FR2671931B1 - - Google Patents
Info
- Publication number
- FR2671931B1 FR2671931B1 FR9100894A FR9100894A FR2671931B1 FR 2671931 B1 FR2671931 B1 FR 2671931B1 FR 9100894 A FR9100894 A FR 9100894A FR 9100894 A FR9100894 A FR 9100894A FR 2671931 B1 FR2671931 B1 FR 2671931B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32678—Electron cyclotron resonance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32688—Multi-cusp fields
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9100894A FR2671931A1 (fr) | 1991-01-22 | 1991-01-22 | Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma. |
| EP92420021A EP0496681A1 (fr) | 1991-01-22 | 1992-01-20 | Dispositif de répartition d'une énergie micro-onde pour l'excitation d'un plasma |
| US07/824,210 US5216329A (en) | 1991-01-22 | 1992-01-22 | Device for distributing a microwave energy for exciting a plasma |
| JP4009196A JPH05190294A (ja) | 1991-01-22 | 1992-01-22 | プラズマを励起するためにマイクロ波エネルギーを分布させるための装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9100894A FR2671931A1 (fr) | 1991-01-22 | 1991-01-22 | Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2671931A1 FR2671931A1 (fr) | 1992-07-24 |
| FR2671931B1 true FR2671931B1 (US20100056889A1-20100304-C00004.png) | 1997-02-21 |
Family
ID=9409082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR9100894A Granted FR2671931A1 (fr) | 1991-01-22 | 1991-01-22 | Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma. |
Country Status (4)
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1262897B (it) * | 1992-03-11 | 1996-07-22 | Proel Tecnologie Spa | Generatore di plasma perfezionato e relativo metodo di ionizzazione |
| US5231334A (en) * | 1992-04-15 | 1993-07-27 | Texas Instruments Incorporated | Plasma source and method of manufacturing |
| FR2702119B1 (fr) * | 1993-02-25 | 1995-07-13 | Metal Process | Dispositif d'excitation d'un plasma à la résonance cyclotronique électronique par l'intermédiaire d'un applicateur filaire d'un champ micro-onde et d'un champ magnétique statique. |
| US5466295A (en) * | 1993-10-25 | 1995-11-14 | Board Of Regents Acting For The Univ. Of Michigan | ECR plasma generation apparatus and methods |
| US5518547A (en) * | 1993-12-23 | 1996-05-21 | International Business Machines Corporation | Method and apparatus for reducing particulates in a plasma tool through steady state flows |
| FR2715019B1 (fr) * | 1994-01-13 | 1996-04-05 | Plasmion | Dispositif pour former un plasma par application de micro-ondes afin de produire un faisceau d'ions. |
| FR2726729B1 (fr) * | 1994-11-04 | 1997-01-31 | Metal Process | Dispositif de production d'un plasma permettant une dissociation entre les zones de propagation et d'absorption des micro-ondes |
| US5800619A (en) * | 1996-06-10 | 1998-09-01 | Lam Research Corporation | Vacuum plasma processor having coil with minimum magnetic field in its center |
| US5707452A (en) * | 1996-07-08 | 1998-01-13 | Applied Microwave Plasma Concepts, Inc. | Coaxial microwave applicator for an electron cyclotron resonance plasma source |
| DE19756774B4 (de) * | 1997-12-19 | 2009-12-31 | Tec Tra Gmbh | Mikrowellenplasmaquelle |
| US6189484B1 (en) | 1999-03-05 | 2001-02-20 | Applied Materials Inc. | Plasma reactor having a helicon wave high density plasma source |
| FR2775986B1 (fr) * | 1998-03-10 | 2000-05-05 | Air Liquide | Procede et installation de traitement de surface d'une piece metallique |
| AU2212200A (en) * | 1998-12-23 | 2000-07-12 | Applied Science And Technology, Inc. | Permanent magnet ecr plasma source with integrated multipolar magnetic confinement |
