FR2811686B1 - Procede de fabrication de couches de carbone aptes a emettre des electrons, par depot chimique en phase vapeur - Google Patents

Procede de fabrication de couches de carbone aptes a emettre des electrons, par depot chimique en phase vapeur

Info

Publication number
FR2811686B1
FR2811686B1 FR0009309A FR0009309A FR2811686B1 FR 2811686 B1 FR2811686 B1 FR 2811686B1 FR 0009309 A FR0009309 A FR 0009309A FR 0009309 A FR0009309 A FR 0009309A FR 2811686 B1 FR2811686 B1 FR 2811686B1
Authority
FR
France
Prior art keywords
vapor deposition
chemical vapor
producing carbon
carbon layers
emitting electrons
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0009309A
Other languages
English (en)
Other versions
FR2811686A1 (fr
Inventor
Marie Noelle Semeria
Jacques Baylet
Adeline Fournier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR0009309A priority Critical patent/FR2811686B1/fr
Priority to PCT/FR2001/002304 priority patent/WO2002006559A1/fr
Publication of FR2811686A1 publication Critical patent/FR2811686A1/fr
Application granted granted Critical
Publication of FR2811686B1 publication Critical patent/FR2811686B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus
FR0009309A 2000-07-17 2000-07-17 Procede de fabrication de couches de carbone aptes a emettre des electrons, par depot chimique en phase vapeur Expired - Fee Related FR2811686B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0009309A FR2811686B1 (fr) 2000-07-17 2000-07-17 Procede de fabrication de couches de carbone aptes a emettre des electrons, par depot chimique en phase vapeur
PCT/FR2001/002304 WO2002006559A1 (fr) 2000-07-17 2001-07-16 Procede de fabrication de couches de carbone aptes a emettre des electrons, par depot chimique en phase vapeur

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0009309A FR2811686B1 (fr) 2000-07-17 2000-07-17 Procede de fabrication de couches de carbone aptes a emettre des electrons, par depot chimique en phase vapeur

Publications (2)

Publication Number Publication Date
FR2811686A1 FR2811686A1 (fr) 2002-01-18
FR2811686B1 true FR2811686B1 (fr) 2003-01-10

Family

ID=8852559

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0009309A Expired - Fee Related FR2811686B1 (fr) 2000-07-17 2000-07-17 Procede de fabrication de couches de carbone aptes a emettre des electrons, par depot chimique en phase vapeur

Country Status (2)

Country Link
FR (1) FR2811686B1 (fr)
WO (1) WO2002006559A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2857379A1 (fr) * 2003-07-09 2005-01-14 Inanov Croissance catalytique et directionnelle de nanotubes de carbone individuels, applications a des sources froides d'electrons
CN111910171A (zh) * 2020-05-26 2020-11-10 厦门大学 一种电场和/或磁场调控合成二维材料的装置和方法
CN113802107B (zh) * 2020-06-16 2023-12-08 北京石墨烯研究院 利用pecvd制备石墨烯的装置和方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4645713A (en) * 1985-01-25 1987-02-24 Agency Of Industrial Science & Technology Method for forming conductive graphite film and film formed thereby
JPS63140083A (ja) * 1986-05-29 1988-06-11 Nippon Steel Corp 黒色透明外観のステンレス鋼およびその製造方法
US6080470A (en) * 1996-06-17 2000-06-27 Dorfman; Benjamin F. Hard graphite-like material bonded by diamond-like framework
US5989998A (en) * 1996-08-29 1999-11-23 Matsushita Electric Industrial Co., Ltd. Method of forming interlayer insulating film

Also Published As

Publication number Publication date
WO2002006559A1 (fr) 2002-01-24
FR2811686A1 (fr) 2002-01-18

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Legal Events

Date Code Title Description
ST Notification of lapse