FR2606426B1 - Procede et systeme de traitement de pieces sous vide - Google Patents

Procede et systeme de traitement de pieces sous vide

Info

Publication number
FR2606426B1
FR2606426B1 FR8715482A FR8715482A FR2606426B1 FR 2606426 B1 FR2606426 B1 FR 2606426B1 FR 8715482 A FR8715482 A FR 8715482A FR 8715482 A FR8715482 A FR 8715482A FR 2606426 B1 FR2606426 B1 FR 2606426B1
Authority
FR
France
Prior art keywords
processing vacuum
vacuum parts
parts
processing
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8715482A
Other languages
English (en)
Other versions
FR2606426A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of FR2606426A1 publication Critical patent/FR2606426A1/fr
Application granted granted Critical
Publication of FR2606426B1 publication Critical patent/FR2606426B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00—Control of fluid pressure
    • G05D16/20—Control of fluid pressure characterised by the use of electric means
    • G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
    • G05D16/2026—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means
    • G05D16/2046—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means the plurality of throttling means being arranged for the control of a single pressure from a plurality of converging pressures
    • G05D16/2053—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means the plurality of throttling means being arranged for the control of a single pressure from a plurality of converging pressures the plurality of throttling means comprising only a first throttling means acting on a higher pressure and a second throttling means acting on a lower pressure, e.g. the atmosphere
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0396—Involving pressure control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7722—Line condition change responsive valves
    • Y10T137/7758—Pilot or servo controlled
    • Y10T137/7761—Electrically actuated valve
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86389—Programmer or timer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86389—Programmer or timer
    • Y10T137/86445—Plural, sequential, valve actuations

Landscapes

  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Control Of Fluid Pressure (AREA)
FR8715482A 1986-11-10 1987-11-09 Procede et systeme de traitement de pieces sous vide Expired - Fee Related FR2606426B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/928,509 US4739787A (en) 1986-11-10 1986-11-10 Method and apparatus for improving the yield of integrated circuit devices

Publications (2)

Publication Number Publication Date
FR2606426A1 FR2606426A1 (fr) 1988-05-13
FR2606426B1 true FR2606426B1 (fr) 1994-03-25

Family

ID=25456334

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8715482A Expired - Fee Related FR2606426B1 (fr) 1986-11-10 1987-11-09 Procede et systeme de traitement de pieces sous vide

Country Status (4)

Country Link
US (1) US4739787A (fr)
JP (1) JPS63219130A (fr)
DE (1) DE3738160A1 (fr)
FR (1) FR2606426B1 (fr)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4836233A (en) * 1988-06-06 1989-06-06 Eclipse Ion Technology, Inc. Method and apparatus for venting vacuum processing equipment
US5031674A (en) * 1989-03-03 1991-07-16 Eaton Corporation Fluid flow control method and apparatus for minimizing particle contamination
US4987933A (en) * 1989-03-03 1991-01-29 Eaton Corporation Fluid flow control method and apparatus for minimizing particle contamination
US5240046A (en) * 1989-03-03 1993-08-31 Eaton Corporation Fluid flow control method and apparatus for minimizing particle contamination
US5308989A (en) * 1992-12-22 1994-05-03 Eaton Corporation Fluid flow control method and apparatus for an ion implanter
US5527390A (en) * 1993-03-19 1996-06-18 Tokyo Electron Kabushiki Treatment system including a plurality of treatment apparatus
JP3332053B2 (ja) * 1993-10-27 2002-10-07 清原 まさ子 チャンバーへのガス供給方法
KR100189981B1 (ko) * 1995-11-21 1999-06-01 윤종용 진공 시스템을 구비한 반도체 소자 제조장치
US5820641A (en) * 1996-02-09 1998-10-13 Mks Instruments, Inc. Fluid cooled trap
US6312525B1 (en) 1997-07-11 2001-11-06 Applied Materials, Inc. Modular architecture for semiconductor wafer fabrication equipment
US6238514B1 (en) 1999-02-18 2001-05-29 Mks Instruments, Inc. Apparatus and method for removing condensable aluminum vapor from aluminum etch effluent
US6197119B1 (en) 1999-02-18 2001-03-06 Mks Instruments, Inc. Method and apparatus for controlling polymerized teos build-up in vacuum pump lines
US6440261B1 (en) 1999-05-25 2002-08-27 Applied Materials, Inc. Dual buffer chamber cluster tool for semiconductor wafer processing
US6558509B2 (en) * 1999-11-30 2003-05-06 Applied Materials, Inc. Dual wafer load lock
US20050189074A1 (en) * 2002-11-08 2005-09-01 Tokyo Electron Limited Gas processing apparatus and method and computer storage medium storing program for controlling same
US6488745B2 (en) 2001-03-23 2002-12-03 Mks Instruments, Inc. Trap apparatus and method for condensable by-products of deposition reactions
US6655408B2 (en) * 2001-06-13 2003-12-02 Applied Materials, Inc. Tunable ramp rate circuit for a mass flow controller
US20030013212A1 (en) * 2001-07-10 2003-01-16 Mitchell Bradley Dale System and method for removing deposited material from within a semiconductor fabrication device
TWI256083B (en) * 2004-06-02 2006-06-01 Lam Res Co Ltd Seasoning method for etch chamber
US20070134821A1 (en) * 2004-11-22 2007-06-14 Randhir Thakur Cluster tool for advanced front-end processing
US20070196011A1 (en) * 2004-11-22 2007-08-23 Cox Damon K Integrated vacuum metrology for cluster tool
US8172923B2 (en) * 2008-01-17 2012-05-08 Entegris, Inc. Apparatus and method for reducing particle contamination in a vacuum chamber
WO2018073192A1 (fr) * 2016-10-17 2018-04-26 Asml Netherlands B.V. Système de soupapes d'évacuation
DE102018112853A1 (de) * 2018-05-29 2019-12-05 Meyer Burger (Germany) Gmbh Belüftungsvorrichtung und Vakuumproduktionsanlage

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3429336A (en) * 1966-12-07 1969-02-25 Ishikawajima Harima Heavy Ind Apparatus automatically controlling the correlation between time and air pressure
US3666553A (en) * 1970-05-08 1972-05-30 Bell Telephone Labor Inc Method of growing compound semiconductor films on an amorphous substrate
US4054151A (en) * 1974-05-20 1977-10-18 Buchler Instruments, Division Of Searle Diagnostics Inc. Concentrating vortex shaker
US4394871A (en) * 1980-12-31 1983-07-26 The Boeing Company Programmable pressure regulator for titanium superplastic forming apparatus
DE3225163A1 (de) * 1981-07-08 1983-02-10 Edsyn, Inc., 91406 Van Nuys, Calif. Elektronisches steuer- und regelsystem fuer eine druck-und vakuumquelle
JPS5966339A (ja) * 1982-10-06 1984-04-14 Hitachi Ltd 真空装置
JPS59232269A (ja) * 1983-06-14 1984-12-27 Matsushita Electric Ind Co Ltd 真空装置
JPS59133365A (ja) * 1983-11-28 1984-07-31 Hitachi Ltd 真空装置
JPS60117629A (ja) * 1983-11-30 1985-06-25 Hitachi Ltd 真空処理装置

Also Published As

Publication number Publication date
DE3738160C2 (fr) 1993-01-14
FR2606426A1 (fr) 1988-05-13
DE3738160A1 (de) 1988-05-11
JPS63219130A (ja) 1988-09-12
US4739787A (en) 1988-04-26

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Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse