FR2535326B1 - Nouveaux copolymeres, procede pour leur preparation et vernis photosensible, sensible a un rayonnement ionisant utilisant ces copolymeres - Google Patents

Nouveaux copolymeres, procede pour leur preparation et vernis photosensible, sensible a un rayonnement ionisant utilisant ces copolymeres

Info

Publication number
FR2535326B1
FR2535326B1 FR8317346A FR8317346A FR2535326B1 FR 2535326 B1 FR2535326 B1 FR 2535326B1 FR 8317346 A FR8317346 A FR 8317346A FR 8317346 A FR8317346 A FR 8317346A FR 2535326 B1 FR2535326 B1 FR 2535326B1
Authority
FR
France
Prior art keywords
copolymers
sensitive
preparation
ionizing radiation
photosensitive varnish
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8317346A
Other languages
English (en)
Other versions
FR2535326A1 (fr
Inventor
Koichi Hatada
Yoshio Okamoto
Tatsuki Kitayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP19306882A external-priority patent/JPS5984910A/ja
Priority claimed from JP21083082A external-priority patent/JPS59100120A/ja
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Publication of FR2535326A1 publication Critical patent/FR2535326A1/fr
Application granted granted Critical
Publication of FR2535326B1 publication Critical patent/FR2535326B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36—Divinylbenzene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR8317346A 1982-11-02 1983-10-28 Nouveaux copolymeres, procede pour leur preparation et vernis photosensible, sensible a un rayonnement ionisant utilisant ces copolymeres Expired FR2535326B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP19306882A JPS5984910A (ja) 1982-11-02 1982-11-02 新規共重合体及びその製造方法
JP21083082A JPS59100120A (ja) 1982-12-01 1982-12-01 新規なグラフト共重合体とその製造法

Publications (2)

Publication Number Publication Date
FR2535326A1 FR2535326A1 (fr) 1984-05-04
FR2535326B1 true FR2535326B1 (fr) 1987-12-04

Family

ID=26507675

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8317346A Expired FR2535326B1 (fr) 1982-11-02 1983-10-28 Nouveaux copolymeres, procede pour leur preparation et vernis photosensible, sensible a un rayonnement ionisant utilisant ces copolymeres

Country Status (4)

Country Link
US (2) US4523000A (fr)
DE (1) DE3339267C2 (fr)
FR (1) FR2535326B1 (fr)
GB (1) GB2131034B (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2558473B1 (fr) * 1984-01-25 1987-05-22 Centre Nat Rech Scient Copolymeres reticules non ioniques, partiellement hydrophiles, et leur application a la chromatographie d'exclusion en milieu aqueux
US4868241A (en) * 1986-02-07 1989-09-19 American Cyanamid Company Electron beam and x-ray resists
JP2975454B2 (ja) * 1990-05-29 1999-11-10 シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー 官能星型ポリマー
JP3603425B2 (ja) * 1995-11-10 2004-12-22 住友化学株式会社 スチレン系ランダム共重合体およびその製造方法
TW569077B (en) * 2003-05-13 2004-01-01 Univ Nat Chiao Tung Method for fabricating nanometer gate in semiconductor device using thermally reflowed resist technology
US7445539B2 (en) * 2004-08-25 2008-11-04 Jakks Pacific, Incorporated Toy vehicle with a detachably attachable wheel
CN107200802B (zh) * 2016-03-18 2019-04-19 浙江众立合成材料科技股份有限公司 苯乙烯衍生物的功能性聚合物及其阴离子聚合制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3043817A (en) * 1958-09-19 1962-07-10 Dow Chemical Co Method of product control in aqueous suspension polymerizations of alkenyl aromatic compounds
DE1225863B (de) 1962-06-09 1966-09-29 Elfriede Husemann Dr Verfahren zur Herstellung von Pfropfpolymeren
US3493636A (en) * 1966-10-05 1970-02-03 Koppers Co Inc Styrene resins of controlled properties
CA1141090A (fr) * 1979-04-23 1983-02-08 Teiji Tsuruta Polydivinylbenzene lineaire et derives

Also Published As

Publication number Publication date
US4523000A (en) 1985-06-11
US4559389A (en) 1985-12-17
GB8329169D0 (en) 1983-12-07
FR2535326A1 (fr) 1984-05-04
GB2131034A (en) 1984-06-13
GB2131034B (en) 1986-02-19
DE3339267C2 (de) 1986-07-24
DE3339267A1 (de) 1984-05-10

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Legal Events

Date Code Title Description
ST Notification of lapse