FR2793951B1 - PROCESS AND INSTALLATION FOR PROCESSING A SUBSTRATE SUCH AS AN INTEGRATED CIRCUIT WITH A FOCUSED BEAM OF ELECTRICALLY NEUTRAL PARTICLES - Google Patents

PROCESS AND INSTALLATION FOR PROCESSING A SUBSTRATE SUCH AS AN INTEGRATED CIRCUIT WITH A FOCUSED BEAM OF ELECTRICALLY NEUTRAL PARTICLES

Info

Publication number
FR2793951B1
FR2793951B1 FR9906501A FR9906501A FR2793951B1 FR 2793951 B1 FR2793951 B1 FR 2793951B1 FR 9906501 A FR9906501 A FR 9906501A FR 9906501 A FR9906501 A FR 9906501A FR 2793951 B1 FR2793951 B1 FR 2793951B1
Authority
FR
France
Prior art keywords
installation
substrate
processing
integrated circuit
focused beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9906501A
Other languages
French (fr)
Other versions
FR2793951A1 (en
Inventor
Jamel Benbrik
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National dEtudes Spatiales CNES
Original Assignee
Centre National dEtudes Spatiales CNES
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National dEtudes Spatiales CNES filed Critical Centre National dEtudes Spatiales CNES
Priority to FR9906501A priority Critical patent/FR2793951B1/en
Publication of FR2793951A1 publication Critical patent/FR2793951A1/en
Application granted granted Critical
Publication of FR2793951B1 publication Critical patent/FR2793951B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
FR9906501A 1999-05-21 1999-05-21 PROCESS AND INSTALLATION FOR PROCESSING A SUBSTRATE SUCH AS AN INTEGRATED CIRCUIT WITH A FOCUSED BEAM OF ELECTRICALLY NEUTRAL PARTICLES Expired - Fee Related FR2793951B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9906501A FR2793951B1 (en) 1999-05-21 1999-05-21 PROCESS AND INSTALLATION FOR PROCESSING A SUBSTRATE SUCH AS AN INTEGRATED CIRCUIT WITH A FOCUSED BEAM OF ELECTRICALLY NEUTRAL PARTICLES

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9906501A FR2793951B1 (en) 1999-05-21 1999-05-21 PROCESS AND INSTALLATION FOR PROCESSING A SUBSTRATE SUCH AS AN INTEGRATED CIRCUIT WITH A FOCUSED BEAM OF ELECTRICALLY NEUTRAL PARTICLES

Publications (2)

Publication Number Publication Date
FR2793951A1 FR2793951A1 (en) 2000-11-24
FR2793951B1 true FR2793951B1 (en) 2001-08-17

Family

ID=9545889

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9906501A Expired - Fee Related FR2793951B1 (en) 1999-05-21 1999-05-21 PROCESS AND INSTALLATION FOR PROCESSING A SUBSTRATE SUCH AS AN INTEGRATED CIRCUIT WITH A FOCUSED BEAM OF ELECTRICALLY NEUTRAL PARTICLES

Country Status (1)

Country Link
FR (1) FR2793951B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102181456B1 (en) * 2019-08-16 2020-11-23 참엔지니어링(주) Inspecting apparatus, repairing apparatus and particle beam apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2389998B1 (en) * 1977-05-05 1981-11-20 Ibm
US4804837A (en) * 1988-01-11 1989-02-14 Eaton Corporation Ion implantation surface charge control method and apparatus
US4874947A (en) * 1988-02-26 1989-10-17 Micrion Corporation Focused ion beam imaging and process control
US5683547A (en) * 1990-11-21 1997-11-04 Hitachi, Ltd. Processing method and apparatus using focused energy beam

Also Published As

Publication number Publication date
FR2793951A1 (en) 2000-11-24

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20120131