FR2519156A1 - Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre - Google Patents
Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre Download PDFInfo
- Publication number
- FR2519156A1 FR2519156A1 FR8124300A FR8124300A FR2519156A1 FR 2519156 A1 FR2519156 A1 FR 2519156A1 FR 8124300 A FR8124300 A FR 8124300A FR 8124300 A FR8124300 A FR 8124300A FR 2519156 A1 FR2519156 A1 FR 2519156A1
- Authority
- FR
- France
- Prior art keywords
- substrate
- along
- pulsed laser
- coordinate axis
- energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000012546 transfer Methods 0.000 title claims abstract description 27
- 230000001186 cumulative effect Effects 0.000 title claims abstract description 7
- 238000005259 measurement Methods 0.000 title claims abstract description 7
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 239000000463 material Substances 0.000 claims abstract description 13
- 230000005855 radiation Effects 0.000 claims abstract description 13
- 239000002131 composite material Substances 0.000 claims abstract description 6
- VFQHLZMKZVVGFQ-UHFFFAOYSA-N [F].[Kr] Chemical compound [F].[Kr] VFQHLZMKZVVGFQ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 36
- 230000003287 optical effect Effects 0.000 claims description 31
- 238000006073 displacement reaction Methods 0.000 claims description 19
- 230000033001 locomotion Effects 0.000 claims description 11
- 238000013475 authorization Methods 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 238000001228 spectrum Methods 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 230000005693 optoelectronics Effects 0.000 claims 1
- 230000001360 synchronised effect Effects 0.000 claims 1
- 238000005286 illumination Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 230000001427 coherent effect Effects 0.000 description 5
- 230000010354 integration Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000007493 shaping process Methods 0.000 description 4
- 230000002123 temporal effect Effects 0.000 description 4
- 238000013519 translation Methods 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 230000008520 organization Effects 0.000 description 3
- 230000003071 parasitic effect Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 206010019345 Heat stroke Diseases 0.000 description 1
- 208000007180 Sunstroke Diseases 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
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- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8124300A FR2519156A1 (fr) | 1981-12-28 | 1981-12-28 | Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8124300A FR2519156A1 (fr) | 1981-12-28 | 1981-12-28 | Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2519156A1 true FR2519156A1 (fr) | 1983-07-01 |
| FR2519156B1 FR2519156B1 (OSRAM) | 1984-12-07 |
Family
ID=9265432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8124300A Granted FR2519156A1 (fr) | 1981-12-28 | 1981-12-28 | Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2519156A1 (OSRAM) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3503273A1 (de) * | 1984-02-01 | 1985-08-08 | Canon K.K., Tokio/Tokyo | Belichtungsverfahren und -vorrichtung |
| JPS61162051A (ja) * | 1985-01-12 | 1986-07-22 | Canon Inc | 露光方法 |
| US4822975A (en) * | 1984-01-30 | 1989-04-18 | Canon Kabushiki Kaisha | Method and apparatus for scanning exposure |
| US4977426A (en) * | 1983-12-28 | 1990-12-11 | Canon Kabushiki Kaisha | Projection exposure apparatus |
| US5091744A (en) * | 1984-02-13 | 1992-02-25 | Canon Kabushiki Kaisha | Illumination optical system |
| US5119390A (en) * | 1989-08-07 | 1992-06-02 | Canon Kabushiki Kaisha | Energy amount controlling device |
| US5164974A (en) * | 1984-02-24 | 1992-11-17 | Canon Kabushiki Kaisha | X-ray exposure apparatus |
| US5171965A (en) * | 1984-02-01 | 1992-12-15 | Canon Kabushiki Kaisha | Exposure method and apparatus |
| JPH088154A (ja) * | 1994-06-16 | 1996-01-12 | Nec Yamagata Ltd | 露光装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1515127A (fr) * | 1967-01-16 | 1968-03-01 | Radiotechnique Coprim Rtc | Dispositifs d'obtention de clichés à haute définition destinés, notamment, à la fabrication de dispositifs semi-conducteurs |
| FR2030468A5 (OSRAM) * | 1969-01-29 | 1970-11-13 | Thomson Brandt Csf | |
| US4132479A (en) * | 1976-12-10 | 1979-01-02 | Thomson-Csf | Pattern transfer optical system |
| DE2945327A1 (de) * | 1978-11-10 | 1980-05-22 | Stichting Fund Ond Material | Gaslaser |
-
1981
- 1981-12-28 FR FR8124300A patent/FR2519156A1/fr active Granted
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1515127A (fr) * | 1967-01-16 | 1968-03-01 | Radiotechnique Coprim Rtc | Dispositifs d'obtention de clichés à haute définition destinés, notamment, à la fabrication de dispositifs semi-conducteurs |
| FR2030468A5 (OSRAM) * | 1969-01-29 | 1970-11-13 | Thomson Brandt Csf | |
| US3632205A (en) * | 1969-01-29 | 1972-01-04 | Thomson Csf | Electro-optical image-tracing systems, particularly for use with laser beams |
| US4132479A (en) * | 1976-12-10 | 1979-01-02 | Thomson-Csf | Pattern transfer optical system |
| FR2406236A1 (fr) * | 1976-12-10 | 1979-05-11 | Thomson Csf | Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures |
| DE2945327A1 (de) * | 1978-11-10 | 1980-05-22 | Stichting Fund Ond Material | Gaslaser |
Non-Patent Citations (1)
| Title |
|---|
| EXBK/80 * |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4977426A (en) * | 1983-12-28 | 1990-12-11 | Canon Kabushiki Kaisha | Projection exposure apparatus |
| US4822975A (en) * | 1984-01-30 | 1989-04-18 | Canon Kabushiki Kaisha | Method and apparatus for scanning exposure |
| DE3503273A1 (de) * | 1984-02-01 | 1985-08-08 | Canon K.K., Tokio/Tokyo | Belichtungsverfahren und -vorrichtung |
| US5171965A (en) * | 1984-02-01 | 1992-12-15 | Canon Kabushiki Kaisha | Exposure method and apparatus |
| US5091744A (en) * | 1984-02-13 | 1992-02-25 | Canon Kabushiki Kaisha | Illumination optical system |
| US5164974A (en) * | 1984-02-24 | 1992-11-17 | Canon Kabushiki Kaisha | X-ray exposure apparatus |
| JPS61162051A (ja) * | 1985-01-12 | 1986-07-22 | Canon Inc | 露光方法 |
| US5119390A (en) * | 1989-08-07 | 1992-06-02 | Canon Kabushiki Kaisha | Energy amount controlling device |
| JPH088154A (ja) * | 1994-06-16 | 1996-01-12 | Nec Yamagata Ltd | 露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2519156B1 (OSRAM) | 1984-12-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |