FR2519156B1 - - Google Patents
Info
- Publication number
- FR2519156B1 FR2519156B1 FR8124300A FR8124300A FR2519156B1 FR 2519156 B1 FR2519156 B1 FR 2519156B1 FR 8124300 A FR8124300 A FR 8124300A FR 8124300 A FR8124300 A FR 8124300A FR 2519156 B1 FR2519156 B1 FR 2519156B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8124300A FR2519156A1 (fr) | 1981-12-28 | 1981-12-28 | Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8124300A FR2519156A1 (fr) | 1981-12-28 | 1981-12-28 | Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2519156A1 FR2519156A1 (fr) | 1983-07-01 |
FR2519156B1 true FR2519156B1 (enrdf_load_stackoverflow) | 1984-12-07 |
Family
ID=9265432
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8124300A Granted FR2519156A1 (fr) | 1981-12-28 | 1981-12-28 | Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2519156A1 (enrdf_load_stackoverflow) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2153543B (en) * | 1983-12-28 | 1988-09-01 | Canon Kk | A projection exposure apparatus |
US4822975A (en) * | 1984-01-30 | 1989-04-18 | Canon Kabushiki Kaisha | Method and apparatus for scanning exposure |
JPS61162051A (ja) * | 1985-01-12 | 1986-07-22 | Canon Inc | 露光方法 |
US5171965A (en) * | 1984-02-01 | 1992-12-15 | Canon Kabushiki Kaisha | Exposure method and apparatus |
GB2155647B (en) * | 1984-02-01 | 1988-12-21 | Canon Kk | Exposure method and apparatus |
US5091744A (en) * | 1984-02-13 | 1992-02-25 | Canon Kabushiki Kaisha | Illumination optical system |
GB2155201B (en) * | 1984-02-24 | 1988-07-13 | Canon Kk | An x-ray exposure apparatus |
JP2731953B2 (ja) * | 1989-08-07 | 1998-03-25 | キヤノン株式会社 | エネルギー量制御装置 |
JPH088154A (ja) * | 1994-06-16 | 1996-01-12 | Nec Yamagata Ltd | 露光装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1515127A (fr) * | 1967-01-16 | 1968-03-01 | Radiotechnique Coprim Rtc | Dispositifs d'obtention de clichés à haute définition destinés, notamment, à la fabrication de dispositifs semi-conducteurs |
FR2030468A5 (enrdf_load_stackoverflow) * | 1969-01-29 | 1970-11-13 | Thomson Brandt Csf | |
FR2406236A1 (fr) * | 1976-12-10 | 1979-05-11 | Thomson Csf | Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures |
NL171648C (nl) * | 1978-11-10 | 1983-04-18 | Stichting Fund Ond Material | Gaslaser. |
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1981
- 1981-12-28 FR FR8124300A patent/FR2519156A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2519156A1 (fr) | 1983-07-01 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |