FR2713343B1 - Détecteur d'accélération en matériau cristallin et procédé pour la fabrication de ce détecteur d'accélération. - Google Patents

Détecteur d'accélération en matériau cristallin et procédé pour la fabrication de ce détecteur d'accélération.

Info

Publication number
FR2713343B1
FR2713343B1 FR9412893A FR9412893A FR2713343B1 FR 2713343 B1 FR2713343 B1 FR 2713343B1 FR 9412893 A FR9412893 A FR 9412893A FR 9412893 A FR9412893 A FR 9412893A FR 2713343 B1 FR2713343 B1 FR 2713343B1
Authority
FR
France
Prior art keywords
acceleration detector
manufacturing
crystalline material
acceleration
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9412893A
Other languages
English (en)
Other versions
FR2713343A1 (fr
Inventor
Michael Offenberg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of FR2713343A1 publication Critical patent/FR2713343A1/fr
Application granted granted Critical
Publication of FR2713343B1 publication Critical patent/FR2713343B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0086—Electrical characteristics, e.g. reducing driving voltage, improving resistance to peak voltage
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0067—Mechanical properties
    • B81B3/0078—Constitution or structural means for improving mechanical properties not provided for in B81B3/007 - B81B3/0075
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B81C1/00595—Control etch selectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0228—Inertial sensors
    • B81B2201/0235—Accelerometers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0118—Cantilevers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0136—Comb structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102—Surface micromachining
    • B81C2201/0105—Sacrificial layer
    • B81C2201/0107—Sacrificial metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102—Surface micromachining
    • B81C2201/0105—Sacrificial layer
    • B81C2201/0109—Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/016—Passivation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0808—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
    • G01P2015/0811—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass
    • G01P2015/0814—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass for translational movement of the mass, e.g. shuttle type

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Geometry (AREA)
  • Manufacturing & Machinery (AREA)
  • Pressure Sensors (AREA)
FR9412893A 1993-12-03 1994-10-27 Détecteur d'accélération en matériau cristallin et procédé pour la fabrication de ce détecteur d'accélération. Expired - Fee Related FR2713343B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4341271A DE4341271B4 (de) 1993-12-03 1993-12-03 Beschleunigungssensor aus kristallinem Material und Verfahren zur Herstellung dieses Beschleunigungssensors

Publications (2)

Publication Number Publication Date
FR2713343A1 FR2713343A1 (fr) 1995-06-09
FR2713343B1 true FR2713343B1 (fr) 1998-11-06

Family

ID=6504130

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9412893A Expired - Fee Related FR2713343B1 (fr) 1993-12-03 1994-10-27 Détecteur d'accélération en matériau cristallin et procédé pour la fabrication de ce détecteur d'accélération.

Country Status (4)

