d'une telle pièce

Also Published As

Publication number Publication date
FR3129394A1 (fr) 2023-05-26
WO2023094757A1 (fr) 2023-06-01
CN118434701A (zh) 2024-08-02
EP4436941A1 (fr) 2024-10-02

Similar Documents

Publication Publication Date Title
US20090272323A1 (en) Susceptor, semiconductor manufacturing apparatus, and semiconductor manufacturing method
JPH0293071A (ja) 薄膜の形成方法
JPH06293595A (ja) 均一性が向上した堆積ポリシリコン膜と、そのための装置
KR20000071446A (ko) 질화티탄 박막의 제작방법 및 제작장치
US10214807B2 (en) Atomic layer deposition of tungsten for enhanced fill and reduced substrate attack
WO2018212882A3 (fr) Procédé de contrôle des contraintes des films minces déposés par cvd pour application de type affichage
FR3129394B1 (fr) Procédé de revêtement
KR20090027146A (ko) 서셉터, 반도체 제조 장치 및 반도체 제조 방법
US8785303B2 (en) Methods for depositing amorphous silicon
RU2006113115A (ru) Металлизация основы (основ) способом осаждения из парожидкостной фазы
US11626308B2 (en) Laser alignment fixture for a reactor system
US11078570B2 (en) Azimuthal critical dimension non-uniformity for double patterning process
JP2019110336A (ja) 非晶質薄膜の形成方法
JP3968777B2 (ja) 気相成長装置及び気相成長方法
KR102565964B1 (ko) 에피택셜 웨이퍼 및 그 제조 방법
FR3073665B1 (fr) Procede de fabrication de couche mince transferable
FR3068506B1 (fr) Procede pour preparer un support pour une structure semi-conductrice
JP4613451B2 (ja) エピタキシャルウェーハの製造方法
JP2007067213A (ja) 気相成長装置
JP7518280B2 (ja) ピエゾ位置制御による流量比制御
WO2022077986A1 (fr) Procédé de fabrication de structure semi-conductrice et structure semi-conductrice
Cho et al. In situ chemical sensing in AlGaN∕ GaN high electron mobility transistor metalorganic chemical vapor deposition process for real-time prediction of product crystal quality and advanced process control
FR3048547B1 (fr) Procede de fabrication d'un substrat semi-conducteur
JP3057716B2 (ja) 薄膜形成方法
CN114823284A (zh) 一种Si衬底GaN外延薄膜的生长方法

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20230526

PLFP Fee payment

Year of fee payment: 3