FR2710628B1 - Préparation de solutions d'oxyde mixte à base d'étain et de silicium. - Google Patents

Préparation de solutions d'oxyde mixte à base d'étain et de silicium.

Info

Publication number
FR2710628B1
FR2710628B1 FR9311697A FR9311697A FR2710628B1 FR 2710628 B1 FR2710628 B1 FR 2710628B1 FR 9311697 A FR9311697 A FR 9311697A FR 9311697 A FR9311697 A FR 9311697A FR 2710628 B1 FR2710628 B1 FR 2710628B1
Authority
FR
France
Prior art keywords
tin
silicon
preparation
mixed oxide
solutions based
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9311697A
Other languages
English (en)
Other versions
FR2710628A1 (fr
Inventor
Danielle Wettling
Robert Montesino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Pathe SA
Original Assignee
Kodak Pathe SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Pathe SA filed Critical Kodak Pathe SA
Priority to FR9311697A priority Critical patent/FR2710628B1/fr
Publication of FR2710628A1 publication Critical patent/FR2710628A1/fr
Application granted granted Critical
Publication of FR2710628B1 publication Critical patent/FR2710628B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/853Inorganic compounds, e.g. metals
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/20Silicates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Compounds (AREA)
  • Conductive Materials (AREA)
FR9311697A 1993-09-27 1993-09-27 Préparation de solutions d'oxyde mixte à base d'étain et de silicium. Expired - Fee Related FR2710628B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9311697A FR2710628B1 (fr) 1993-09-27 1993-09-27 Préparation de solutions d'oxyde mixte à base d'étain et de silicium.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9311697A FR2710628B1 (fr) 1993-09-27 1993-09-27 Préparation de solutions d'oxyde mixte à base d'étain et de silicium.

Publications (2)

Publication Number Publication Date
FR2710628A1 FR2710628A1 (fr) 1995-04-07
FR2710628B1 true FR2710628B1 (fr) 1995-12-01

Family

ID=9451444

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9311697A Expired - Fee Related FR2710628B1 (fr) 1993-09-27 1993-09-27 Préparation de solutions d'oxyde mixte à base d'étain et de silicium.

Country Status (1)

Country Link
FR (1) FR2710628B1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW440544B (en) * 1994-12-27 2001-06-16 Ishihara Sangyo Kaisha Electroconductive composition
GB9615944D0 (en) * 1996-07-30 1996-09-11 Kodak Ltd A material,method and apparatus for inhibiting microbial growth in an aqueous medium
CN114684828B (zh) * 2020-12-29 2023-12-08 中国科学院上海硅酸盐研究所苏州研究院 一种二氧化锡复合氧化硅气凝胶材料及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0107284B1 (fr) * 1982-08-13 1988-11-23 United Kingdom Atomic Energy Authority Procédé pour la préparation de dispersions et de gels
JPS62223019A (ja) * 1986-03-19 1987-10-01 Taki Chem Co Ltd 結晶質酸化スズ・アンチモンゾル及びその製造方法
FR2688806B1 (fr) * 1992-03-19 1994-05-13 Kodak Pathe Fibres a base d'oxyde d'etain.

Also Published As

Publication number Publication date
FR2710628A1 (fr) 1995-04-07

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Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse

Effective date: 20080531