FR2978293B1 - Procede de fabrication d'un transistor a injection de porteurs chauds - Google Patents

Procede de fabrication d'un transistor a injection de porteurs chauds

Info

Publication number
FR2978293B1
FR2978293B1 FR1156605A FR1156605A FR2978293B1 FR 2978293 B1 FR2978293 B1 FR 2978293B1 FR 1156605 A FR1156605 A FR 1156605A FR 1156605 A FR1156605 A FR 1156605A FR 2978293 B1 FR2978293 B1 FR 2978293B1
Authority
FR
France
Prior art keywords
hot
manufacturing
carrier injection
injection transistor
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1156605A
Other languages
English (en)
Other versions
FR2978293A1 (fr
Inventor
Philippe Boivin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics Rousset SAS
Original Assignee
STMicroelectronics Rousset SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics Rousset SAS filed Critical STMicroelectronics Rousset SAS
Priority to FR1156605A priority Critical patent/FR2978293B1/fr
Publication of FR2978293A1 publication Critical patent/FR2978293A1/fr
Application granted granted Critical
Publication of FR2978293B1 publication Critical patent/FR2978293B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312—Gate electrodes for field effect devices
    • H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42324—Gate electrodes for transistors with a floating gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/401—Multistep manufacturing processes
    • H01L29/4011—Multistep manufacturing processes for data storage electrodes
    • H01L29/40114—Multistep manufacturing processes for data storage electrodes the electrodes comprising a conductor-insulator-conductor-insulator-semiconductor structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66825—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a floating gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881—Programmable transistors with only two possible levels of programmation
    • H01L29/7884—Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7885—Hot carrier injection from the channel

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
FR1156605A 2011-07-21 2011-07-21 Procede de fabrication d'un transistor a injection de porteurs chauds Expired - Fee Related FR2978293B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR1156605A FR2978293B1 (fr) 2011-07-21 2011-07-21 Procede de fabrication d'un transistor a injection de porteurs chauds

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1156605A FR2978293B1 (fr) 2011-07-21 2011-07-21 Procede de fabrication d'un transistor a injection de porteurs chauds

Publications (2)

Publication Number Publication Date
FR2978293A1 FR2978293A1 (fr) 2013-01-25
FR2978293B1 true FR2978293B1 (fr) 2014-04-11

Family

ID=44741557

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1156605A Expired - Fee Related FR2978293B1 (fr) 2011-07-21 2011-07-21 Procede de fabrication d'un transistor a injection de porteurs chauds

Country Status (1)

Country Link
FR (1) FR2978293B1 (fr)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2513207C2 (de) * 1974-09-20 1982-07-01 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
US4016588A (en) * 1974-12-27 1977-04-05 Nippon Electric Company, Ltd. Non-volatile semiconductor memory device
JPH02308571A (ja) * 1989-05-24 1990-12-21 Toshiba Corp 半導体記憶装置
TW203148B (fr) * 1991-03-27 1993-04-01 American Telephone & Telegraph
JPH11163305A (ja) * 1997-11-04 1999-06-18 Oko Denshi Kofun Yugenkoshi 不揮発性半導体メモリデバイス
JP2001093996A (ja) * 1999-09-27 2001-04-06 Toshiba Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
FR2978293A1 (fr) 2013-01-25

Similar Documents

Publication Publication Date Title
FR2985089B1 (fr) Transistor et procede de fabrication d'un transistor
FR3001166B1 (fr) Procede de rechargement d'une piece
FR2969391B1 (fr) Procédé de fabrication d'un dispositif oled
FR2975319B1 (fr) Procede de fabrication d'element moulant par frittage laser
FR2962429B1 (fr) Procede de fabrication d'un composant amortissant les vibrations
FR2998709B1 (fr) Procede de fabrication d'un transistor a heterojonction de type normalement bloque
FR2955581B1 (fr) Procede de fabrication d'une composition d'elastomere a propriete auto-obturante
FR2968431B1 (fr) Procédé de fabrication d'un dispositif a microcircuit
FR3011119B1 (fr) Procede de realisation d'un transistor
FR3002079B1 (fr) Procede de fabrication d'un transistor
FR3002080B1 (fr) Procede de fabrication d'un transistor
FR2997028B1 (fr) Procede de fabrication d'un organe fonctionnel de serrure
FR2979267B1 (fr) Procede de fabrication d'une piece par forgeage
FR3015114B1 (fr) Procede de fabrication d'un photo-detecteur
GB2507214B (en) Method of forming a top gate transistor
FR2991207B1 (fr) Procede de fabrication d'un materiau thermoelectrique
FR2990242B1 (fr) Procede de demontage d'un turboreacteur
FR2985262B1 (fr) Procede de fabrication d'un film polyester bietire
FR2982734B1 (fr) Procede de fabrication d'un fer a cheval
FR2971961B1 (fr) Procede de fabrication d'une piece metallique
FR2984224B1 (fr) Pneumatique et procede de fabrication d'une ceinture de triangulation de pneumatique
FR3002813B1 (fr) Procede de fabrication d'un transistor mos a ailette
FR2970662B1 (fr) Vilebrequin et procede de fabrication de ce vilebrequin
FR2929134B1 (fr) Procede de fabrication d'un garnissage ondule-croise
FR2962849B1 (fr) Procede de dopage d'un materiau semi-conducteur

Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20150331