| KR100725105B1 (ko) * | 2006-07-12 | 2007-06-04 | 삼성전자주식회사 | 반도체 제조설비의 애플리케이터 |
| FR2904177B1 (fr) * | 2006-07-21 | 2008-11-07 | Centre Nat Rech Scient | Dispositif et procede de production et de confinement d'un plasma. |
| FR2938150B1 (fr) * | 2008-10-30 | 2010-12-17 | Centre Nat Rech Scient | Dispositif et procede de production et/ou de confinement d'un plasma |
| ES2513866T3 (es) | 2009-05-13 | 2014-10-27 | Sio2 Medical Products, Inc. | Revestimiento e inspección de recipientes |
| US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
| AU2012318242A1 (en) | 2011-11-11 | 2013-05-30 | Sio2 Medical Products, Inc. | Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| CA2887352A1 (en) | 2012-05-09 | 2013-11-14 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
| WO2014071061A1 (en) | 2012-11-01 | 2014-05-08 | Sio2 Medical Products, Inc. | Coating inspection method |
| WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| JP6382830B2 (ja) | 2012-11-30 | 2018-08-29 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 医療シリンジ、カートリッジ等上でのｐｅｃｖｄ堆積の均一性制御 |
| KR20140087215A (ko) * | 2012-12-28 | 2014-07-09 | 주식회사 윈텔 | 플라즈마 장치 및 기판 처리 장치 |
| US9662450B2 (en) | 2013-03-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| CN105392916B (zh) | 2013-03-11 | 2019-03-08 | Sio2医药产品公司 | 涂布包装材料 |
| WO2014144926A1 (en) | 2013-03-15 | 2014-09-18 | Sio2 Medical Products, Inc. | Coating method |
| FR3005825B1 (fr) | 2013-05-17 | 2015-06-19 | Thales Sa | Generateur de plasma etendu comprenant des generateurs elementaires integres |
| WO2015148471A1 (en) | 2014-03-28 | 2015-10-01 | Sio2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
| US10249479B2 (en) * | 2015-01-30 | 2019-04-02 | Applied Materials, Inc. | Magnet configurations for radial uniformity tuning of ICP plasmas |
| CN116982977A (zh) | 2015-08-18 | 2023-11-03 | Sio2医药产品公司 | 具有低氧气传输速率的药物和其他包装 |
| US10163609B2 (en) * | 2016-12-15 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Plasma generation for ion implanter |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0740468B2 (ja) * | 1984-12-11 | 1995-05-01 | 株式会社日立製作所 | 高周波プラズマ発生装置 |
| WO1986006923A1 (en) * | 1985-05-03 | 1986-11-20 | The Australian National University | Method and apparatus for producing large volume magnetoplasmas |
| FR2583250B1 (fr) * | 1985-06-07 | 1989-06-30 | France Etat | Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique |
| JPS6276137A (ja) * | 1985-09-30 | 1987-04-08 | Hitachi Ltd | イオン源 |
| DE3705666A1 (de) * | 1987-02-21 | 1988-09-01 | Leybold Ag | Einrichtung zum herstellen eines plasmas und zur behandlung von substraten darin |
| US4992696A (en) * | 1989-02-17 | 1991-02-12 | The United States Of America As Represented By The United States Department Of Energy | Apparatus having reduced mechanical forces for supporting high magnetic fields |
| US5081398A (en) * | 1989-10-20 | 1992-01-14 | Board Of Trustees Operating Michigan State University | Resonant radio frequency wave coupler apparatus using higher modes |
-
1991
- 1991-01-22 FR FR9100894A patent/FR2671931A1/fr active Granted
-
1992
- 1992-01-20 EP EP92420021A patent/EP0496681A1/fr not_active Withdrawn
- 1992-01-22 JP JP4009196A patent/JPH05190294A/ja not_active Withdrawn
- 1992-01-22 US US07/824,210 patent/US5216329A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05190294A (ja) | 1993-07-30 |
| FR2671931A1 (fr) | 1992-07-24 |
| EP0496681A1 (fr) | 1992-07-29 |
| US5216329A (en) | 1993-06-01 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |