FR2811317B1 - Resine reticulee et procede de fabrication d'oxydes utilisant cette resine reticulee - Google Patents
Resine reticulee et procede de fabrication d'oxydes utilisant cette resine reticuleeInfo
- Publication number
- FR2811317B1 FR2811317B1 FR0008920A FR0008920A FR2811317B1 FR 2811317 B1 FR2811317 B1 FR 2811317B1 FR 0008920 A FR0008920 A FR 0008920A FR 0008920 A FR0008920 A FR 0008920A FR 2811317 B1 FR2811317 B1 FR 2811317B1
- Authority
- FR
- France
- Prior art keywords
- crosslinked resin
- producing oxides
- oxides
- producing
- crosslinked
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011347 resin Substances 0.000 title 1
- 229920005989 resin Polymers 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
- H01L21/31691—Inorganic layers composed of oxides or glassy oxides or oxide based glass with perovskite structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02197—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides the material having a perovskite structure, e.g. BaTiO3
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Glass Compositions (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0008920A FR2811317B1 (fr) | 2000-07-07 | 2000-07-07 | Resine reticulee et procede de fabrication d'oxydes utilisant cette resine reticulee |
EP01954061A EP1230674A1 (fr) | 2000-07-07 | 2001-07-06 | Resine reticulee et procede de fabrication d'oxydes utilisant cette resine reticulee |
PCT/FR2001/002189 WO2002005340A1 (fr) | 2000-07-07 | 2001-07-06 | Resine reticulee et procede de fabrication d'oxydes utilisant cette resine reticulee |
US10/069,951 US20020135001A1 (en) | 2000-07-07 | 2001-07-06 | Crosslinked resin and method for making oxides using same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0008920A FR2811317B1 (fr) | 2000-07-07 | 2000-07-07 | Resine reticulee et procede de fabrication d'oxydes utilisant cette resine reticulee |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2811317A1 FR2811317A1 (fr) | 2002-01-11 |
FR2811317B1 true FR2811317B1 (fr) | 2002-10-11 |
Family
ID=8852265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0008920A Expired - Fee Related FR2811317B1 (fr) | 2000-07-07 | 2000-07-07 | Resine reticulee et procede de fabrication d'oxydes utilisant cette resine reticulee |
Country Status (4)
Country | Link |
---|---|
US (1) | US20020135001A1 (fr) |
EP (1) | EP1230674A1 (fr) |
FR (1) | FR2811317B1 (fr) |
WO (1) | WO2002005340A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103360066B (zh) * | 2008-05-28 | 2015-11-18 | 三菱综合材料株式会社 | 强电介质薄膜形成用组合物、强电介质薄膜的形成方法及通过该方法形成的强电介质薄膜 |
GB2521405B (en) * | 2013-12-18 | 2015-12-02 | Dublin Inst Of Technology | A surface coating |
JP6766884B2 (ja) * | 2016-12-08 | 2020-10-14 | 株式会社デンソー | 座席空調装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR431999A (fr) | 1911-02-01 | 1911-11-24 | Hermann Jacoby | Indicateur automatique de dégonflement pour bandages pneumatiques |
US4541855A (en) * | 1983-08-18 | 1985-09-17 | Corning Glass Works | Method of forming a glass or ceramic product |
US4957945A (en) * | 1988-04-01 | 1990-09-18 | The Goodyear Tire & Rubber Company | Preparation of ultra high molecular weight polyester |
FR2654720B1 (fr) * | 1989-11-20 | 1992-01-31 | Thomson Csf | Procede de depot d'une composition ceramique en couche mince et produit obtenu par ce procede. |
US5100764A (en) * | 1989-12-26 | 1992-03-31 | Iowa State University Research Foundation, Inc. | Method of making patterned metal oxide films comprising a sol-gel of metal oxide and a photoactive compound |
US5627013A (en) * | 1991-11-14 | 1997-05-06 | Rohm Co., Ltd. | Method of forming a fine pattern of ferroelectric film |
US5494700A (en) * | 1994-04-05 | 1996-02-27 | The Curators Of The University Of Missouri | Method of coating a substrate with a metal oxide film from an aqueous solution comprising a metal cation and a polymerizable organic solvent |
US5972428A (en) * | 1996-03-05 | 1999-10-26 | Symetrix Corporation | Methods and apparatus for material deposition using primer |
JP2990088B2 (ja) * | 1997-02-28 | 1999-12-13 | 日本電気株式会社 | マンガン含有複合酸化物,およびその複合酸化物を用いた複合ぺロブスカイト化合物組成物の製造方法 |
US5944866A (en) * | 1997-09-26 | 1999-08-31 | Lucent Technologies Inc. | Fabrication including sol-gel processing |
US6002031A (en) * | 1998-09-04 | 1999-12-14 | International Business Machines Corporation | Metal alkoxyalkoxidecarboxylates and use to form films |
-
2000
- 2000-07-07 FR FR0008920A patent/FR2811317B1/fr not_active Expired - Fee Related
-
2001
- 2001-07-06 US US10/069,951 patent/US20020135001A1/en not_active Abandoned
- 2001-07-06 EP EP01954061A patent/EP1230674A1/fr not_active Withdrawn
- 2001-07-06 WO PCT/FR2001/002189 patent/WO2002005340A1/fr not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO2002005340A1 (fr) | 2002-01-17 |
US20020135001A1 (en) | 2002-09-26 |
FR2811317A1 (fr) | 2002-01-11 |
EP1230674A1 (fr) | 2002-08-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
CD | Change of name or company name | ||
ST | Notification of lapse |
Effective date: 20080331 |