FR2967368B1 - Procede de preparation d'un tampon a polir contenant du silicate - Google Patents

Procede de preparation d'un tampon a polir contenant du silicate

Info

Publication number
FR2967368B1
FR2967368B1 FR1160259A FR1160259A FR2967368B1 FR 2967368 B1 FR2967368 B1 FR 2967368B1 FR 1160259 A FR1160259 A FR 1160259A FR 1160259 A FR1160259 A FR 1160259A FR 2967368 B1 FR2967368 B1 FR 2967368B1
Authority
FR
France
Prior art keywords
silicate
preparing
polishing pad
containing polishing
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1160259A
Other languages
English (en)
Other versions
FR2967368A1 (fr
Inventor
Donna M Alden
Andrew R Wank
Robert Gargione
Mark E Gazze
Joseph K So
David Drop
Shawn Riley
Mai Tieu Banh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Electronic Materials CMP Holdings Inc
Rohm and Haas Electronic Materials LLC
Original Assignee
Rohm and Haas Electronic Materials CMP Holdings Inc
Rohm and Haas Electronic Materials LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials CMP Holdings Inc, Rohm and Haas Electronic Materials LLC filed Critical Rohm and Haas Electronic Materials CMP Holdings Inc
Publication of FR2967368A1 publication Critical patent/FR2967368A1/fr
Application granted granted Critical
Publication of FR2967368B1 publication Critical patent/FR2967368B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0054—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for by impressing abrasive powder in a matrix
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/14—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
FR1160259A 2010-11-12 2011-11-10 Procede de preparation d'un tampon a polir contenant du silicate Active FR2967368B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/945,504 US8202334B2 (en) 2010-11-12 2010-11-12 Method of forming silicate polishing pad

Publications (2)

Publication Number Publication Date
FR2967368A1 FR2967368A1 (fr) 2012-05-18
FR2967368B1 true FR2967368B1 (fr) 2015-08-21

Family

ID=45999143

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1160259A Active FR2967368B1 (fr) 2010-11-12 2011-11-10 Procede de preparation d'un tampon a polir contenant du silicate

Country Status (7)

Country Link
US (1) US8202334B2 (fr)
JP (1) JP5845832B2 (fr)
KR (1) KR101861372B1 (fr)
CN (1) CN102463531B (fr)
DE (1) DE102011117944B4 (fr)
FR (1) FR2967368B1 (fr)
TW (1) TWI593509B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8894732B2 (en) * 2012-05-11 2014-11-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Hollow polymeric-alkaline earth metal oxide composite
US8888877B2 (en) * 2012-05-11 2014-11-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Forming alkaline-earth metal oxide polishing pad
US9073172B2 (en) 2012-05-11 2015-07-07 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Alkaline-earth metal oxide-polymeric polishing pad
US20150306731A1 (en) * 2014-04-25 2015-10-29 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad
US11524390B2 (en) * 2017-05-01 2022-12-13 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Methods of making chemical mechanical polishing layers having improved uniformity
KR102293801B1 (ko) * 2019-11-28 2021-08-25 에스케이씨솔믹스 주식회사 연마패드, 이의 제조방법 및 이를 이용한 반도체 소자의 제조방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY114512A (en) * 1992-08-19 2002-11-30 Rodel Inc Polymeric substrate with polymeric microelements
US5447275A (en) 1993-01-29 1995-09-05 Canon Kabushiki Kaisha Toner production process
JP3984833B2 (ja) * 2001-01-16 2007-10-03 キヤノン株式会社 現像剤担持体の再生方法
JP2003062748A (ja) * 2001-08-24 2003-03-05 Inoac Corp 研磨用パッド
US6986705B2 (en) * 2004-04-05 2006-01-17 Rimpad Tech Ltd. Polishing pad and method of making same
JP5478066B2 (ja) * 2006-08-21 2014-04-23 株式会社日本触媒 微粒子、微粒子の製造方法、この微粒子を含む樹脂組成物および光学フィルム
JP5222586B2 (ja) * 2008-02-29 2013-06-26 富士紡ホールディングス株式会社 研磨パッドおよび研磨パッドの製造方法
JP2009254938A (ja) * 2008-04-14 2009-11-05 Nippon Shokubai Co Ltd 粒子の分級方法およびその方法を用いて得られる粒子
JP5543717B2 (ja) * 2009-02-13 2014-07-09 積水化学工業株式会社 熱膨張性マイクロカプセル及び熱膨張性マイクロカプセルの製造方法
US7947098B2 (en) 2009-04-27 2011-05-24 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects

Also Published As

Publication number Publication date
TW201221293A (en) 2012-06-01
JP2012101353A (ja) 2012-05-31
US20120117889A1 (en) 2012-05-17
US8202334B2 (en) 2012-06-19
KR101861372B1 (ko) 2018-05-28
DE102011117944B4 (de) 2023-06-29
FR2967368A1 (fr) 2012-05-18
DE102011117944A1 (de) 2012-05-16
TWI593509B (zh) 2017-08-01
JP5845832B2 (ja) 2016-01-20
CN102463531B (zh) 2014-10-01
CN102463531A (zh) 2012-05-23
KR20120057518A (ko) 2012-06-05

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