FR2907965B1 - Procede de traitement d'un substrat donneur pour la fabrication d'un substrat. - Google Patents
Procede de traitement d'un substrat donneur pour la fabrication d'un substrat.Info
- Publication number
- FR2907965B1 FR2907965B1 FR0609465A FR0609465A FR2907965B1 FR 2907965 B1 FR2907965 B1 FR 2907965B1 FR 0609465 A FR0609465 A FR 0609465A FR 0609465 A FR0609465 A FR 0609465A FR 2907965 B1 FR2907965 B1 FR 2907965B1
- Authority
- FR
- France
- Prior art keywords
- substrate
- manufacturing
- processing donor
- processing
- donor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
- H01L21/76254—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0609465A FR2907965B1 (fr) | 2006-10-27 | 2006-10-27 | Procede de traitement d'un substrat donneur pour la fabrication d'un substrat. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0609465A FR2907965B1 (fr) | 2006-10-27 | 2006-10-27 | Procede de traitement d'un substrat donneur pour la fabrication d'un substrat. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2907965A1 FR2907965A1 (fr) | 2008-05-02 |
FR2907965B1 true FR2907965B1 (fr) | 2009-03-06 |
Family
ID=38006848
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0609465A Expired - Fee Related FR2907965B1 (fr) | 2006-10-27 | 2006-10-27 | Procede de traitement d'un substrat donneur pour la fabrication d'un substrat. |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2907965B1 (fr) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4617066A (en) * | 1984-11-26 | 1986-10-14 | Hughes Aircraft Company | Process of making semiconductors having shallow, hyperabrupt doped regions by implantation and two step annealing |
KR960039439A (ko) * | 1995-04-17 | 1996-11-25 | 김광호 | 폴리실리콘막의 제조방법 |
AU8036898A (en) * | 1997-06-19 | 1999-01-04 | Asahi Kasei Kogyo Kabushiki Kaisha | Soi substrate and process for preparing the same, and semiconductor device and process for preparing the same |
US6303508B1 (en) * | 1999-12-16 | 2001-10-16 | Philips Electronics North America Corporation | Superior silicon carbide integrated circuits and method of fabricating |
FR2847075B1 (fr) * | 2002-11-07 | 2005-02-18 | Commissariat Energie Atomique | Procede de formation d'une zone fragile dans un substrat par co-implantation |
WO2006037783A1 (fr) * | 2004-10-04 | 2006-04-13 | S.O.I.Tec Silicon On Insulator Technologies | Procédé de transfert d'une couche mince comprenant une perturbation controlée d'une structure cristalline |
FR2884046B1 (fr) * | 2005-03-31 | 2007-06-22 | Soitec Silicon On Insulator | Procede de fabrication de substrat, et substrat |
-
2006
- 2006-10-27 FR FR0609465A patent/FR2907965B1/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2907965A1 (fr) | 2008-05-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20120629 |