FR2902575B1 - Appareil de caracterisation optique du dopage d'un substrat - Google Patents

Appareil de caracterisation optique du dopage d'un substrat

Info

Publication number
FR2902575B1
FR2902575B1 FR0605329A FR0605329A FR2902575B1 FR 2902575 B1 FR2902575 B1 FR 2902575B1 FR 0605329 A FR0605329 A FR 0605329A FR 0605329 A FR0605329 A FR 0605329A FR 2902575 B1 FR2902575 B1 FR 2902575B1
Authority
FR
France
Prior art keywords
doping
substrate
optically characterizing
characterizing
optically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0605329A
Other languages
English (en)
Other versions
FR2902575A1 (fr
Inventor
Franck Torregrosa
Laurent Roux
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ion Beam Services SA
Original Assignee
Ion Beam Services SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ion Beam Services SA filed Critical Ion Beam Services SA
Priority to FR0605329A priority Critical patent/FR2902575B1/fr
Priority to KR1020097000788A priority patent/KR20090028629A/ko
Priority to US12/308,446 priority patent/US20100012031A1/en
Priority to PCT/FR2007/000992 priority patent/WO2007144514A1/fr
Priority to EP07803753A priority patent/EP2032974A1/fr
Priority to CNA2007800298095A priority patent/CN101501475A/zh
Publication of FR2902575A1 publication Critical patent/FR2902575A1/fr
Application granted granted Critical
Publication of FR2902575B1 publication Critical patent/FR2902575B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/215—Brewster incidence arrangement

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
FR0605329A 2006-06-14 2006-06-14 Appareil de caracterisation optique du dopage d'un substrat Expired - Fee Related FR2902575B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR0605329A FR2902575B1 (fr) 2006-06-14 2006-06-14 Appareil de caracterisation optique du dopage d'un substrat
KR1020097000788A KR20090028629A (ko) 2006-06-14 2007-06-14 기판의 도핑 영역의 광학적 특성 조사 방법 및 장치
US12/308,446 US20100012031A1 (en) 2006-06-14 2007-06-14 Method and apparatus for optically characterizing the doping of a substrate
PCT/FR2007/000992 WO2007144514A1 (fr) 2006-06-14 2007-06-14 Méthode et appareil de caractérisation optique du dopage d'un substrat
EP07803753A EP2032974A1 (fr) 2006-06-14 2007-06-14 Méthode et appareil de caractérisation optique du dopage d'un substrat
CNA2007800298095A CN101501475A (zh) 2006-06-14 2007-06-14 用于光学特征化基片掺杂的方法和设备

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0605329A FR2902575B1 (fr) 2006-06-14 2006-06-14 Appareil de caracterisation optique du dopage d'un substrat

Publications (2)

Publication Number Publication Date
FR2902575A1 FR2902575A1 (fr) 2007-12-21
FR2902575B1 true FR2902575B1 (fr) 2008-09-05

Family

ID=37649369

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0605329A Expired - Fee Related FR2902575B1 (fr) 2006-06-14 2006-06-14 Appareil de caracterisation optique du dopage d'un substrat

Country Status (6)

Country Link
US (1) US20100012031A1 (fr)
EP (1) EP2032974A1 (fr)
KR (1) KR20090028629A (fr)
CN (1) CN101501475A (fr)
FR (1) FR2902575B1 (fr)
WO (1) WO2007144514A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010046438A1 (de) * 2010-09-24 2012-03-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zur optischen Charakterisierung von Materialien
CN105097400B (zh) * 2015-08-03 2017-10-17 京东方科技集团股份有限公司 离子注入系统及方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4826321A (en) * 1988-03-14 1989-05-02 Nanometrics, Incorporated Thin dielectric film measuring system
JPH0763667A (ja) * 1993-08-25 1995-03-10 Shimadzu Corp 不純物ドーピング量測定方法および装置
US5552327A (en) * 1994-08-26 1996-09-03 North Carolina State University Methods for monitoring and controlling deposition and etching using p-polarized reflectance spectroscopy
EP0814505A1 (fr) * 1996-06-19 1997-12-29 J.A. Woollam Co. Inc. ContrÔler optique in-situ d'un élément traité
US6849470B1 (en) * 1996-11-08 2005-02-01 Matsushita Electric Industrial Co., Ltd. Apparatus and method for optical evaluation, apparatus and method for manufacturing semiconductor device, method of controlling apparatus for manufacturing semiconductor device, and semiconductor device
US6113733A (en) * 1996-11-08 2000-09-05 Matsushita Electric Industrial Co., Ltd. Apparatus and method for optical evaluation, apparatus and method for manufacturing semiconductor device, method of controlling apparatus for manufacturing semiconductor device, and semiconductor device
US6049220A (en) * 1998-06-10 2000-04-11 Boxer Cross Incorporated Apparatus and method for evaluating a wafer of semiconductor material
FR2818390B1 (fr) * 2000-12-15 2003-11-07 Ion Beam Services Guide d'onde comportant un canal sur un substrat optique
FR2818755B1 (fr) * 2000-12-26 2004-06-11 Ion Beam Services Dispositif optiquement actif comportant un canal sur un substrat optique
FR2871812B1 (fr) * 2004-06-16 2008-09-05 Ion Beam Services Sa Implanteur ionique fonctionnant en mode plasma pulse

Also Published As

Publication number Publication date
EP2032974A1 (fr) 2009-03-11
US20100012031A1 (en) 2010-01-21
WO2007144514A1 (fr) 2007-12-21
CN101501475A (zh) 2009-08-05
KR20090028629A (ko) 2009-03-18
FR2902575A1 (fr) 2007-12-21

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