Country Link
US (2) US5578755A (fr)
JP (1) JP3493068B2 (fr)
DE (1) DE4341271B4 (fr)
FR (1) FR2713343B1 (fr)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5616514A (en) * 1993-06-03 1997-04-01 Robert Bosch Gmbh Method of fabricating a micromechanical sensor
DE19526691A1 (de) * 1995-07-21 1997-01-23 Bosch Gmbh Robert Verfahren zur Herstellung von Beschleunigungssensoren
US5817942A (en) 1996-02-28 1998-10-06 The Charles Stark Draper Laboratory, Inc. Capacitive in-plane accelerometer
EP0822579B1 (fr) * 1996-07-31 2004-07-21 STMicroelectronics S.r.l. Des structures intégrés d'un matériau semi-conducteur et un procédé pour leur fabrication
US6472244B1 (en) 1996-07-31 2002-10-29 Sgs-Thomson Microelectronics S.R.L. Manufacturing method and integrated microstructures of semiconductor material and integrated piezoresistive pressure sensor having a diaphragm of polycrystalline semiconductor material
US6013933A (en) * 1997-05-30 2000-01-11 Motorola, Inc. Semiconductor structure having a monocrystalline member overlying a cavity in a semiconductor substrate and process therefor
US6070110A (en) * 1997-06-23 2000-05-30 Carrier Corporation Humidity control thermostat and method for an air conditioning system
US6087701A (en) * 1997-12-23 2000-07-11 Motorola, Inc. Semiconductor device having a cavity and method of making
KR100464297B1 (ko) * 1998-03-04 2005-02-28 삼성전자주식회사 용량변화마이크로가속도계
US6291875B1 (en) 1998-06-24 2001-09-18 Analog Devices Imi, Inc. Microfabricated structures with electrical isolation and interconnections
US6105428A (en) 1998-12-10 2000-08-22 Motorola, Inc. Sensor and method of use
US6433401B1 (en) 1999-04-06 2002-08-13 Analog Devices Imi, Inc. Microfabricated structures with trench-isolation using bonded-substrates and cavities
US6703679B1 (en) 1999-08-31 2004-03-09 Analog Devices, Imi, Inc. Low-resistivity microelectromechanical structures with co-fabricated integrated circuit
DE19960094A1 (de) * 1999-12-14 2001-07-05 Bosch Gmbh Robert Verfahren zur mikromechanischen Herstellung eines Halbleiterelements, insbesondere Beschleunigungssensors
US6868726B2 (en) * 2000-01-20 2005-03-22 Analog Devices Imi, Inc. Position sensing with improved linearity
US6440766B1 (en) 2000-02-16 2002-08-27 Analog Devices Imi, Inc. Microfabrication using germanium-based release masks
DE10017976A1 (de) 2000-04-11 2001-10-18 Bosch Gmbh Robert Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren
US6583374B2 (en) * 2001-02-20 2003-06-24 Rockwell Automation Technologies, Inc. Microelectromechanical system (MEMS) digital electrical isolator
JP4306149B2 (ja) * 2001-05-28 2009-07-29 株式会社デンソー 半導体装置の製造方法
US6513380B2 (en) 2001-06-19 2003-02-04 Microsensors, Inc. MEMS sensor with single central anchor and motion-limiting connection geometry
US6761070B2 (en) 2002-01-31 2004-07-13 Delphi Technologies, Inc. Microfabricated linear accelerometer
JP4117450B2 (ja) * 2002-03-18 2008-07-16 株式会社デンソー 半導体装置の製造方法
US20050235751A1 (en) * 2004-04-27 2005-10-27 Zarabadi Seyed R Dual-axis accelerometer
US7194376B2 (en) * 2004-04-27 2007-03-20 Delphi Technologies, Inc. Circuit and method of processing multiple-axis sensor output signals
US7250322B2 (en) * 2005-03-16 2007-07-31 Delphi Technologies, Inc. Method of making microsensor
US20060207327A1 (en) 2005-03-16 2006-09-21 Zarabadi Seyed R Linear accelerometer
US7740184B2 (en) * 2006-08-03 2010-06-22 Honeywell International Inc. Methods of dehumidification control in unoccupied spaces
US20120244969A1 (en) 2011-03-25 2012-09-27 May Patents Ltd. System and Method for a Motion Sensing Device
US20130201316A1 (en) 2012-01-09 2013-08-08 May Patents Ltd. System and method for server based control
WO2013175269A1 (fr) 2012-05-24 2013-11-28 May Patents Ltd. Système et procédé pour un dispositif de détection de mouvement
EP4250738A3 (fr) 2014-04-22 2023-10-11 Snap-Aid Patents Ltd. Procédé de commande d'un appareil photo d'après un traitement d'une image capturée par un autre appareil photo
US10419655B2 (en) 2015-04-27 2019-09-17 Snap-Aid Patents Ltd. Estimating and using relative head pose and camera field-of-view
US11190374B2 (en) 2017-08-28 2021-11-30 Bright Data Ltd. System and method for improving content fetching by selecting tunnel devices
EP4199479A1 (fr) 2017-08-28 2023-06-21 Bright Data Ltd. Améliorer l'extraction de contenu par sélection de dispositifs de tunnel
CN111149141A (zh) 2017-09-04 2020-05-12 Nng软件开发和商业有限责任公司 用于收集并使用来自交通工具的传感器数据的方法和装置
US11290708B2 (en) 2019-02-19 2022-03-29 Edgy Bees Ltd. Estimating real-time delay of a video data stream
LT3780547T (lt) 2019-02-25 2023-03-10 Bright Data Ltd. Turinio parsisiuntimo, naudojant url bandymų mechanizmą, sistema ir būdas
US11411922B2 (en) 2019-04-02 2022-08-09 Bright Data Ltd. System and method for managing non-direct URL fetching service

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2560997B1 (fr) * 1984-03-06 1987-06-05 Sfena Capteur accelerometrique a structure pendulaire plane
FR2580389B2 (fr) * 1985-04-16 1989-03-03 Sfena Accelerometre micro-usine a rappel electrostatique
FR2599833B1 (fr) * 1986-06-10 1992-02-14 Metravib Sa Capteur de grandeurs mecaniques integre sur silicium et procede de fabrication
EP0340476B1 (fr) * 1988-04-11 1993-06-16 Nippondenso Co., Ltd. Capteur d'accélération
US4882933A (en) * 1988-06-03 1989-11-28 Novasensor Accelerometer with integral bidirectional shock protection and controllable viscous damping
US5233213A (en) * 1990-07-14 1993-08-03 Robert Bosch Gmbh Silicon-mass angular acceleration sensor
DE4022464C2 (de) * 1990-07-14 2000-12-28 Bosch Gmbh Robert Beschleunigungssensor
US5417111A (en) * 1990-08-17 1995-05-23 Analog Devices, Inc. Monolithic chip containing integrated circuitry and suspended microstructure
JPH0644008B2 (ja) * 1990-08-17 1994-06-08 アナログ・ディバイセス・インコーポレーテッド モノリシック加速度計
US5166612A (en) * 1990-11-13 1992-11-24 Tektronix, Inc. Micromechanical sensor employing a squid to detect movement
US5251484A (en) * 1992-04-03 1993-10-12 Hewlett-Packard Company Rotational accelerometer
EP0618450A1 (fr) * 1993-03-30 1994-10-05 Siemens Aktiengesellschaft Capteur d'accélération
US5610335A (en) * 1993-05-26 1997-03-11 Cornell Research Foundation Microelectromechanical lateral accelerometer
DE4317623C2 (de) * 1993-05-27 2003-08-21 Bosch Gmbh Robert Verfahren und Vorrichtung zum anisotropen Plasmaätzen von Substraten und dessen Verwendung
US5447068A (en) * 1994-03-31 1995-09-05 Ford Motor Company Digital capacitive accelerometer
US5550090A (en) * 1995-09-05 1996-08-27 Motorola Inc. Method for fabricating a monolithic semiconductor device with integrated surface micromachined structures

Also Published As

Publication number Publication date
DE4341271B4 (de) 2005-11-03
JPH07198747A (ja) 1995-08-01
US5792675A (en) 1998-08-11
DE4341271A1 (de) 1995-06-08
US5578755A (en) 1996-11-26
JP3493068B2 (ja) 2004-02-03
FR2713343A1 (fr) 1995-06-09

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20130628